Patents by Inventor Yasunori Horio

Yasunori Horio has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8901053
    Abstract: An aqueous cleaning composition for a substrate for a perpendicular magnetic recording hard disk including a Ni—P containing layer contains at least one surfactant selected from the group consisting of surfactants represented by Formulas (1) to (6) and has a pH at 25° C. of 5 or less. In Formula (1), R1 is an alkyl group having a carbon number of 10 to 16, and X is a halogen atom.
    Type: Grant
    Filed: September 5, 2008
    Date of Patent: December 2, 2014
    Assignee: Kao Corporation
    Inventors: Sadaharu Miyamoto, Atsushi Tamura, Yasunori Horio
  • Patent number: 8303717
    Abstract: An alkali-type nonionic surfactant composition contains a nonionic surfactant (component A), water (component B), at least one compound (component C) selected from the group consisting of benzenesulfonic acid, toluenesulfonic acid, dimethylbenzenesulfonic acid, hydroxybenzenesulfonic acid and salts thereof, and at least one alkaline chemical (component D) selected from the group consisting of potassium hydroxide and sodium hydroxide. The alkali-type nonionic surfactant composition contains the nonionic surfactant (component A) in an amount of 0.5 to 20 wt % and has a pH at 25° C. of 12 or greater.
    Type: Grant
    Filed: September 5, 2008
    Date of Patent: November 6, 2012
    Assignee: Kao Corporation
    Inventors: Atsushi Tamura, Sadaharu Miyamoto, Yasunori Horio
  • Patent number: 7918941
    Abstract: The present invention relates to a cleaning agent composition for use in cleaning a substrate for recording media, a substrate for photomask, or a substrate for flat panel display, a surface of which at least contains a metallic or glassy substrate moiety, the cleaning agent composition containing (I) a copolymer compound satisfying at least the following (i) to (iii): (i) a constituting unit A1 derived from acrylic acid is contained in an amount of 20% by mol or more of the entire constituting units; (ii) the constituting unit A1 derived from acrylic acid and a constituting A2 derived from 2-acrylamide-2-methylpropanesulfonic acid are contained in a total amount of 90% by mol or more of the entire constituting units; and (iii) the constituting unit A1 and the constituting unit A2 of the entire constituting units are in a content ratio [constituting unit A1 (% by mol)/constituting unit A2 (% by mol)] of from 91/9 to 95/5.
    Type: Grant
    Filed: March 26, 2007
    Date of Patent: April 5, 2011
    Assignee: Kao Corporation
    Inventors: Atsushi Tamura, Yasunori Horio
  • Publication number: 20100255410
    Abstract: An alkali-type nonionic surfactant composition contains a nonionic surfactant (component A), water (component B), at least one compound (component C) selected from the group consisting of benzenesulfonic acid, toluenesulfonic acid, dimethylbenzenesulfonic acid, hydroxybenzenesulfonic acid and salts thereof, and at least one alkaline chemical (component D) selected from the group consisting of potassium hydroxide and sodium hydroxide. The alkali-type nonionic surfactant composition contains the nonionic surfactant (component A) in an amount of 0.5 to 20 wt % and has a pH at 25° C. of 12 or greater.
    Type: Application
    Filed: September 5, 2008
    Publication date: October 7, 2010
    Inventors: Atsushi Tamura, Sadaharu Miyamoto, Yasunori Horio
  • Publication number: 20100221417
    Abstract: An aqueous cleaning composition for a substrate for a perpendicular magnetic recording hard disk including a Ni—P containing layer contains at least one surfactant selected from the group consisting of surfactants represented by Formulas (1) to (6) and has a pH at 25° C. of 5 or less. In Formula (1), R1 is an alkyl group having a carbon number of 10 to 16, and X is a halogen atom.
    Type: Application
    Filed: September 5, 2008
    Publication date: September 2, 2010
    Inventors: Sadaharu Miyamoto, Atsushi Tamura, Yasunori Horio
  • Publication number: 20090312219
    Abstract: The present invention relates to a cleaning agent composition for use in cleaning a substrate for recording media, a substrate for photomask, or a substrate for flat panel display, a surface of which at least contains a metallic or glassy substrate moiety, the cleaning agent composition containing (I) a copolymer compound satisfying at least the following (i) to (iii): (i) a constituting unit A1 derived from acrylic acid is contained in an amount of 20% by mol or more of the entire constituting units; (ii) the constituting unit A1 derived from acrylic acid and a constituting A2 derived from 2-acrylamide-2-methylpropanesulfonic acid are contained in a total amount of 90% by mol or more of the entire constituting units; and (iii) the constituting unit A1 and the constituting unit A2 of the entire constituting units are in a content ratio [constituting unit A1 (% by mol)/constituting unit A2 (% by mol)] of from 91/9 to 95/5.
    Type: Application
    Filed: March 26, 2007
    Publication date: December 17, 2009
    Inventors: Atsushi Tamura, Yasunori Horio
  • Patent number: 7531490
    Abstract: The present invention relates to a detergent composition containing (a) 2 to 30% by weight of an inorganic alkali, (b) 0.5 to 20% by weight of at least one surfactant selected from an anionic surfactant and a nonionic surfactant, (c) 0.01 to 2% by weight (based on calcium ion) of a calcium salt, (d) 0.1 to 15% by weight of a calcium ion-sequestering agent, (e) 1 to 30% by weight of a water-soluble organic solvent and (f) 20 to 95% by weight of water.
    Type: Grant
    Filed: September 29, 2005
    Date of Patent: May 12, 2009
    Assignee: Kao Corporation
    Inventors: Junji Kondo, Yasunori Horio
  • Publication number: 20060079437
    Abstract: The present invention relates to a detergent composition containing (a) 2 to 30% by weight of an inorganic alkali, (b) 0.5 to 20% by weight of at least one surfactant selected from an anionic surfactant and a nonionic surfactant, (c) 0.01 to 2% by weight (based on calcium ion) of a calcium salt, (d) 0.1 to 15% by weight of a calcium ion-sequestering agent, (e) 1 to 30% by weight of a water-soluble organic solvent and (f) 20 to 95% by weight of water.
    Type: Application
    Filed: September 29, 2005
    Publication date: April 13, 2006
    Applicant: Kao Corporation
    Inventors: Junji Kondo, Yasunori Horio