Patents by Inventor Yasunori Niwa

Yasunori Niwa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6908719
    Abstract: The present invention relates to a water-soluble photosensitive compound represented by the general formula (1): or by the general formula (2): in the formula, X represents a direct bond, an alkylene group containing 1 to 5 carbon atoms, —CH2O—, —OCH2—, —CH2OCH2—, —O—, —S— or —SO2—, and Z represents —SO3?.Q+, —COO?.Q+ or —SO2NR2, in which Q+ represents Li+, Na+, K+ or N+R4 and R represents a hydrogen atom and/or an alkyl group containing 1 to 5 carbon atoms, said alkyl group optionally having one hydroxy, ether, carbonyl, carbonyloxy or oxycarbonyl group, wherein a photosensitive group has an absorption maximum wavelength of not longer than 305 nm in the ultraviolet absorption spectrum thereof.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: June 21, 2005
    Assignees: Sanyo Chemical Industries, Ltd., Sony Corporation
    Inventors: Tetsuya Watanabe, Takao Mukai, Yasunori Niwa, Keiko Noda, Chiyoji Watanabe
  • Patent number: 5316785
    Abstract: The present invention is directed to a method of and apparatus for forming a coating film on an inner surface of a panel of a cathode ray tube. In this case, slurries are injected into the panel, the panel is rotated on its own axis so as to uniformly coat the slurries on the panel and a recovering hood is moved in an opposing relation to the panel in synchronism with the revolution of the panel to thereby recover the slurries. Therefore, particularly when the slurries are recovered, the slurries can be prevented from being scattered, thereby avoiding the surroundings from being splattered.
    Type: Grant
    Filed: September 27, 1991
    Date of Patent: May 31, 1994
    Assignee: Sony Corporation
    Inventors: Kunihiko Yanai, Yasuo Tanaka, Yasunori Niwa
  • Patent number: 5135420
    Abstract: A process of manufacturing a cathode ray tube wherein trimming cleaning of an inner wall of a skirt portion of a panel is performed in a non-contacting condition to prevent splashing of water and trimming cleaning of panels of different sizes can be performed. A rotational position signal is detected in response to rotation of a panel, and while the distance between a cleaning nozzle and an inner wall of a skirt portion of the panel is kept constant in response to such rotational position signal, cleaning liquid is supplied through the cleaning nozzle to clean the inner wall of the skirt portion of the panel.
    Type: Grant
    Filed: September 16, 1991
    Date of Patent: August 4, 1992
    Assignee: Sony Corporation
    Inventors: Kazuhiko Sumi, Hiroshi Kanoh, Yasunori Niwa