Patents by Inventor Yasunori Okumura
Yasunori Okumura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8134027Abstract: The present invention provides a method for producing fluorosulfonylimides more safely, rapidly and efficiently, which enables suppression of production of by-products, and fluorosulfonylimides. The method for producing a fluorosulfonylimide salt of the present invention includes a step of reacting a fluoride compound containing at least one element selected from the group consisting of elements of Group 11 to Group 15 and Period 4 to Period 6 (excluding arsenic and antimony) with a compound represented by the following general formula (I) to give a fluorosulfonylimide salt represented by the general formula (II): [Chemical Formula 1] wherein R1 denotes at least one element selected from the group consisting of elements of Group 11 to Group 15 and Period 4 to Period 6 (excluding arsenic and antimony); R3 denotes fluorine, chlorine or a fluorinated alkyl group having 1 to 6 carbon atoms; R4 denotes fluorine or a fluorinated alkyl group having 1 to 6 carbon atoms; and m denotes an integer of 2 or 3.Type: GrantFiled: March 30, 2009Date of Patent: March 13, 2012Assignee: Nippon Shokubai Co., Ltd.Inventors: Yasunori Okumura, Kazuo Takei, Shimpei Sato, Yuichi Sato
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Publication number: 20120041233Abstract: The present invention provides a method for producing a fluorisulfonylimide salt, which enables reducing the impurity content and continuous operation for a long time, and a fluorosulfonyl imide salt. The fluorosulfonyl imide salt of the present invention has a K content of 10,000 ppm or less. The method for producing a fluorosulfonyl imide salt of the present invention is that after a fluorination reaction of chlorosulfonyl imde or a salt thereof, the reaction solution is brought into contact with an aqueous alkaline solution so as to remove impurities. The fluorosulfonyl imide salt of the present invention, in which various impirities are reduced to extremely low levels, is useful as an electrolyte used in a lithium secondary battery, a capacitor or the like, an ionic liquid, or an intermediate for a sulfonyl imide salt, and the like. It is expected that use of the fluorosulfonyl imide salt of the present invention as an electrolyte leads to a high-performance electrochemical device.Type: ApplicationFiled: November 26, 2010Publication date: February 16, 2012Applicant: NIPPON SHOKUBAI CO., LTD.Inventors: Shimpei Sato, Yasunori Okumura, Yuichi Sato, Yasuyuki Miyoshi
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Publication number: 20110034716Abstract: The present invention provides a method for producing fluorosulfonylimides more safely, rapidly and efficiently, which enables suppression of production of by-products, and fluorosulfonylimides. The method for producing a fluorosulfonylimide salt of the present invention includes a step of reacting a fluoride compound containing at least one element selected from the group consisting of elements of Group 11 to Group 15 and Period 4 to Period 6 (excluding arsenic and antimony) with a compound represented by the following general formula (I) to give a fluorosulfonylimide salt represented by the general formula (II): wherein R1 denotes at least one element selected from the group consisting of elements of Group 11 to Group 15 and Period 4 to Period 6 (excluding arsenic and antimony); R3 denotes fluorine, chlorine or a fluorinated alkyl group having 1 to 6 carbon atoms; R4 denotes fluorine or a fluorinated alkyl group having 1 to 6 carbon atoms; and m denotes an integer of 2 or 3.Type: ApplicationFiled: March 30, 2009Publication date: February 10, 2011Inventors: Yasunori Okumura, Kazuo Takei, Shimpei Sato, Yuichi Sato
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Patent number: 7741426Abstract: A method for the production of a fluorinated phenylenediamine is provided which comprises steps of reacting a diamide represented by the following formula with NaOCl at a molar ratio of the NaOCl to the diamide in the range of 2.0-6.0 and NaOH at a molar ratio of the NaOH to the diamide in the range of 1.8-6.0 is provided. According to this invention, the fluorinated phenylenediamine can be produced conveniently in a high yield.Type: GrantFiled: June 21, 2004Date of Patent: June 22, 2010Assignee: Nippon Shokubai Co., LtdInventors: Shinji Nishimae, Go Masuda, Yasunori Okumura
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Patent number: 7700647Abstract: It is an object of the present invention to provide fluorinated bis(phthalic anhydride) which has less coloration and higher solubility in comparison with conventional compounds, and a method for producing the same. Further, it is also an object of the present invention to provide a method for producing a fluorinated bis(phthalonitrile) compound, which is an intermediate raw material compound of the method for producing the fluorinated bis(phthalic anhydride), and a polyamic acid and a polyimide, which are produced from the fluorinated bis(phthalic anhydride). A fluorinated bis(phthalic anhydride) of the present invention is the fluorinated bis(phthalic anhydride) represented by the following formula (I1), wherein its specific surface area is 3.0 m2/g or larger. It is also characterized in that its molar absorption coefficient is 0.6 L/mol·cm or less at a wavelength of 360 nm. [wherein, m and n independently represent integers of 1 to 3, and Z1 represents a single bond group or a bivalent organic group.Type: GrantFiled: January 7, 2008Date of Patent: April 20, 2010Assignee: Nippon Shokubai Co., Ltd.Inventors: Go Masuda, Yasunori Okumura, Shinji Nishimae
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Publication number: 20080119659Abstract: It is an object of the present invention to provide fluorinated bis(phthalic anhydride) which has less coloration and higher solubility in comparison with conventional compounds, and a method for producing the same. Further, it is also an object of the present invention to provide a method for producing a fluorinated bis(phthalonitrile) compound, which is an intermediate raw material compound of the method for producing the fluorinated bis(phthalic anhydride), and a polyamic acid and a polyimide, which are produced from the fluorinated bis(phthalic anhydride). A fluorinated bis(phthalic anhydride) of the present invention is the fluorinated bis(phthalic anhydride) represented by the following formula (I1), wherein its specific surface area is 3.0 m2/g or larger. It is also characterized in that its molar absorption coefficient is 0.6 L/mol·cm or less at a wavelength of 360 nm. [wherein, m and n independently represent integers of 1 to 3, and Z1 represents a single bond group or a bivalent organic group.Type: ApplicationFiled: January 7, 2008Publication date: May 22, 2008Inventors: Go Masuda, Yasunori Okumura, Shinji Nishimae, Toshihiro Naraya
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Patent number: 7217827Abstract: The present invention relates to halogen-containing aromatic compounds and methods thereof. The present invention relates a halogen-containing aromatic acid dianhydride, halogen-containing aromatic tetranitrile compound, halogen-containing m-phenylenediamine compound and fluorine compound, and a method thereof.Type: GrantFiled: November 23, 2004Date of Patent: May 15, 2007Assignee: Nippon Shokubai Co., Ltd.Inventors: Masayoshi Kuwabara, Yasunori Okumura
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Publication number: 20060142539Abstract: A method for the production of a fluorinated phenylenediamine is provided which comprises steps of reacting a diamide represented by the following formula with NaOCl at a molar ratio of the NaOCl to the diamide in the range of 2.0-6.0 and NaOH at a molar ratio of the NaOH to the diamide in the range of 1.8-6.0 is provided. According to this invention, the fluorinated phenylenediamine can be produced conveniently in a high yield.Type: ApplicationFiled: June 21, 2004Publication date: June 29, 2006Inventors: Shinji Nishimae, Go Masuda, Yasunori Okumura
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Patent number: 6924348Abstract: A polyimide excelling in heat resistance, chemical resistance, water repellency, dielectric characteristics, electrical characteristics, and optical characteristics and a polyamide acid useful as the raw material therefor are provided. Specifically, a polyamide acid containing a chlorine atom and a fluorine atom and comprising a repeating unit represented by the following formula (1): (wherein X and X? independently denote a divalent organic group; Y and Y? independently denote a chlorine, bromine, or iodine atom; p and p? denote independently denote the number of fluorine atom {F in the formula (1)} bonded to the relevant benzene ring, representing an integer of 0-3; q and q? independently denote an integer of 0-3; and p+q total 3, and p?+q? total 3).Type: GrantFiled: July 11, 2002Date of Patent: August 2, 2005Assignees: Nippon Shokubai Co., Ltd., NTT Advanced Technology CorporationInventors: Kozo Tajiri, Masayoshi Kuwabara, Yasunori Okumura, Tohru Matsuura, Noriyoshi Yamada
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Patent number: 6916959Abstract: The present invention relates to halogen-containing aromatic compounds and methods thereof. The present invention relates a halogen-containing aromatic acid dianhydride, halogen-containing aromatic tetranitrile compound, halogen-containing m-phenylenediamine compound and fluorine compound, and a method thereof.Type: GrantFiled: April 26, 2002Date of Patent: July 12, 2005Assignee: Nippon Shokubai Co., Ltd.Inventors: Masayoshi Kuwabara, Yasunori Okumura
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Publication number: 20050090691Abstract: The present invention relates to halogen-containing aromatic compounds and methods thereof. The present invention relates a halogen-containing aromatic acid dianhydride, halogen-containing aromatic tetranitrile compound, halogen-containing m-phenylenediamine compound and fluorine compound, and a method thereof.Type: ApplicationFiled: November 23, 2004Publication date: April 28, 2005Inventors: Masayoshi Kuwabara, Yasunori Okumura
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Publication number: 20050020839Abstract: It is an object of the present invention to provide fluorinated bis(phthalic anhydride) which has less coloration and higher solubility in comparison with conventional compounds, and a method for producing the same. Further, it is also an object of the present invention to provide a method for producing a fluorinated bis(phthalonitrile) compound, which is an intermediate raw material compound of the method for producing the fluorinated bis(phthalic anhydride), and a polyamic acid and a polyimide, which are produced from the fluorinated bis(phthalic anhydride). A fluorinated bis(phthalic anhydride) of the present invention is the fluorinated bis(phthalic anhydride) represented by the following formula (I1), wherein its specific surface area is 3.0 m2/g or larger. It is also characterized in that its molar absorption coefficient is 0.6 L/mol·cm or less at a wavelength of 360 nm. [wherein, m and n independently represent integers of 1 to 3, and Z1 represents a single bond group or a bivalent organic group.Type: ApplicationFiled: June 17, 2004Publication date: January 27, 2005Inventors: Go Masuda, Yasunori Okumura, Shinji Nishimae, Toshihiro Naraya
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Publication number: 20030050407Abstract: A polyimide excelling in heat resistance, chemical resistance, water repellency, dielectric characteristics, electrical characteristics, and optical characteristics and a polyamide acid useful as the raw material therefor are provided.Type: ApplicationFiled: July 11, 2002Publication date: March 13, 2003Inventors: Kozo Tajiri, Masayoshi Kuwabara, Yasunori Okumura, Tohru Matsuura, Noriyoshi Yamada
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Publication number: 20030018204Abstract: The present invention relates to halogen-containing aromatic compounds and methods thereof. The present invention relates a halogen-containing aromatic acid dianhydride, halogen-containing aromatic tetranitrile compound, halogen-containing m-phenylenediamine compound and fluorine compound, and a method thereof.Type: ApplicationFiled: April 26, 2002Publication date: January 23, 2003Inventors: Masayoshi Kuwabara, Yasunori Okumura
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Patent number: 6506872Abstract: A novel polycyanoaryl ether exhibiting excellent heat-resistance, hydrolysis-resistance and weatherability, as well as industrially high general-purpose properties, and the method for the production thereof is to be provided. The polycyanoaryl ether of this invention is represented by the formula (1): wherein R1 stands for a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, a substituted or unsubstituted alkoxy group of 1 to 12 carbon atoms, a substituted or unsubstituted alkylamino group of 1 to 12 carbon atoms, a substituted or unsubstituted alkylthio group of 1 to 12 carbon atoms, a substituted or unsubstituted aryl group of 6 to 20 carbon atoms, a substituted or unsubstituted aryloxy group of 6 to 20 carbon atoms, a substituted or unsubstituted arylamino group of 6 to 20 carbon atoms, or a substituted or unsubstituted arylthio group of 6 to 20 carbon atoms; R2 stands for a divalent organic group; and n stands for a degree of polymerization.Type: GrantFiled: April 25, 2001Date of Patent: January 14, 2003Assignee: Nippon Shokubai Co., Ltd.Inventors: Kunio Kimura, Yuhiko Yamashita, Yasunori Okumura, Shoji Ito
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Publication number: 20020007039Abstract: A novel polycyanoaryl ether exhibiting excellent heat-resistance, hydrolysis-resistance and weatherability, as well as industrially high general-purpose properties, and the method for the production thereof is to be provided.Type: ApplicationFiled: April 25, 2001Publication date: January 17, 2002Inventors: Kunio Kimura, Yuhiko Yamashita, Yasunori Okumura, Shoji Ito
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Patent number: 5998609Abstract: A phthalocyanine compound of a structural formula of phthalocyanine represented by the general formula (1): ##STR1## wherein 1 to 8 of a total 16 positions are substituted with a phenoxy group, the phenoxy group at either of the ortho positions is substituted with an aryl group which may be substituted, all the atoms in the aryl group and the substituents at the residual ortho positions excluding the hydrogen atoms assume a total atomic radius of not less than 6.0 .ANG., and a central atom group M contains a metal atom of not less than trivalence, a bromine-substituent of the compound, a phthalocyanine composition comprising the phthalocyanine compound and the bromine atom-containing phthalocyanine compound, and an optical recording medium containing it in a recording layer.Type: GrantFiled: June 12, 1998Date of Patent: December 7, 1999Assignee: Nippon Shokubai Co., Ltd.Inventors: Minoru Aoki, Osamu Kaieda, Kiyoshi Masuda, Yasunori Okumura
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Patent number: 5763702Abstract: A benzene halide is produced with high purity at a high yield by heating a halogen-substituted benzene carboxylic acid in the presence of a basic catalyst in a solvent.Type: GrantFiled: September 25, 1996Date of Patent: June 9, 1998Assignee: Nippon Shokubai Co., Ltd.Inventors: Yasunori Okumura, Osamu Kaieda