Patents by Inventor Yasunori Okumura

Yasunori Okumura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8134027
    Abstract: The present invention provides a method for producing fluorosulfonylimides more safely, rapidly and efficiently, which enables suppression of production of by-products, and fluorosulfonylimides. The method for producing a fluorosulfonylimide salt of the present invention includes a step of reacting a fluoride compound containing at least one element selected from the group consisting of elements of Group 11 to Group 15 and Period 4 to Period 6 (excluding arsenic and antimony) with a compound represented by the following general formula (I) to give a fluorosulfonylimide salt represented by the general formula (II): [Chemical Formula 1] wherein R1 denotes at least one element selected from the group consisting of elements of Group 11 to Group 15 and Period 4 to Period 6 (excluding arsenic and antimony); R3 denotes fluorine, chlorine or a fluorinated alkyl group having 1 to 6 carbon atoms; R4 denotes fluorine or a fluorinated alkyl group having 1 to 6 carbon atoms; and m denotes an integer of 2 or 3.
    Type: Grant
    Filed: March 30, 2009
    Date of Patent: March 13, 2012
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Yasunori Okumura, Kazuo Takei, Shimpei Sato, Yuichi Sato
  • Publication number: 20120041233
    Abstract: The present invention provides a method for producing a fluorisulfonylimide salt, which enables reducing the impurity content and continuous operation for a long time, and a fluorosulfonyl imide salt. The fluorosulfonyl imide salt of the present invention has a K content of 10,000 ppm or less. The method for producing a fluorosulfonyl imide salt of the present invention is that after a fluorination reaction of chlorosulfonyl imde or a salt thereof, the reaction solution is brought into contact with an aqueous alkaline solution so as to remove impurities. The fluorosulfonyl imide salt of the present invention, in which various impirities are reduced to extremely low levels, is useful as an electrolyte used in a lithium secondary battery, a capacitor or the like, an ionic liquid, or an intermediate for a sulfonyl imide salt, and the like. It is expected that use of the fluorosulfonyl imide salt of the present invention as an electrolyte leads to a high-performance electrochemical device.
    Type: Application
    Filed: November 26, 2010
    Publication date: February 16, 2012
    Applicant: NIPPON SHOKUBAI CO., LTD.
    Inventors: Shimpei Sato, Yasunori Okumura, Yuichi Sato, Yasuyuki Miyoshi
  • Publication number: 20110034716
    Abstract: The present invention provides a method for producing fluorosulfonylimides more safely, rapidly and efficiently, which enables suppression of production of by-products, and fluorosulfonylimides. The method for producing a fluorosulfonylimide salt of the present invention includes a step of reacting a fluoride compound containing at least one element selected from the group consisting of elements of Group 11 to Group 15 and Period 4 to Period 6 (excluding arsenic and antimony) with a compound represented by the following general formula (I) to give a fluorosulfonylimide salt represented by the general formula (II): wherein R1 denotes at least one element selected from the group consisting of elements of Group 11 to Group 15 and Period 4 to Period 6 (excluding arsenic and antimony); R3 denotes fluorine, chlorine or a fluorinated alkyl group having 1 to 6 carbon atoms; R4 denotes fluorine or a fluorinated alkyl group having 1 to 6 carbon atoms; and m denotes an integer of 2 or 3.
    Type: Application
    Filed: March 30, 2009
    Publication date: February 10, 2011
    Inventors: Yasunori Okumura, Kazuo Takei, Shimpei Sato, Yuichi Sato
  • Patent number: 7741426
    Abstract: A method for the production of a fluorinated phenylenediamine is provided which comprises steps of reacting a diamide represented by the following formula with NaOCl at a molar ratio of the NaOCl to the diamide in the range of 2.0-6.0 and NaOH at a molar ratio of the NaOH to the diamide in the range of 1.8-6.0 is provided. According to this invention, the fluorinated phenylenediamine can be produced conveniently in a high yield.
    Type: Grant
    Filed: June 21, 2004
    Date of Patent: June 22, 2010
    Assignee: Nippon Shokubai Co., Ltd
    Inventors: Shinji Nishimae, Go Masuda, Yasunori Okumura
  • Patent number: 7700647
    Abstract: It is an object of the present invention to provide fluorinated bis(phthalic anhydride) which has less coloration and higher solubility in comparison with conventional compounds, and a method for producing the same. Further, it is also an object of the present invention to provide a method for producing a fluorinated bis(phthalonitrile) compound, which is an intermediate raw material compound of the method for producing the fluorinated bis(phthalic anhydride), and a polyamic acid and a polyimide, which are produced from the fluorinated bis(phthalic anhydride). A fluorinated bis(phthalic anhydride) of the present invention is the fluorinated bis(phthalic anhydride) represented by the following formula (I1), wherein its specific surface area is 3.0 m2/g or larger. It is also characterized in that its molar absorption coefficient is 0.6 L/mol·cm or less at a wavelength of 360 nm. [wherein, m and n independently represent integers of 1 to 3, and Z1 represents a single bond group or a bivalent organic group.
    Type: Grant
    Filed: January 7, 2008
    Date of Patent: April 20, 2010
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Go Masuda, Yasunori Okumura, Shinji Nishimae
  • Publication number: 20080119659
    Abstract: It is an object of the present invention to provide fluorinated bis(phthalic anhydride) which has less coloration and higher solubility in comparison with conventional compounds, and a method for producing the same. Further, it is also an object of the present invention to provide a method for producing a fluorinated bis(phthalonitrile) compound, which is an intermediate raw material compound of the method for producing the fluorinated bis(phthalic anhydride), and a polyamic acid and a polyimide, which are produced from the fluorinated bis(phthalic anhydride). A fluorinated bis(phthalic anhydride) of the present invention is the fluorinated bis(phthalic anhydride) represented by the following formula (I1), wherein its specific surface area is 3.0 m2/g or larger. It is also characterized in that its molar absorption coefficient is 0.6 L/mol·cm or less at a wavelength of 360 nm. [wherein, m and n independently represent integers of 1 to 3, and Z1 represents a single bond group or a bivalent organic group.
    Type: Application
    Filed: January 7, 2008
    Publication date: May 22, 2008
    Inventors: Go Masuda, Yasunori Okumura, Shinji Nishimae, Toshihiro Naraya
  • Patent number: 7217827
    Abstract: The present invention relates to halogen-containing aromatic compounds and methods thereof. The present invention relates a halogen-containing aromatic acid dianhydride, halogen-containing aromatic tetranitrile compound, halogen-containing m-phenylenediamine compound and fluorine compound, and a method thereof.
    Type: Grant
    Filed: November 23, 2004
    Date of Patent: May 15, 2007
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Masayoshi Kuwabara, Yasunori Okumura
  • Publication number: 20060142539
    Abstract: A method for the production of a fluorinated phenylenediamine is provided which comprises steps of reacting a diamide represented by the following formula with NaOCl at a molar ratio of the NaOCl to the diamide in the range of 2.0-6.0 and NaOH at a molar ratio of the NaOH to the diamide in the range of 1.8-6.0 is provided. According to this invention, the fluorinated phenylenediamine can be produced conveniently in a high yield.
    Type: Application
    Filed: June 21, 2004
    Publication date: June 29, 2006
    Inventors: Shinji Nishimae, Go Masuda, Yasunori Okumura
  • Patent number: 6924348
    Abstract: A polyimide excelling in heat resistance, chemical resistance, water repellency, dielectric characteristics, electrical characteristics, and optical characteristics and a polyamide acid useful as the raw material therefor are provided. Specifically, a polyamide acid containing a chlorine atom and a fluorine atom and comprising a repeating unit represented by the following formula (1): (wherein X and X? independently denote a divalent organic group; Y and Y? independently denote a chlorine, bromine, or iodine atom; p and p? denote independently denote the number of fluorine atom {F in the formula (1)} bonded to the relevant benzene ring, representing an integer of 0-3; q and q? independently denote an integer of 0-3; and p+q total 3, and p?+q? total 3).
    Type: Grant
    Filed: July 11, 2002
    Date of Patent: August 2, 2005
    Assignees: Nippon Shokubai Co., Ltd., NTT Advanced Technology Corporation
    Inventors: Kozo Tajiri, Masayoshi Kuwabara, Yasunori Okumura, Tohru Matsuura, Noriyoshi Yamada
  • Patent number: 6916959
    Abstract: The present invention relates to halogen-containing aromatic compounds and methods thereof. The present invention relates a halogen-containing aromatic acid dianhydride, halogen-containing aromatic tetranitrile compound, halogen-containing m-phenylenediamine compound and fluorine compound, and a method thereof.
    Type: Grant
    Filed: April 26, 2002
    Date of Patent: July 12, 2005
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Masayoshi Kuwabara, Yasunori Okumura
  • Publication number: 20050090691
    Abstract: The present invention relates to halogen-containing aromatic compounds and methods thereof. The present invention relates a halogen-containing aromatic acid dianhydride, halogen-containing aromatic tetranitrile compound, halogen-containing m-phenylenediamine compound and fluorine compound, and a method thereof.
    Type: Application
    Filed: November 23, 2004
    Publication date: April 28, 2005
    Inventors: Masayoshi Kuwabara, Yasunori Okumura
  • Publication number: 20050020839
    Abstract: It is an object of the present invention to provide fluorinated bis(phthalic anhydride) which has less coloration and higher solubility in comparison with conventional compounds, and a method for producing the same. Further, it is also an object of the present invention to provide a method for producing a fluorinated bis(phthalonitrile) compound, which is an intermediate raw material compound of the method for producing the fluorinated bis(phthalic anhydride), and a polyamic acid and a polyimide, which are produced from the fluorinated bis(phthalic anhydride). A fluorinated bis(phthalic anhydride) of the present invention is the fluorinated bis(phthalic anhydride) represented by the following formula (I1), wherein its specific surface area is 3.0 m2/g or larger. It is also characterized in that its molar absorption coefficient is 0.6 L/mol·cm or less at a wavelength of 360 nm. [wherein, m and n independently represent integers of 1 to 3, and Z1 represents a single bond group or a bivalent organic group.
    Type: Application
    Filed: June 17, 2004
    Publication date: January 27, 2005
    Inventors: Go Masuda, Yasunori Okumura, Shinji Nishimae, Toshihiro Naraya
  • Publication number: 20030050407
    Abstract: A polyimide excelling in heat resistance, chemical resistance, water repellency, dielectric characteristics, electrical characteristics, and optical characteristics and a polyamide acid useful as the raw material therefor are provided.
    Type: Application
    Filed: July 11, 2002
    Publication date: March 13, 2003
    Inventors: Kozo Tajiri, Masayoshi Kuwabara, Yasunori Okumura, Tohru Matsuura, Noriyoshi Yamada
  • Publication number: 20030018204
    Abstract: The present invention relates to halogen-containing aromatic compounds and methods thereof. The present invention relates a halogen-containing aromatic acid dianhydride, halogen-containing aromatic tetranitrile compound, halogen-containing m-phenylenediamine compound and fluorine compound, and a method thereof.
    Type: Application
    Filed: April 26, 2002
    Publication date: January 23, 2003
    Inventors: Masayoshi Kuwabara, Yasunori Okumura
  • Patent number: 6506872
    Abstract: A novel polycyanoaryl ether exhibiting excellent heat-resistance, hydrolysis-resistance and weatherability, as well as industrially high general-purpose properties, and the method for the production thereof is to be provided. The polycyanoaryl ether of this invention is represented by the formula (1): wherein R1 stands for a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, a substituted or unsubstituted alkoxy group of 1 to 12 carbon atoms, a substituted or unsubstituted alkylamino group of 1 to 12 carbon atoms, a substituted or unsubstituted alkylthio group of 1 to 12 carbon atoms, a substituted or unsubstituted aryl group of 6 to 20 carbon atoms, a substituted or unsubstituted aryloxy group of 6 to 20 carbon atoms, a substituted or unsubstituted arylamino group of 6 to 20 carbon atoms, or a substituted or unsubstituted arylthio group of 6 to 20 carbon atoms; R2 stands for a divalent organic group; and n stands for a degree of polymerization.
    Type: Grant
    Filed: April 25, 2001
    Date of Patent: January 14, 2003
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Kunio Kimura, Yuhiko Yamashita, Yasunori Okumura, Shoji Ito
  • Publication number: 20020007039
    Abstract: A novel polycyanoaryl ether exhibiting excellent heat-resistance, hydrolysis-resistance and weatherability, as well as industrially high general-purpose properties, and the method for the production thereof is to be provided.
    Type: Application
    Filed: April 25, 2001
    Publication date: January 17, 2002
    Inventors: Kunio Kimura, Yuhiko Yamashita, Yasunori Okumura, Shoji Ito
  • Patent number: 5998609
    Abstract: A phthalocyanine compound of a structural formula of phthalocyanine represented by the general formula (1): ##STR1## wherein 1 to 8 of a total 16 positions are substituted with a phenoxy group, the phenoxy group at either of the ortho positions is substituted with an aryl group which may be substituted, all the atoms in the aryl group and the substituents at the residual ortho positions excluding the hydrogen atoms assume a total atomic radius of not less than 6.0 .ANG., and a central atom group M contains a metal atom of not less than trivalence, a bromine-substituent of the compound, a phthalocyanine composition comprising the phthalocyanine compound and the bromine atom-containing phthalocyanine compound, and an optical recording medium containing it in a recording layer.
    Type: Grant
    Filed: June 12, 1998
    Date of Patent: December 7, 1999
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Minoru Aoki, Osamu Kaieda, Kiyoshi Masuda, Yasunori Okumura
  • Patent number: 5763702
    Abstract: A benzene halide is produced with high purity at a high yield by heating a halogen-substituted benzene carboxylic acid in the presence of a basic catalyst in a solvent.
    Type: Grant
    Filed: September 25, 1996
    Date of Patent: June 9, 1998
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Yasunori Okumura, Osamu Kaieda