Patents by Inventor Yasunori Shimomura

Yasunori Shimomura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methacrylic resin composition for optical discs
    Patent number: 5252440
    Abstract: A methacrylic resin composition for optical discs comprising 100 parts by weight of a copolymer composed of from 95 to 99.7% by weight of methyl methacrylate (A) and from 0.3 to 5% by weight of at least one monomer (B) selected from the group consisting of methyl acrylate, ethyl acrylate and butyl acrylate, and having a heat distortion temperature of at least 95.degree. C., a melt flow rate of from 1.0 to 10.0 g/10 min and a tensile strength of at least 660 kg/cm.sup.2, and from 0.05 to 2.0 parts by weight of at least one releasing agent (C) selected from the group consisting of a fatty acid alkyl ester of the formula R.sub.1 COOR.sub.2 wherein each of R.sub.1 and R.sub.2 is an alkyl group having from 5 to 20 carbon atoms, cetanol and a stearic acid glycerol ester.
    Type: Grant
    Filed: April 13, 1992
    Date of Patent: October 12, 1993
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Fumio Sato, Yasunori Shimomura, Masaaki Kishimura
  • Process for preparation of modified methacrylic resin molding material
    Patent number: 5047188
    Abstract: Disclosed is a process for the preparation of a modified methacrylic resin molding material, wherein a volatile component is removed from a methacrylic polymer composition containing a volatile component including an unreacted monomer, a solvent or a by-product, and a modifying polymer is added to the methacrylic polymer composition to prepare a modified molding material.
    Type: Grant
    Filed: June 21, 1989
    Date of Patent: September 10, 1991
    Assignee: Mitsubishi Rayon Company, Ltd.
    Inventors: Kazuya Okada, Masahiro Taniguchi, Yasunori Shimomura, Hidemi Tanaka, Tsutomu Matsui
  • Methacrylic resin composition
    Patent number: 4558098
    Abstract: There is provided a heat-resistant methacrylic resin composition, which comprises 1 to 99% by weight of a copolymer [I] obtained by copolymerizing methyl methacrylate, an aromatic vinyl compound and maleic anhydride and 99 to 1% by weight of a copolymer [II] obtained by copolymerizing 80 to 100% by weight of methyl methacrylate and 0 to 20% by weight of other copolymerizable ethylenic monomer.The resin composition according to the present invention is excellent in characteristics such as optical characteristics, mechanical properties, weathering resistance and molding processability as well as in productivity.
    Type: Grant
    Filed: December 19, 1983
    Date of Patent: December 10, 1985
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Kazumasa Kamata, Yoshio Nakai, Yasunori Shimomura
  • Process for producing a low hygroscopic methacrylic resin and information recording substrates made therefrom
    Patent number: 4509163
    Abstract: A methacrylic resin having reduced water absorption properties, useful in optical instruments and as information recording substrates, is produced by polymerizing a mixture consisting of (A) 50 to 85% by weight of a methyl methacrylate, (B) 15 to 50 by weight of a cyclohexyl methacrylate and (C) 0 to 30% by weight of the other copolymerizable with said monomer (A) and (B), or partially polymerized product thereof.
    Type: Grant
    Filed: June 22, 1983
    Date of Patent: April 2, 1985
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Kazumasa Kamada, Katsumi Tamai, Yasunori Shimomura, Kazunori Abe