Patents by Inventor Yasuo Hatanaka

Yasuo Hatanaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120231427
    Abstract: An apparatus displaying a job screen indicating a job procedure, has a management unit that manages a job and a plurality of processes, a monitor unit that monitors an operation of an operator, a recorder unit that records an address of a job, an instructing unit that retrieves an address in response to a notification, determines whether to update the retrieved address in response to a type of a notified operation, and stores the updated address when the retrieved address has been updated, a storage unit that stores the job screen, and a control unit that reads the job screen and controls the read job screen, wherein the management unit retrieves the updated address, and instructs the display control unit to display the job screen, and wherein the display control unit reads out the instructed job screen.
    Type: Application
    Filed: January 6, 2012
    Publication date: September 13, 2012
    Applicant: Fujitsu Limited
    Inventors: Kazuki Kitamura, Mitsutaka Kaneki, Yuichiro Kitagawa, Yasuo Hatanaka, Hiroshi Kobayashi
  • Patent number: 5663271
    Abstract: A polysilane of Formula [I] or [II]: ##STR1## (wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.9, R.sup.10, R.sup.11, R.sup.12, R.sup.13 and R.sup.14 denote independently hydrogen, alkyl, aryl, alkenyl, alkynyl, silyl, and amino groups. R.sup.1 and R.sup.2, R.sup.3 and R.sup.4, R.sup.5 and R.sup.6, R.sup.7 and R.sup.8, R.sup.13 and R.sup.14, R.sup.10 and R.sup.11 can form a ring with the silicon bonded to each group. m is 0 or 1. n is an integer.);and a method for synthesizing the polysilane of Formula [I] or [II] in which a small-ring polysilane is reacted (in a solvent) with an organolithium reagent, and then treated with silanes possessing a leaving group. The resulting polysilanes have a homogeneous molecular weight distribution and are useful as a functional polymer for nonlinear optical materials and electroconductive polymers.
    Type: Grant
    Filed: November 9, 1995
    Date of Patent: September 2, 1997
    Inventor: Yasuo Hatanaka