Abstract: An electromagnetic wave transmission cable for transmitting an electromagnetic wave comprises a hollow waveguide tube and a foamed resin member. The hollowing waveguide tube includes a hollow dielectric layer formed in a tubular shape. The foamed resin member is provided over a predetermined length in a longitudinal direction of the hollow waveguide tube and covers a surface of the dielectric layer to surround an outer periphery of the hollow waveguide tube.

Abstract: An electromagnetic wave transmission cable for transmitting an electromagnetic wave comprises a hollow waveguide tube and a foamed resin member. The hollowing waveguide tube includes a hollow dielectric layer formed in a tubular shape. The foamed resin member is provided over a predetermined length in a longitudinal direction of the hollow waveguide tube and covers a surface of the dielectric layer to surround an outer periphery of the hollow waveguide tube.

Abstract: A signal generating unit of a formatter inputs a misalignment amount ? unique to an individual recording apparatus and record data into a record signal compensation unit, and in accordance with these the record signal compensation unit generates a compensated beam deflection signal and substrate velocity signal to a beam unit and rotation and movement drive unit. With this arrangement, it is possible to perform compensation which matches errors in individual unit, in response to the errors (mechanical errors) in assembly dimension precision of parts and control precision of control devices which can vary among individual unit of the recording apparatus.

Abstract: An oxide material (102) is used as masking for patterning by etching which is performed with respect to a substrate or a material laminated on the substrate (101). The oxide material is also used in a multi-step etching which is performed by using a resist (103) formed on the oxide material as a mask. The etching rate of the oxide material for a reaction gas containing an inert gas or hydrogen is higher than the etching rate of the resist for the reaction gas containing an inert gas or hydrogen, while the etching rate of the oxide material for a fluorine-containing gas is lower than the etching rate of the material, which is to be patterned by using the oxide material as a mask, for the fluorine-containing gas. In addition, the oxide material is soluble in a weak acid.

Abstract: A polycrystalline aluminum thin film is made of polycrystals of an alloy of aluminum. The polycrystalline aluminum thin film includes a first additive which is distributed with even concentration over an inside of each crystal grain and an interface of the crystal grain and a second additive which is distributed with higher concentration in the interface of the crystal grain than in the inside of the crystal grain.

Abstract: After a transfer material was hardened in a situation an imprint mold which has a concave part pattern is forced against the liquid transfer material, a replica which has a convex part pattern corresponding to the concave part pattern by releasing the imprint mold. A pressurization mechanism and a vacuum pump are set, regarding depth K of the concave part pattern of the imprint mold, height k of the convex part pattern of the transfer material, effective pressure Mo while the imprint mold is forced, pressure P in the space, with satisfying: Mo/P?k/(K?k). With this arrangement, even if air comes inside of the concave part pattern of the imprint mold and is stuffed in the inside, it is possible to have transcription with no problem.

Abstract: A polycrystalline aluminum thin film is made of polycrystals of an alloy of aluminum. The polycrystalline aluminum thin film includes a first additive which is distributed with even concentration over an inside of each crystal grain and an interface of the crystal grain and a second additive which is distributed with higher concentration in the interface of the crystal grain than in the inside of the crystal grain.

Abstract: The main object of the present invention is to provide an optical recording medium with no need to use a control subject substance of the PRTR law, capable of using for an optical recording device with a blue laser, and giving consideration to the environmental aspect. To attain the object, the present invention provides an optical recording medium comprising: a reflective layer containing an aluminum composition as the main component including both aluminum or an aluminum alloy and a metal oxide of a metal other than aluminum; and a dielectric protective layer, formed in contact with the reflective layer, containing a niobium composition as the main component including both silicon dioxide or titanium dioxide and a niobium nitrided oxide.

Abstract: A polycrystalline aluminum thin film is made of polycrystals of an alloy of aluminum. The polycrystalline aluminum thin film includes a first additive which is distributed with even concentration over an inside of each crystal grain and an interface of the crystal grain and a second additive which is distributed with higher concentration in the interface of the crystal grain than in the inside of the crystal grain.

Abstract: The invention mainly intends to provide a resist material that is high in the sensitivity to light and an electron beam and enables to form a clear and fine pattern with less exposure. In order to achieve the object, the invention provides a resist material comprising a metal compound, wherein a metal element constituting the metal compound is a 14th group or 15th group metal element and the metal compound is a stoichiometrically incomplete compound.

Abstract: A transfer mold for manufacturing a recording medium by imprinting, having a transfer surface on which a data area having a data track pattern for a disk-shaped recording medium and a dummy area having a dummy pattern in an outward portion and/or an inward portion of the data area are formed. The dummy pattern includes at least one line of a plurality of dummy protrusions that have a width in a disk radial direction of no less than a track pitch of the data track pattern.

Abstract: An oxide material (102) is used as masking for patterning by etching which is performed with respect to a substrate or a material laminated on the substrate (101). The oxide material is also used in a multi-step etching which is performed by using a resist (103) formed on the oxide material as a mask. The etching rate of the oxide material for a reaction gas containing an inert gas or hydrogen is higher than the etching rate of the resist for the reaction gas containing an inert gas or hydrogen, while the etching rate of the oxide material for a fluorine-containing gas is lower than the etching rate of the material, which is to be patterned by using the oxide material as a mask, for the fluorine-containing gas. In addition, the oxide material is soluble in a weak acid.

Abstract: The main object of the present invention is to provide a substrate for storage media capable of recording and reproducing data for a limited period and capable of being easily recycled, and a method for manufacturing a recycled resin substrate reusable as such a substrate for storage media. In order to achieve the aforementioned object, the present invention provides a substrate for storage media comprising: a resin substrate containing a starch resin; and a resin layer formed on the resin substrate.

Abstract: A polycrystalline aluminum thin film is made of polycrystals of an alloy of aluminum. The polycrystalline aluminum thin film includes a first additive which is distributed with even concentration over an inside of each crystal grain and an interface of the crystal grain and a second additive which is distributed with higher concentration in the interface of the crystal grain than in the inside of the crystal grain.

Abstract: A pattern transfer stamper 1 according to the present invention transfers an uneven pattern to a deformable surface of a member which is a base for manufacturing a magnetic disc D including a data region 81 and a servo region 82 positioned adjacent to the data region 81 in the circumferential direction. The pattern transfer stamper 1 includes at least a guard band pattern portion 11 corresponding to the data region 81. The guard band pattern portion 11 includes linear projections 11a extending in the circumferential direction and spaced from each other in the radial direction. A support projection 15 for supporting ends 11b of the linear projections 11a is provided to be integrally connected to the ends.

Abstract: A signal generating unit of a formatter inputs a misalignment amount ? unique to an individual recording apparatus and record data into a record signal compensation unit, and in accordance with these the record signal compensation unit generates a compensated beam deflection signal and substrate velocity signal to a beam unit and rotation and movement drive unit. With this arrangement, it is possible to perform compensation which matches errors in individual unit, in response to the errors (mechanical errors) in assembly dimension precision of parts and control precision of control devices which can vary among individual unit of the recording apparatus.

Abstract: An information recording medium has an excellent jitter characteristic with a considerable difference in reflectance between prior to and subsequent to recording. The information recording medium includes a recording layer which contains a material having a reflectance which varies by irradiation of a light beam, on which information is recorded as reflectance variations, and a substrate for supporting the recording layer, the recording layer including a metal nitride as a major component.

Abstract: After a transfer material was hardened in a situation an imprint mold which has a concave part pattern is forced against the liquid transfer material, a replica which has a convex part pattern corresponding to the concave part pattern by releasing the imprint mold. A pressurization mechanism and a vacuum pump are set, regarding depth K of the concave part pattern of the imprint mold, height k of the convex part pattern of the transfer material, effective pressure Mo while the imprint mold is forced, pressure P in the space, with satisfying: Mo/P?k/(K?k). With this arrangement, even if air comes inside of the concave part pattern of the imprint mold and is stuffed in the inside, it is possible to have transcription with no problem.

Abstract: The main object of the present invention is to provide an optical recording medium with no need to use a control subject substance of the PRTR law, capable of using for an optical recording device with a blue laser, and giving consideration to the environmental aspect. To attain the object, the present invention provides an optical recording medium comprising: a reflective layer containing an aluminum composition as the main component including both aluminum or an aluminum alloy and a metal oxide of a metal other than aluminum; and a dielectric protective layer, formed in contact with the reflective layer, containing a niobium composition as the main component including both silicon dioxide or titanium dioxide and a niobium nitrided oxide.

Abstract: Diffusion of water or oxygen present in the dielectric protection film is restrained by eliminating free oxygen in an oxide thin film while maintaining the characteristics of a dielectric protection film. As the dielectric material for forming a dielectric protection film for an optical disc or the like, an oxide mixture thin film of a niobium oxide and one of a silicon oxide and a titanium oxide is used. In a preferable example, a target made of a niobium oxide as the main component with 1 to 30% by weight of a silicon oxide added is used for formation of an oxide thin film by sputtering. Moreover, the oxide thin film is formed preferably in a nitrogen atmosphere. A nitrogen containing oxide thin film is produced by carrying out sputtering using a target with the oxygen lacked and a minute amount of nitrogen added. Thereby, a thin film having little reducing function and a high barrier property while having the characteristics comparable to a complete oxide can be produced.