Patents by Inventor Yasuo Kataoka

Yasuo Kataoka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6389049
    Abstract: A discharge circuit for pulsed laser comprising a power source, main discharge electrodes for generating a laser beam, a main discharge capacitor charged with electrical charges for generating the main discharge between the main discharge electrodes, and a switching circuit for performing switching operations to charge the main discharge capacitor with electrical charges supplied from the power source in a prescribed repetition cycle, is provided, in parallel to the main discharge capacitors, with a circuit element for consuming or grounding the reverse current from the power source caused by overshoot generated directly after the main discharge, thereby attaining stable laser output without ill effects from overshoot voltage generated directly following discharge.
    Type: Grant
    Filed: October 5, 1998
    Date of Patent: May 14, 2002
    Assignees: Komatsu Ltd., Kabushiki Kaisha Meidensha
    Inventors: Daisuke Yoshida, Toshihiro Nishisaka, Yuichi Takabayashi, Takashi Matsunaga, Hisashi Yanase, Tadao Shibuya, Yasuo Kataoka, Masayuki Tani, Eiji Sasamoto, Hiroyuki Hiyoshi, Kiyoshi Hara
  • Publication number: 20020003820
    Abstract: A discharge circuit for pulsed laser comprising a power source, main discharge electrodes for generating a laser beam, a main discharge capacitor charged with electrical charges for generating the main discharge between the main discharge electrodes, and a switching circuit for performing switching operations to charge the main discharge capacitor with electrical charges supplied from the power source in a prescribed repetition cycle, is provided, in parallel to the main discharge capacitors, with a circuit element for consuming or grounding the reverse current from the power source caused by overshoot generated directly after the main discharge, thereby attaining stable laser output without ill effects from overshoot voltage generated directly following discharge.
    Type: Application
    Filed: October 5, 1998
    Publication date: January 10, 2002
    Inventors: DAISUKE YOSHIDA, TOSHIHIRO NISHISAKA, YUICHI TAKABAYASHI, TAKASHI MATSUNAGA, HISASHI YANASE, TADAO SHIBUYA, YASUO KATAOKA, MASAYUKI TANI, EIJI SASAMOTO, HIROYUKI HIYOSHI, KIYOSHI HARA
  • Patent number: 5043407
    Abstract: Hydrophilic fine gel particles, said particles being crosslinked polymer particles comprising 20-94.8% by weight of a monoethylenically unsaturated amide monomer, 5-60.0% by weight of a crosslinkable ethylenically unsaturated monomer, 0.1-30% by weight of an ethylenically unsaturated carboxylic acid, 0.1-50% by weight of an ester monomer of an acrylic or methacrylic acid, and 0-30% by weight of a monomer copolymerizable with the above-mentioned monomers, said particles having a particle diameter in a water-swollen state of 0.1-10 .mu.m and a weight-average particle diameter/number-average particle diameter ratio of 1.2 or less; and a process for producing hydrophilic fine gel particles having a particle diameter in a water-swollen state of 0.1-10 .mu.m and a weight-average particle diameter/number-average particle diameter ratio of 1.2 or less, which comprises copolymerizing a monomer mixture of 20-94.8% by weight of a monoethylenically unsaturated amide monomer, 5-60.
    Type: Grant
    Filed: July 24, 1990
    Date of Patent: August 27, 1991
    Assignee: Nippon Zeon Co., Ltd.
    Inventors: Jun Hasegawa, Haruki Oikawa, Osamu Kobayashi, Yasuo Kataoka, Masayoshi Sekiya
  • Patent number: 4988568
    Abstract: Hydrophilic fine gel particles, said particles being crosslinked polymer particles comprising 20-94.8% by weight of a monoethylenically unsaturated amide monomer, 5-60.0% by weight of a crosslinkable ethylenically unsaturated monomer, 0.1-30% by weight of an ethylenically unsaturated carboxylic acid, 0.1-50% by weight of an ester monomer of an acrylic or methacrylic acid, and 0-30% by weight of a monomer copolymerizable with the above-mentioned monomers, said particles having a particle diameter in a water-swollen state of 0.1-10 .mu.m and a weight-average particle diameter/number-average particle diameter ratio of 1.2 or less; and a process for producing hydrophilic fine gel particles having a particle diameter in a water-swollen state of 0.1-10 .mu.m and a weight-average particle diameter/number-average particle diameter ratio of 1.2 or less, which comprises copolymerizing a monomer mixture of 20-94.8% by weight of a monoethylenically unsaturated amide monomer, 5-60.
    Type: Grant
    Filed: March 28, 1989
    Date of Patent: January 29, 1991
    Assignee: Nippon Zeon Co., Ltd.
    Inventors: Jun Hasegawa, Haruki Oikawa, Osamu Kobayashi, Yasuo Kataoka, Masayoshi Sekiya