Abstract: Provided is a temperature measuring instrument 7 for a high temperature and pressure furnace having a structure capable of preventing relative displacement of an insulating tube 10 with respect to a pair of metal bodies 8a and 8b. A distal end engaging portion 22 is provided in an axial direction end portion of the insulating tube 10. The temperature measuring instrument 7 is additionally provided with connecting members 15 and 17 which connect distal end portions of the pair of metal bodies 8a and 8b to one another. The insulating tube 10 is locked to the connecting members 15 and 17 at the distal end engaging portion 22 in such a way as to restrict relative displacement in the circumferential direction with respect to the pair of metal bodies 8a and 8b.

Abstract: In a self-tightening type sealing device according to the present invention, not only a sealing member is tightened by an internal pressure, but also a tightening force imparting device which tightens the sealing member separately from the internal pressure is provided so as to be remotely operable by a controller. This construction remedies drawbacks involved in manual operation of the tightening force imparting device.

Abstract: In reforming mechanical characteristics of a precipitation hardening type Al alloy casting, the Al alloy casting is subjected to a high temperature/high pressure treatment, then the pressure is reduced while maintaining the temperature of the Al alloy casting, and subsequently the Al alloy casting is subjected to solution treatment, quenching, and aging in this order. According to this method, mechanical characteristics of the casting can be reformed efficiently and economically and there can be obtained a reformed product of good quality.

Abstract: A treatment chamber for heating and pressing workpieces and a heat insulating structure which covers the treatment chamber sideways and from above are provided within a high-pressure vessel. Below the treatment chamber are disposed a base heater for heating a pressure medium gas and a fan for supplying the pressure medium gas in a heated state into the treatment chamber and stirring the heated gas. The workpieces can be held on the heat insulating structure side, and the heat insulating structure and the workpieces can be taken out from the interior of the high-pressure vessel and can be conveyed together separately from a lower lid of the high-pressure vessel. A hot isostatic pressing apparatus is provided less expensively which can heat and press workpieces at a relatively low temperature of not higher than 600° C. Besides, it is possible to shorten the cycle time in HIP.

Abstract: In a self-tightening type sealing device according to the present invention, not only a sealing member is tightened by an internal pressure, but also a tightening force imparting device which tightens the sealing member separately from the internal pressure is provided so as to be remotely operable by a controller. This construction remedies drawbacks involved in manual operation of the tightening force imparting device.

Abstract: While a workpiece is heated and pressed by one of a pair of high-pressure vessels, a workpiece being pressed by the other high-pressure vessel is placed in a heated state. In the reducing process after termination of heating and pressing treatment of the workpiece by one high-pressure vessel, both the high-pressure vessels are placed in communication, and the pressure medium gas released from one high-pressure vessel is poured into the other high-pressure vessel. After pressures of both the high-pressure vessels have assumed a nearly balanced state, the pressure medium gas is sucked out of one high-pressure vessel by a compressor and pressed, and is poured into the other high-pressure vessel, and the workpiece is heated and pressed by the other high-pressure vessel. By the method as described, considerable shortening of cycle time of HIP treatment is achieved, and the HIP treatment can be carried out with high efficiency.

Abstract: In reforming mechanical characteristics of a precipitation hardening type Al alloy casting, the Al alloy casting is subjected to a high temperature/high pressure treatment, then the pressure is reduced while maintaining the temperature of the Al alloy casting, and subsequently the Al alloy casting is subjected to solution treatment, quenching, and aging in this order. According to this method, mechanical characteristics of the casting can be reformed efficiently and economically and there can be obtained a reformed product of good quality.

Abstract: While a workpiece is heated and pressed by one of a pair of high-pressure vessels, a workpiece being pressed by the other high-pressure vessel is placed in a heated state. In the reducing process after termination of heating and pressing treatment of the workpiece by one high-pressure vessel, both the high-pressure vessels are placed in communication, and the pressure medium gas released from one high-pressure vessel is poured into the other high-pressure vessel. After pressures of both the high-pressure vessels have assumed a nearly balanced state, the pressure medium gas is sucked out of one high-pressure vessel by a compressor and pressed, and is poured into the other high-pressure vessel, and the workpiece is heated and pressed by the other high-pressure vessel. By the method as described, considerable shortening of cycle time of HIP treatment is achieved, and the HIP treatment can be carried out with high efficiency.

Abstract: A treatment chamber for heating and pressing workpieces and a heat insulating structure which covers the treatment chamber sideways and from above are provided within a high-pressure vessel. Below the treatment chamber are disposed a base heater for heating a pressure medium gas and a fan for supplying the pressure medium gas in a heated state into the treatment chamber and stirring the heated gas. The workpieces can be held on the heat insulating structure side, and the heat insulating structure and the workpieces can be taken out from the interior of the high-pressure vessel and can be conveyed together separately from a lower lid of the high-pressure vessel. A hot isostatic pressing apparatus is provided less expensively which can heat and press workpieces at a relatively low temperature of not higher than 600° C. Besides, it is possible to shorten the cycle time in HIP.

Abstract: According to a menu item selected in step S12 (a pressed command button), for a wafer exposing pattern, program goes to steps S13 and S14, and further, display in step S15, inspection in step S16 or modification in step 17 is performed; for a block pattern on a stencil mask, program goes to steps 13 and 24, and further display in step S25, inspection in step S26 or modification in step S27 is performed. In step S16 exposure simulation is performed, in step S15 a result thereof is displayed and in step S17 wafer exposing pattern data are modified based on the result. When a block pattern on a stencil mask is modified, the instances of the block pattern in the wafer exposing pattern data is simultaneously modified as well.

Abstract: The basis of the present invention is a charged particle beam exposure method comprising the steps of: (a) generating a plurality of areas within the sub-fields; (b) determining the pattern density within each of the areas, and correcting the pattern density in accordance with the pattern density of areas surrounding the area and the distance between areas; (c) generating a supplementary exposure pattern in the area when the corrected pattern density for the area is lower than a prescribed reference exposure density; and (d) exposing the material in accordance with exposure data comprising the supplementary exposure pattern data appended to the pattern data. A first invention comprises a step for further generating a supplementary exposure pattern in areas lying between pattern existing regions where the patterns are located, and having a pattern density higher than the reference exposure density, when the distance between the pattern existing regions is greater than a prescribed reference distance.

Abstract: The basis of the present invention is a charged particle beam exposure method comprising the steps of: (a) generating a plurality of areas within the sub-fields; (b) determining the pattern density within each of the areas, and correcting the pattern density in accordance with the pattern density of areas surrounding the area and the distance between areas; (c) generating a supplementary exposure pattern in the area when the corrected pattern density for the area is lower than a prescribed reference exposure density; and (d) exposing the material in accordance with exposure data comprising the supplementary exposure pattern data appended to the pattern data. A first invention comprises a step for further generating a supplementary exposure pattern in areas lying between pattern existing regions where the patterns are located, and having a pattern density higher than the reference exposure density, when the distance between the pattern existing regions is greater than a prescribed reference distance.

Abstract: The present invention relates to a charged particle beam exposure method, wherein exposure data having exposure pattern data for each of a plurality of sub-fields located in a main field are acquired from pattern data for each of the sub-fields and a sample is exposed in accordance with the exposure data. The method comprises the steps of: forming a plurality of areas having different shapes, in accordance with patterns in the sub-fields, and acquiring pattern densities in the areas; correcting the pattern densities in accordance with pattern densities for areas surrounding the areas and with distances between the areas; generating auxiliary exposure patterns in the areas when the pattern densities for the areas are lower than a predetermined reference exposure density; and exposing the sample in accordance with the exposure data obtained by adding the data for the auxiliary exposure patterns to the pattern data.

Abstract: An exposure data preparing apparatus includes a field placement editor for placing exposure patterns that correspond to design data. Placement is done for each sub-field obtained by dividing a field on an LSI to be designed, and each sub-field has a size that can be covered by deflection of a beam from an exposure apparatus. A map preparing editor prepares a plurality of maps that can be covered by a single shot of the charged particle beam, by dividing the sub-field in which the exposure pattern is placed. A CPU determines a beam dosage of the charged particle beam derived from a density of the exposure pattern in the map.

Abstract: A method for processing exposure data corresponding to a pattern formed on a wafer includes the steps of (a) generating electron dose data relating to exposure per each pattern in an area to be exposed, (b) calculating exposure distance data which shows a degree to correct the electron dose data based on positional relations of each pattern as a pattern to be corrected in sequence with patterns in a predetermined range in the periphery thereof, based on the electron dose data determined by the step (a), (c) correcting the electron dose data determined by the step (a) with the exposure distance data determined by the step (b) to generate corrected electron dose data of each pattern, and (d) calculating an irradiation amount of each pattern based on the corrected electron dose data.

Abstract: The invention relates to a process for producing a sintered body of calcium carbonate without permitting thermal decomposition of calcium carbonate during sintering, and to the sintered body. A powder material primarily comprising calcium carbonate is subjected to a cold powder pressing process to prepare a green compact, which is then heated in a high-pressure gas atmosphere consisting essentially of an inert gas at a temperature t.degree. C. of900.ltoreq.t<1200and at a high gas pressure P kgf/cm.sup.

Abstract: A process for preparation of capsule for use in isostatic pressing treatment, the process comprising a first step of enclosing a material to be treated, such as ceramic, metal, resin, etc. with metallic foil having a thickness of from 30 to 300 .mu.m, and a second step of welding the metallic foil so as to seal the material to be treated in the metallic foil thus welded, thereby preparing a capsule, wherein the welding is carried out by means of TIG welding. Alternatively, the welding may be carried out by means of seam resistance welding. It is posible, by the process, to seal the material to be treated in a capsule easily and economically. The capsule thus obtained is in a good sealed condition, permits effective isostatic pressing treatment, and enables the treated material to be taken out easily. A ceramic or metal layer covers the material to be treated to prevent adhesion between the material and the metallic foil.

Abstract: Described herein is a method of encapsulating a material to be processed by warm or hot isostatic pressing, and an apparatus suitable for practicing the method, which basically includes the steps of (a) enveloping a processing material in the form of loose or compacted powder with a metal foil of 30 .mu.m in thickness, and (b) welding overlying and underlying metal foil portions to encapsulate said material in said metal foil in sealed state.