Patents by Inventor Yasuo Niimura

Yasuo Niimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6043608
    Abstract: This invention discloses a plasma processing apparatus for carrying out a process onto a substrate utilizing a plasma generated by supplying RF energy with a plasma generation gas. This apparatus comprises a vacuum chamber having a pumping system, a substrate holder for placing the substrate to be processed in the vacuum chamber, a gas introduction means for introducing the plasma generation gas into a plasma generation space, an energy supply means for supplying the RF energy with the plasma generation gas. The antenna has multiple antenna elements provided symmetrically to the center on the axis of the substrate and an end shorting member shorting each end of the antenna elements so that an RF current path symmetrical to the center is applied. Multiple circuits resonant at a frequency of the RF energy are formed symmetrically of the antenna elements and the end shorting member.
    Type: Grant
    Filed: October 31, 1997
    Date of Patent: March 28, 2000
    Assignees: NEC Corporation, Anelva Corporation, Nihon Koshuha Co., Ltd.
    Inventors: Seiji Samukawa, Yukito Nakagawa, Hisaaki Sato, Tsutomu Tsukada, Kibatsu Shinohara, Yasuo Niimura