Abstract: Provided is a method for manufacturing fullerene 1,3-dioxolane conveniently at high yield. Fullerene 1,3-dioxolane is manufactured by reacting a fullerene oxide and a carbonyl compound in the presence of a catalyst.

Abstract: Provided is a method for manufacturing fullerene 1,3-dioxolane conveniently at high yield. Fullerene 1,3-dioxolane is manufactured by reacting a fullerene oxide and a carbonyl compound in the presence of a catalyst.

Abstract: A printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating a substrate with a photosensitive resin composition comprising an oxygen sensitizer and a cis-diene-substituted polyamic acid or polyimide and forming fine patterns by exposure to radiation. Processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device, which comprises coating a substrate with the photosensitive resin composition and forming fine patterns by crosslinking cis-diene by oxidation polycondensation with singlet oxygen generated by exposure of the oxygen sensitizer to radiation. The photosensitive resin composition is of the negative type and exhibits high sensitivity and high resolution. The photosensitive resin composition forms a resin layer having excellent heat resistance.

Abstract: A photosensitive resin composition comprising an oxygen sensitizer and a polyamic acid or a polyimide which has substituents having a cis-diene structure at the side chains; a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating the substrate with the composition and forming fine patterns by exposure of irradiation; and processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device which comprise coating the substrate with the composition and forming fine patterns by crosslinking the cis-diene group by polycondensation with oxidation with the singlet oxygen generated by exposure of irradiation to the oxygen sensitizer in the presence of oxygen.

Abstract: A photosensitive resin composition comprising an oxygen sensitizer and a cis-diene-substituted polyamic acid or a polyimide. A printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating a substrate with the photosensitive resin composition and forming fine patterns by exposure to radiation. Processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device, which comprise coating a substrate with the photosensitive resin composition and forming fine patterns by crosslinking cis-diene by oxidation polycondensation with singlet oxygen generated by exposure of the oxygen sensitizer to radiation. The photosensitive resin composition is of the negative type and exhibits high sensitivity and high resolution. The photosensitive resin composition can form a resin layer having excellent heat resistance.

Abstract: An image-forming process developing a previously image-exposed silver halide photographic material with an alkaline developer containing a reductone compound as a main developing agent in the presence of a 1,2,5-thiadiazole compound and/or a 2,1,3-benzothiadiazole compound, and the silver halide photographic material and the photographic developer being used for the process are disclosed. In this case, the 1,2,5-thuiadiazole compound and/or the 2,1,3-benzothiadiazole may be contained in the silver halide photographic material and/or the alkaline developer. Super high-contrast images for photomechanical process having a gamma of higher than 15 and having no pepper and less fog can be obtained.

Abstract: An image-forming process developing a previously image-exposed silver halide photographic material with an alkaline developer containing a reductone compound as a main developing agent in the presence of a 1,2,5-thiadiazole compound and/or a 2,1,3-benzothiadiazole compound, and the silver halide photographic material and the photographic developer being used for the process are disclosed. In this case, the 1,2,5-thuiadiazole compound and/or the 2,1,3-benzothiadiazole may be contained in the silver halide photographic material and/or the alkaline developer. Super high-contrast images for photomechanical process having a gamma of higher than 15 and having no pepper and less fog can be obtained.

Abstract: A process of forming a super high-contrast negative image is disclosed, which comprises the steps of imagewise exposing a negative-working silver halide photographic material comprising a support having thereon one or more hydrophilic colloidal layers, at least one of the one or more hydrophilic colloidal layers being a negative-working silver halide emulsion layer, and then developing the photographic material with a developer containing an aminophenol derivative developing agent and a reductone compound in the existence of an organic compound having a negative reduction potential. A negative-working silver halide photographic material and a photographic developer being used for the image-forming process are also disclosed.

Abstract: A process of forming a super high-contrast negative image is disclosed, which comprises the steps of imagewise exposing a negative-working silver halide photographic material comprising a support having thereon one or more hydrophilic colloidal layers, at least one of the one or more hydrophilic colloidal layers being a negative-working silver halide emulsion layer, and then developing the photographic material with a developer containing an aminophenol derivative developing agent and a reductone compound in the existence of an organic compound having a negative reduction potential. A negative-working silver halide photographic material and a photographic developer being used for the image-forming process are also disclosed.

Abstract: A direct positive silver halide photographic material and a method for forming a high contrast image using the same are disclosed, in which a pre-fogged direct positive silver halide emulsion layer contains a salt of a nitrogen-containing compound having at least one pyridine nucleus and at least one pyridinium nucleus. The photographic material, after imagewise exposure, is developed with an alkaline developer containing a developing agent, preferably a reductance compound. The photographic material provides high contrast characteristics having a gamma exceeding 10.

Abstract: A silver halide photographic material is disclosed. The photographic material comprises a support having coated thereon one or more hydrophilic colloidal layers, at least one of the hydrophilic colloidal layers being a negative working silver halide emulsion layer, wherein said silver halide emulsion layer or another hydrophilic colloidal layer contains a water-soluble polymer or copolymer having a quaternary ammonium salt in a repeating unit. The process for forming a high contrast negative image using the photographic material is also disclosed.

Abstract: A developer for light-sensitive material capable of processing in common a negative-working light-sensitive lithographic printing plate and a positive-working light-sensitive printing plate as well as a developing agent-containing type silver halide photographic material, is disclosed. The developer comprises an alkali agent, an anionic surface active agent, an antifoggant for a silver halide photographic material, and an alkylene oxide addition product (molecular weight of from 130 to 1200) of an aromatic amine or an aralkyl amine, and has pH of the range of from 11.5 to 13.5.

Abstract: A process of forming superhigh-contrast negative images is disclosed. The process comprises the steps of imagewise exposing a substantially surface latent image-type silver halide photographic material which is spectrally sensitized with a sensitizing dye and then developing said photographic material with a developer, wherein said photographic material contains a heterocyclic thione compound and said developer comprises (a) an aminophenol derivative developing agent, (b) a reductone compound, (c) a quaternary ammonium salt, and (d) a compound represented by formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3, which may be the same or different, each represents a hydrogen atom, a nitro group, a halogen atom, or a cyano group, and wherein said development processing is carried out in the existence of at least one kind of a polyalkylene oxide or a derivative thereof. The process provides negative images of superhigh contrast having gamma over 10 substantially free from appearance of pepper.

Abstract: A lith-type silver halide photographic material comprising a tetrahydro-1,3,5-triazine-2-thione derivative and a polyalkylene oxide derivative.