Patents by Inventor Yasuo Takama

Yasuo Takama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090237633
    Abstract: An exposure apparatus which exposes a substrate via a liquid, comprises: a projection optical system configured to project a pattern of a reticle onto the substrate; a substrate stage configured to hold the substrate and move; a top plate which is arranged on the substrate stage and in which an opening is formed; and a measurement member which is arranged in the opening formed in the top plate arranged on the substrate stage, wherein a gap is formed between the top plate and the measurement member in a plane perpendicular to an optical axis of the projection optical system, and wherein the measurement member is formed of one of a regular N-sided polygon (N>4) and a circle in the plane.
    Type: Application
    Filed: June 4, 2009
    Publication date: September 24, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Shinichi Shima, Yasuo Takama
  • Exposure apparatus and device manufacturing method
    Patent number: 7570344
    Abstract: An exposure apparatus which exposes a substrate via a liquid, comprises: a projection optical system configured to project a pattern of a reticle onto the substrate; a substrate stage configured to hold the substrate and move; a top plate which is arranged on the substrate stage and in which an opening is formed; and a measurement member which is arranged in the opening formed in the top plate arranged on the substrate stage, wherein a gap is formed between the top plate and the measurement member in a plane perpendicular to an optical axis of the projection optical system, and wherein the exposure apparatus satisfies the following formula: ?·cos ?1·L1+?·cos ?2·L2+Pf·S<0.
    Type: Grant
    Filed: March 20, 2008
    Date of Patent: August 4, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shinichi Shima, Yasuo Takama
  • EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20080246938
    Abstract: An exposure apparatus which exposes a substrate via a liquid, comprises: a projection optical system configured to project a pattern of a reticle onto the substrate; a substrate stage configured to hold the substrate and move; a top plate which is arranged on the substrate stage and in which an opening is formed; and a measurement member which is arranged in the opening formed in the top plate arranged on the substrate stage, wherein a gap is formed between the top plate and the measurement member in a plane perpendicular to an optical axis of the projection optical system, and wherein the measurement member is formed of one of a regular N-sided polygon (N>4) and a circle in the plane.
    Type: Application
    Filed: March 20, 2008
    Publication date: October 9, 2008
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Shinichi Shima, Yasuo Takama