Patents by Inventor Yasusada Miyano

Yasusada Miyano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9815707
    Abstract: The present invention provides a method of processing discharge gas containing ammonia, hydrogen, nitrogen, and an organic metal compound discharged from the production process of a gallium nitride compound semiconductor. The discharge gas is brought into contact with a cleaning agent prepared by impregnating an alkali metal compound with a metal oxide to remove the organic metal compound from the discharge gas. The discharge gas from which an organic metal compound is removed is brought into contact with an ammonia decomposition catalyst on heating to decompose the ammonia into nitrogen and hydrogen. The discharge gas in which ammonia is decomposed is brought into contact with palladium alloy membrane on heating to recover hydrogen that has penetrated through the palladium alloy membrane.
    Type: Grant
    Filed: December 17, 2015
    Date of Patent: November 14, 2017
    Assignee: JAPAN PIONICS CO., LTD.
    Inventors: Kansei Izaki, Masanori Iwaki, Yasusada Miyano, Toshio Akiyama
  • Publication number: 20160101987
    Abstract: The present invention provides a method of processing discharge gas containing ammonia, hydrogen, nitrogen, and an organic metal compound discharged from the production process of a gallium nitride compound semiconductor. The discharge gas is brought into contact with a cleaning agent prepared by impregnating an alkali metal compound with a metal oxide to remove the organic metal compound from the discharge gas. The discharge gas from which an organic metal compound is removed is brought into contact with an ammonia decomposition catalyst on heating to decompose the ammonia into nitrogen and hydrogen. The discharge gas in which ammonia is decomposed is brought into contact with palladium alloy membrane on heating to recover hydrogen that has penetrated through the palladium alloy membrane.
    Type: Application
    Filed: December 17, 2015
    Publication date: April 14, 2016
    Inventors: Kansei IZAKI, Masanori IWAKI, Yasusada MIYANO, Toshio AKIYAMA
  • Publication number: 20140322124
    Abstract: The present invention provides a method of processing discharge gas containing ammonia, hydrogen, nitrogen, and an organic metal compound discharged from the production process of a gallium nitride compound semiconductor. The discharge gas is brought into contact with a cleaning agent prepared by impregnating an alkali metal compound with a metal oxide to remove the organic metal compound from the discharge gas. The discharge gas from which an organic metal compound is removed is brought into contact with an ammonia decomposition catalyst on heating to decompose the ammonia into nitrogen and hydrogen. The discharge gas in which ammonia is decomposed is brought into contact with palladium alloy membrane on heating to recover hydrogen that has penetrated through the palladium alloy membrane.
    Type: Application
    Filed: April 23, 2014
    Publication date: October 30, 2014
    Applicant: Japan Pionics Co., Ltd.
    Inventors: Kansei IZAKI, Masanori IWAKI, Yasusada MIYANO, Toshio AKIYAMA
  • Patent number: 6331281
    Abstract: There are disclosed a process for cleaning ammonia-containing exhaust gas which comprises bringing the exhaust gas into contact with an ammonia decomposition catalyst (e.g. nickel, ruthenium) under heating to decompose most of the ammonia into nitrogen and hydrogen, subsequently bringing the resultant mixed gas into contact with an ammonia adsorbent (e.g. synthetic zeolite) for adsorbing undecomposed ammonia, and then heating regenerating the adsorbent, while bringing reproduced exhaust gas containing the ammonia desorbed from the adsorbent into contact under heating, with the ammonia decomposition catalyst or another ammonia decomposition catalyst; and an apparatus for carrying out the process. It is made possible by the process and apparatus to efficiently and completely clean ammonia-containing exhaust gas exhausted from a semiconductor manufacturing process and the like without generating useless byproduct and dispensing with secondary treatment.
    Type: Grant
    Filed: October 7, 1999
    Date of Patent: December 18, 2001
    Assignee: Japan Pionics Co., Ltd.
    Inventors: Suehachi Teru, Yasusada Miyano, Noboru Akita, Kenji Otsuka, Takashi Shimada
  • Patent number: 6261345
    Abstract: There are disclosed a process for recovering ammonia which comprises installing a shell and multi-tube adsorber which is equipped with plural adsorption tubes each packed inside with an ammonia adsorbent (e.g. synthetic zeolite) and equipped with a flow mechanism for a heat transfer medium for performing heat exchange through the adsorption tubes, passing an ammonia-containing gas through the adsorption tubes, while cooling the adsorbent with a heat transfer medium (e.g. water) to adsorb the ammonia, and thereafter collecting the adsorbed ammonia through desorption, while heating the adsorbent with a heat transfer medium (e.g. hot water) under reduced pressure; and an apparatus for the above process.
    Type: Grant
    Filed: October 7, 1999
    Date of Patent: July 17, 2001
    Assignee: Japan Pionics Co., Ltd.
    Inventors: Yasusada Miyano, Kenji Otsuka, Satoshi Arakawa