Patents by Inventor Yasushi Ebizuka

Yasushi Ebizuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210027976
    Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
    Type: Application
    Filed: October 1, 2020
    Publication date: January 28, 2021
    Inventors: Akira IKEGAMI, Yuta KAWAMOTO, Naomasa SUZUKI, Manabu YANO, Yasushi EBIZUKA, Naoma BAN
  • Patent number: 10832886
    Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
    Type: Grant
    Filed: March 4, 2019
    Date of Patent: November 10, 2020
    Assignee: Hitachi High-Tech Corporation
    Inventors: Akira Ikegami, Yuta Kawamoto, Naomasa Suzuki, Manabu Yano, Yasushi Ebizuka, Naoma Ban
  • Publication number: 20200294757
    Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.
    Type: Application
    Filed: February 5, 2020
    Publication date: September 17, 2020
    Inventors: Yuta KAWAMOTO, Akira IKEGAMI, Yasushi EBIZUKA, Nobuo FUJINAGA
  • Publication number: 20190393014
    Abstract: The objective of the present invention is to provide a charged-particle beam device capable of moving a field-of-view to an exact position even when moving the field-of-view above an actual sample. In order to attain this objective, a charged-particle beam device is proposed comprising an objective lens whereby a charged-particle beam is focused and irradiated onto a sample: a field-of-view moving deflector for deflecting the charged-particle beam; and a stage onto which the sample is placed.
    Type: Application
    Filed: January 12, 2017
    Publication date: December 26, 2019
    Inventors: Yuta KAWAMOTO, Akira IKEGAMI, Yasushi EBIZUKA, Naoma BAN
  • Publication number: 20190287754
    Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
    Type: Application
    Filed: March 4, 2019
    Publication date: September 19, 2019
    Inventors: Akira IKEGAMI, Yuta KAWAMOTO, Naomasa SUZUKI, Manabu YANO, Yasushi EBIZUKA, Naoma BAN
  • Patent number: 9799486
    Abstract: In a charged particle beam apparatus that applies a retarding voltage to a sample through a contact terminal and executes measurement or inspection of a surface of the sample, potential variation of the sample when changing the retarding voltage applied to the contact terminal is measured by a surface potential meter, a time constant of the potential variation of the sample is obtained, and it is determined whether execution of measurement or inspection by a charged particle beam continues or stops based on the time constant, or a conduction ensuring process between the sample and the contact terminal is executed.
    Type: Grant
    Filed: July 10, 2015
    Date of Patent: October 24, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Seiichiro Kanno, Yasushi Ebizuka, Go Miya, Takafumi Miwa
  • Patent number: 9543113
    Abstract: The present invention explains a charged-particle beam device for the purpose of highly accurately measuring electrostatic charge of a sample in a held state by an electrostatic chuck (105). In order to attain the object, according to the present invention, there is proposed a charged-particle beam device including an electrostatic chuck (105) for holding a sample on which a charged particle beam is irradiated and a sample chamber (102) in which the electrostatic chuck (105) is set. The charged-particle beam device includes a potential measuring device that measures potential on a side of an attraction surface for the sample of the electrostatic chuck (105) and a control device that performs potential measurement by the potential measuring device in a state in which the sample is attracted by the electrostatic chuck (105).
    Type: Grant
    Filed: January 10, 2014
    Date of Patent: January 10, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yasushi Ebizuka, Seiichiro Kanno, Naoya Ishigaki, Masashi Fujita
  • Patent number: 9401297
    Abstract: Proposed are an electrostatic chuck mechanism and a charged particle beam apparatus including a first plane that is a plane of a side in which a sample is adsorbed, a first electrode to which a voltage for generating an adsorptive power between the first plane and the sample is applied, and a second electrode that is arranged in a position relatively separated from the sample toward the first plane and through which a virtual line that is perpendicular to the first plane and contacts an edge of the sample passes, wherein the first plane is formed so that a size in a plane direction of the first plane is smaller than that of the sample.
    Type: Grant
    Filed: February 19, 2015
    Date of Patent: July 26, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yasushi Ebizuka, Seiichiro Kanno, Masaya Yasukochi, Masakazu Takahashi, Naoya Ishigaki, Go Miya
  • Patent number: 9245710
    Abstract: A charged particle beam device that appropriately maintains a throughput of the device for each of specimens different in a gas emission volume from each other is provided. A scanning electron microscope includes an electron source, a specimen stage, a specimen chamber, and an exchange chamber, and further includes a vacuum gauge that measures an internal pressure of the exchange chamber, a time counting unit that counts time taken when a measurement result by the vacuum gauge has reached a predetermined degree of vacuum, and an integral control unit that performs comparative calculation and determination based on a measurement result by the time counting unit and integral control based on a process flow. And, the integral control unit controls changing of a content of a subsequent process based on a shift of the degree of vacuum of the exchange chamber.
    Type: Grant
    Filed: February 20, 2013
    Date of Patent: January 26, 2016
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kazuhiro Gunji, Yasushi Ebizuka, Yuta Asaga
  • Publication number: 20160013010
    Abstract: In a charged particle beam apparatus that applies a retarding voltage to a sample through a contact terminal and executes measurement or inspection of a surface of the sample, potential variation of the sample when changing the retarding voltage applied to the contact terminal is measured by a surface potential meter, a time constant of the potential variation of the sample is obtained, and it is determined whether execution of measurement or inspection by a charged particle beam continues or stops based on the time constant, or a conduction ensuring process between the sample and the contact terminal is executed.
    Type: Application
    Filed: July 10, 2015
    Publication date: January 14, 2016
    Inventors: Seiichiro KANNO, Yasushi EBIZUKA, Go MIYA, Takafumi MIWA
  • Publication number: 20150357156
    Abstract: The present invention explains a charged-particle beam device for the purpose of highly accurately measuring electrostatic charge of a sample in a held state by an electrostatic chuck (105). In order to attain the object, according to the present invention, there is proposed a charged-particle beam device including an electrostatic chuck (105) for holding a sample on which a charged particle beam is irradiated and a sample chamber (102) in which the electrostatic chuck (105) is set. The charged-particle beam device includes a potential measuring device that measures potential on a side of an attraction surface for the sample of the electrostatic chuck (105) and a control device that performs potential measurement by the potential measuring device in a state in which the sample is attracted by the electrostatic chuck (105).
    Type: Application
    Filed: January 10, 2014
    Publication date: December 10, 2015
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yasushi EBIZUKA, Seiichiro KANNO, Naoya ISHIGAKI, Masashi FUJITA
  • Publication number: 20150262857
    Abstract: Proposed are an electrostatic chuck mechanism and a charged particle beam apparatus including a first plane that is a plane of a side in which a sample is adsorbed, a first electrode to which a voltage for generating an adsorptive power between the first plane and the sample is applied, and a second electrode that is arranged in a position relatively separated from the sample toward the first plane and through which a virtual line that is perpendicular to the first plane and contacts an edge of the sample passes, wherein the first plane is formed so that a size in a plane direction of the first plane is smaller than that of the sample.
    Type: Application
    Filed: February 19, 2015
    Publication date: September 17, 2015
    Inventors: Yasushi EBIZUKA, Seiichiro KANNO, Masaya YASUKOCHI, Masakazu TAKAHASHI, Naoya ISHIGAKI, Go MIYA
  • Patent number: 9105446
    Abstract: An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck. In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism (5) in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source (6) to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck.
    Type: Grant
    Filed: January 28, 2013
    Date of Patent: August 11, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yasushi Ebizuka, Seiichiro Kanno, Makoto Nishihara, Masashi Fujita
  • Publication number: 20150097123
    Abstract: An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck. In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism (5) in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source (6) to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck.
    Type: Application
    Filed: January 28, 2013
    Publication date: April 9, 2015
    Inventors: Yasushi Ebizuka, Seiichiro Kanno, Makoto Nishihara, Masashi Fujita
  • Publication number: 20150060694
    Abstract: A charged particle beam device that appropriately maintains a throughput of the device for each of specimens different in a gas emission volume from each other is provided. A scanning electron microscope includes an electron source, a specimen stage, a specimen chamber, and an exchange chamber, and further includes a vacuum gauge that measures an internal pressure of the exchange chamber, a time counting unit that counts time taken when a measurement result by the vacuum gauge has reached a predetermined degree of vacuum, and an integral control unit that performs comparative calculation and determination based on a measurement result by the time counting unit and integral control based on a process flow.
    Type: Application
    Filed: February 20, 2013
    Publication date: March 5, 2015
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kazuhiro Gunji, Yasushi Ebizuka, Yuta Asaga
  • Patent number: 8933422
    Abstract: The objective of the present invention is to provide a charged particle beam device such that a tip part can be effectually maintained in a clean state, while the frequency of valve body replacements is also reduced. To achieve the objective, a charged particle beam device is offered, comprising: a partition that is positioned between a charged particle source-side vacuum space and a specimen stage-side vacuum space, said partition further comprising an opening for a charged particle beam to pass through; a driver mechanism that moves a shutter member between a first location within the optical axis of the charged particle beam and a second location outside the optical axis of the charged particle beam; and a control device that controls the driver mechanism.
    Type: Grant
    Filed: June 8, 2011
    Date of Patent: January 13, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Ryoichi Ishii, Takashi Doi, Osamu Sato, Yasushi Ebizuka
  • Publication number: 20130200271
    Abstract: The objective of the present invention is to provide a charged particle beam device such that a tip part can be effectually maintained in a clean state, while the frequency of valve body replacements is also reduced. To achieve the objective, a charged particle beam device is offered, comprising: a partition that is positioned between a charged particle source-side vacuum space and a specimen stage-side vacuum space, said partition further comprising an opening for a charged particle beam to pass through; a driver mechanism that moves a shutter member between a first location within the optical axis of the charged particle beam and a second location outside the optical axis of the charged particle beam; and a control device that controls the driver mechanism.
    Type: Application
    Filed: June 8, 2011
    Publication date: August 8, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Ryoichi Ishii, Takashi Doi, Osamu Sato, Yasushi Ebizuka