Abstract: The invention is a nitriding treatment method for a steel component including at least three nitriding treatment steps. The first nitriding treatment step, the second nitriding treatment step and the third nitriding treatment step are performed at a temperature within a range of 500° C. to 590° C. The first nitriding potential for the first nitriding treatment step is a value within a range of 0.10 to 1.00. The second nitriding potential for the second nitriding treatment step is higher than the first nitriding potential and is a value within a range of 0.30 to 10.00. The third nitriding potential for the third nitriding treatment step is lower than the second nitriding potential and is a value within a range of 0.26 to 0.60.

Abstract: The invention is a nitriding treatment method for a steel component including at least two nitriding treatment steps, i.e., a first nitriding treatment step in which a nitriding treatment is performed to a steel component under a nitriding gas atmosphere of a first nitriding potential, and a second nitriding treatment step in which another nitriding treatment is performed to the steel component under another nitriding gas atmosphere of a second nitriding potential lower than the first nitriding potential, after the first nitriding treatment step. The first nitriding treatment step and the second nitriding treatment step is performed at a temperature within a range of 500° C. to 590° C. The first nitriding potential is a value within a range of 0.300 to 10.000. The second nitriding potential is a value within a range of 0.253 to 0.600.

Abstract: The invention is a nitriding treatment method for a steel component including at least two nitriding treatment steps, i.e., a first nitriding treatment step in which a nitriding treatment is performed to a steel component under a nitriding gas atmosphere of a first nitriding potential, and a second nitriding treatment step in which another nitriding treatment is performed to the steel component under another nitriding gas atmosphere of a second nitriding potential lower than the first nitriding potential, after the first nitriding treatment step. The first nitriding treatment step and the second nitriding treatment step is performed at a temperature within a range of 500° C. to 590° C. The first nitriding potential is a value within a range of 0.300 to 10.000. The second nitriding potential is a value within a range of 0.253 to 0.600.

Abstract: The present invention is a processing method for a metal component by using a processing furnace. The method includes the steps of: introducing an activation atmospheric gas into the processing furnace; heating the activation atmospheric gas in the processing furnace to a first temperature; introducing a nitriding atmospheric gas or a nitrocarburizing atmospheric gas into the processing furnace; and heating the nitriding atmospheric gas or the nitrocarburizing atmospheric gas in the processing furnace to a second temperature. The activation atmospheric gas is introduced into the processing furnace through a pipe for introducing the activation atmospheric gas. A liquid organic solvent is introduced intermittently a plurality of times into the pipe for introducing the activation atmospheric gas which is under a state wherein the activation atmosphere gas continues to be introduced.

Abstract: Based on the nitriding potential in the processing furnace calculated by the in-furnace nitriding potential calculator and the target nitriding potential, the introduction amount of the ammonia gas is changed while the introduction amount of the ammonia decomposition gas is kept constant, such that the nitriding potential in the processing furnace is brought close to the target nitriding potential.

Abstract: The present, invention includes: an in-furnace atmospheric gas concentration detector configured to detect a hydrogen concentration or an ammonia concentration in a processing furnace; an in-furnace nitriding potential calculator configured to calculate a nitriding potential in the processing furnace based on the hydrogen concentration or the ammonia concentration detected by the in-furnace atmospheric gas concentration detector; and a gas-introduction-amount controller configured to change an introduction amount of each of the plurality of furnace introduction gases except for the ammonia decomposition gas while keeping an introduction amount of the ammonia decomposition gas constant. based on the calculated nitriding potential in the processing furnace and a target nitriding potential, such that the nitriding potential in the processing furnace is brought close to the target nitriding potential.

Abstract: Based on the nitriding potential in the processing furnace calculated by the in-furnace nitriding potential calculator and a target nitriding potential, an introduction amount of each of the plurality of furnace introduction gases is controlled by changing a flow rate ratio between the plurality of furnace introduction gases while keeping a total introduction amount of the plurality of furnace introduction gases constant, such that the nitriding potential in the processing furnace is brought close to the target nitriding potential.

Abstract: Based on the nitriding potential in the processing furnace calculated by the in-furnace nitriding potential calculator and the target nitriding potential, the introduction amount of the ammonia gas is changed while the introduction amount of the ammonia decomposition gas is kept constant, such that the nitriding potential in the processing furnace is brought close to the target nitriding potential.

Abstract: Based on the nitriding potential in the processing furnace calculated by the in-furnace nitriding potential calculator and a target nitriding potential, an introduction amount of each of the plurality of furnace introduction gases is controlled by changing a flow rate ratio between the plurality of furnace introduction gases while keeping a total introduction amount of the plurality of furnace introduction gases constant, such that the nitriding potential in the processing furnace is brought close to the target nitriding potential.

Abstract: An automatic inspecting device in which a change in an inspection scenario is unnecessary or little, even if an apparatus specification information is changed, is provided. An automatic inspecting device 20 includes a hardware processor 25. The hardware processor 25 converts processing to be performed by an inspection target apparatus 10 into a converted signal corresponding to apparatus specification information on the inspection target apparatus, outputs the converted signal to the inspection target apparatus 10, acquires response data of the inspection target apparatus 10 obtained according to the converted signal, and calculates a degree of matching of the response data with an expected operation or an expected data included in the apparatus specification information or an inspection scenario including the processing, and the expected operation or the expected data of the inspection target apparatus.

Abstract: Provided is a light detecting device including: a light path branching unit that branches a single detection light path of fluorescence from a specimen, into a plurality of branched light paths; a plurality of light detectors that are provided to the respective branched light paths branched by the light path branching unit and that include an SSPD or Geiger mode APD to detect the fluorescence; and a signal adder that generates a single image signal in accordance with the detection signals outputted from the plurality of light detectors.

Abstract: Provided is a light detecting device including: a light path branching unit that branches a single detection light path of fluorescence from a specimen, into a plurality of branched light paths; a plurality of light detectors that are provided to the respective branched light paths branched by the light path branching unit and that include an SSPD or Geiger mode APD to detect the fluorescence; and a signal adder that generates a single image signal in accordance with the detection signals outputted from the plurality of light detectors.

Abstract: The present invention is to provide a method for surface treatment that substantially provides no nitride compound layer that causes heat checks and abrasion to a die, while nitride is introduced in large quantities into the die internally, and as a result a die-casting die with excellent heat check resistance and excellent abrasion resistance can be produced. The method comprises a step of a nitriding process for forming on an aesthetic surface of the die-casting die a nitrided layer that includes at least a compound layer composed of a nitrogen compound by introducing gas containing at least ammonia gas to a heating furnace, a step of decomposing the compound by exhausting the ammonia gas from the heating furnace and for introducing ambient gas to the heating furnace, to carry out a thermal process to decompose the nitrogen compound, and a step of processing a shot peening process on the aesthetic surface of the die.

Abstract: There has been a problem in that original image data should be saved with another name so as not to be altered, resulting in complexity and an increase in a necessary storage region. Image data are housed in a folder managed as a film metaphor and a database of photographic data 30b corresponding to each image data is prepared. When a desirable image processing is selected for desirable image data, the selected image processing is updated as modification information in the database structure. When display, output or print is actually required, various image processings are executed by referring to modification information on only a work area with original image data left. Therefore, it is possible to easily enjoy image modification or the like with the original image data left as they are.

Abstract: There has been a problem in that original image data should be saved with another name so as not to be altered, resulting in complexity and an increase in a necessary storage region. Image data are housed in a folder managed as a film metaphor and a database of photographic data 30b corresponding to each image data is prepared. When a desirable image processing is selected for desirable image data, the selected image processing is updated as modification information in the database structure. When display, output or print is actually required, various image processings are executed by referring to modification information on only a work area with original image data left. Therefore, it is possible to easily enjoy image modification or the like with the original image data left as they are.

Abstract: A deformed-coin detector accurately detecting a deformed coin without being affected by a variation in transporting speed of a coin. A coin transported along a coin transporting face comes into contact with detecting elements of coin-thickness detecting bodies, the detecting elements move by a distance corresponding to the dimension of the coin in its thickness direction and simultaneously, light shielding portions of the coin-thickness detecting bodies move. A light detecting portion detects a light shielding amount that varies due to movement of the light shielding portions. A coin denomination determining unit determines a denomination of the coin transported along the coin transporting face and reads a reference light-shielding amount pre-stored in a reference light shielding amount storing unit regarding the denomination.

Abstract: An apparatus for displaying other ship targets is provided that displays the positions and detailed information concerning substantially all vessels present in a predetermined region around the own ship in a manner that is easy to grasp for the operator. A display screen includes Graphical Position Display Area 11, Target List Display Area 12 and Vessel Detail Information Display Area 13. A selected vessel of interest is displayed on Graphical Position Display Area 11 with Icon 102, and non-selected vessels are displayed by Icons 103 thereby making it possible to tell them apart. In conjunction with this, a portion of Target List Display Area 12 corresponding to the selected vessel is subjected to Emphasized Display 121, and the detailed information about the selected vessel is displayed in Vessel Detail Information Display Area 13.

Abstract: A deformed-coin detector accurately detecting a deformed coin without being affected by a variation in transporting speed of a coin. A coin transported along a coin transporting face comes into contact with detecting elements of coin-thickness detecting bodies, the detecting elements move by a distance corresponding to the dimension of the coin in its thickness direction and simultaneously, light shielding portions of the coin-thickness detecting bodies move. A light detecting portion detects a light shielding amount that varies due to movement of the light shielding portions. A coin denomination determining unit determines a denomination of the coin transported along the coin transporting face and reads a reference light-shielding amount pre-stored in a reference light shielding amount storing unit regarding the denomination.

Abstract: A navigational aid for use as an AIS apparatus includes a memory for storing information about previous use of individual time slots synchronized with transmission schedules of other stations and a signal detector for judging whether an information signal exists in a time slot specified in accordance with a synchronization timing signal based on the information stored in the memory and a result of monitoring of the behavior of a baseband signal obtained from a received signal on an IQ-plane. The navigational aid transmits information about own station based on a result of judgment by the signal detector. The monitoring of the behavior of the received baseband signal plotted on the IQ-plane can be accomplished by performing pattern recognition operation, for which a carrier sense technique, such as a support vector machine, subspace method or neural network, can be used.

Abstract: A CPU of a TDMA communications apparatus examines whether a slot to be allocated for a next transmission is a first slot (S1). If the slot to be allocated is the first slot, the CPU examines whether there are any slots already allocated by other stations within a Selection Interval SI in a frame in which the next transmission of own station is to be allocated referring to a slot map in a memory and finds out a free slot within Selection Interval SI (S11). Then, the CPU allocates the free slot as a next transmit slot of the own station and sets the slot number of the free slot as the slot number of the next transmit slot (S12). Then, the CPU examines whether a slot adjacent to the next transmit slot of the own station is allocated to any of the other stations (S13).