Patents by Inventor Yasushi Iiara

Yasushi Iiara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Etching composition and method for etching a substrate
    Publication number: 20050227473
    Abstract: This etching composition for etching hafnium compound, includes a fluoride compound and a chloride compound. This method for etching a substrate, includes etching a film which contains hafnium compound and is formed on a substrate by using an etching composition, wherein the etching composition contains a fluoride compound and a chloride compound.
    Type: Application
    Filed: March 17, 2005
    Publication date: October 13, 2005
    Inventors: Yasushi Iiara, Fumiharu Takahashi, Hiroaki Hayashi