Abstract: Each of plural image forming apparatuses 2-1 to 2-N transmits a beacon signal including a device ID. Each of plural user terminal apparatuses 1-1 to 1-M determines a user ID of a user 101-i who currently uses it, receives the beacon signal transmitted from an image forming apparatus 2-j, and transmits to a mapping processing apparatus mapping information that associates the user ID and the device ID in the received beacon signal. Further, the mapping processing apparatus receives the mapping information on each user, determines a user associated by the mapping information with each image forming apparatus 2-j among the plural image forming apparatuses 2-1 to 2-M, and generates map data in which the determined user is associated with each image forming apparatus 2-j.

Abstract: An exposure apparatus includes a substrate stage on which substrates are placed, and first projection modules each including a spatial light modulator, the first projection modules projecting wiring patterns each connecting semiconductor chips arranged on each of the substrates onto the substrates, wherein the first projection modules project the wiring patterns onto different substrates, substantially simultaneously.

Abstract: An optical device includes a plurality of laser light sources, an output module having an optical modulator, and a time divider that is disposed between the plurality of laser light sources and the output module and that is configured to divide laser beams emitted from the plurality of laser light sources in time.

Abstract: A spatial light modulation unit is used in an exposure apparatus that exposes an exposure pattern onto a photosensitive substrate while moving the photosensitive substrate in a scan direction. The spatial light modulation unit includes: a spatial light modulator having a plurality of elements; a controller that controls the plurality of elements in accordance with the exposure pattern; and a SLM substrate on which the spatial light modulator and the controller are provided. The controller is arranged side by side in the scan direction with respect to the spatial light modulator.

Abstract: An exposure apparatus includes a substrate holder configured to hold a substrate and move, a module including a spatial light modulator having light modulation elements that are two-dimensionally arranged, an illumination unit irradiating the spatial light modulator with illumination lights, and a projection unit guiding the illumination light from the light modulation elements to respective light irradiation areas that are two-dimensionally arranged on the substrate in first and second directions, and a control unit configured to drive the substrate holder in a scanning direction, wherein the light modulation elements are two-dimensionally arranged to be inclined at a predetermined angle ? (0°<?<90°) with respect to the scanning direction and a non-scanning direction orthogonal to the scanning direction, and when a predetermined region of the substrate is exposed, the control unit scans the substrate holder at such a speed that spot positions are arranged in a staggered arrangement.

Abstract: An exposure apparatus includes a spatial light modulator, a calculation unit configured to calculate positions of first connection portions of a first semiconductor chip provided on a substrate and positions of second connection portions of a second semiconductor chip provided on the substrate, based on a first position measurement result, a second position measurement result, and design information of the first connection portions and the second connection portions, the first position measurement result being a measurement result of positions of measurement points on the first semiconductor chip, the second position measurement result being a measurement result of positions of measurement points on the second semiconductor chip, and an exposure processing unit configured to control the spatial light modulator based on a calculation result by the calculation unit so as to expose wiring patterns connecting the first connection portions and the second connection portions.

Abstract: An exposure apparatus includes an illumination optical system, a spatial light modulator illuminated by light from the illumination optical system, a projection optical system that irradiates an exposure target with light emitted from the spatial light modulator, a stage on which the exposure target is placed to perform a relative movement between the exposure target and the projection optical system relative to each other in a predetermined scanning direction, and a controller that has a storage in which information relating to exposure pattern is stored and controls exposure for the exposure target. The controller controls the exposure for the exposure target so that a first step of performing a first exposure based on the information relating to the exposure pattern and a second step of performing a second exposure based on at least a portion of the information relating to the exposure pattern used in the first step are executed.

Abstract: An exposure apparatus exposes an object to pattern light generated by a spatial light modulator having a plurality of elements in accordance with drawing data. The exposure apparatus includes a data output unit configured to output the drawing data to the spatial light modulator, an illumination optical system configured to irradiate the spatial light modulator with illumination light, a first movable body configured to hold the object, a projection optical system configured to project an image of the pattern light generated by the spatial light modulator onto the object, a detection unit configured to detect the image of the pattern light that has been projected, and a determination unit configured to determine whether the spatial light modulator is capable of generating pattern light in accordance with the drawing data output from the data output unit, based on a detection result of the detection unit.

Abstract: An exposure apparatus includes: an illumination optical system; a spatial light modulator; a projection optical system that illuminates an exposure target with light emitted from the spatial light modulator; and a stage where the exposure target is placed, wherein by the stage moving the exposure target in a predetermined scan direction, the light illuminates the exposure target by the projection optical system scans on the exposure target, the spatial light modulator includes a plurality of mirrors that rotates around a tilt axis extending in a direction orthogonal to both the scan and an optical axis directions of the projection optical system, the mirrors become an ON state by adjusting a tilt of each mirror relative to the scan direction and thereby emit light to the system, and the exposure apparatus includes an angle adjustment mechanism that adjusts a tilt angle of the spatial light modulator relative to the scan direction.

Abstract: An exposure apparatus includes an exposure module that includes a spatial light modulator and projects and exposes pattern light generated by the spatial light modulator onto a substrate, and a determination unit configured to, when a plurality of substrates scheduled to be arranged on a substrate holder include a first substrate having a defect, determine a plurality of substrates to be arranged on the substrate holder from the plurality of substrates scheduled to be arranged on the substrate holder, based on a predetermined handling method for the first substrate.

Abstract: An illumination optical system configured to illuminate a mask on which a predetermined pattern is formed, includes a plurality of light sources configured to emit pulse lights, an optical system including a division part configured to divide the pulse lights emitted from the plurality of light sources into first pulse light and second pulse light, a delay optical system configured to guide the second pulse light to a second optical path longer than a first optical path through which the first pulse light passes, and a synthesis/division part configured to synthesize the first pulse light and the second pulse light passing through the delay optical system and divide and emit the synthesized pulse light, and an illumination system configured to guide the pulse lights emitted from the optical system to the mask and illuminate the mask.

Abstract: An electric motor control device that can accurately calculate the rotating speed of an electric motor. The electric motor control device includes a speed calculating unit configured to receive, from a position detector that detects a rotational position of an electric motor and outputs a position detection signal including a periodic error determined according to the rotational position, an input of the position detection signal, receive, from a time detector that outputs a position change time signal obtained by detecting a time period in which the position detection signal output from the position detector changes, an input of the position change time signal, and calculate rotating speed of the electric motor based on the position detection signal and the position change time signal. Further, there is a speed correcting unit for correcting a periodic speed error determined according to the rotational position of the electric motor.

Abstract: An apparatus line for manufacturing seamless steel pipes and tubes includes: a heating apparatus for heating a steel raw material; a piercing apparatus for piercing the heated steel raw material thus forming a hollow material; and a rolling apparatus for applying working to the hollow material to form a seamless steel pipe having a predetermined shape. A cooling apparatus is arranged on an exit side of the rolling apparatus. A heated steel raw material is worked by the rolling apparatus after being pierced by the piercing apparatus, and thereafter, using a surface temperature of a hollow piece before being cooled by the cooling apparatus as a cooling start temperature, the hollow piece is cooled to a cooling stop temperature differing by 50° C. or more from the cooling start temperature and being equal to or above 600° C. at an average cooling speed of 1.0° C./s or more in terms of an outer surface temperature.

Abstract: A lens unit includes: a lens group in which a plurality of lenses are aligned along an optical axis of the lenses; a lens barrel that integrally supports the lens group; an intermediate ring; and an elastic member having an annular shape and provided between the lens and the intermediate ring, the lens being adjacent to the elastic member in the optical axis direction, and including a recess having an annular shape, the elastic member is provided in a compressed state, and the elastic member presses the lens disposed on an object side of the elastic member against an end portion of the lens barrel on the object side, presses the lens disposed on an image side of the elastic member against an end portion of the lens barrel on the image side via the intermediate ring, and absorbs rattling.

Abstract: A lens unit that includes an optical element including at least a lens group in which a plurality of lenses are arranged along an optical axis; and a cylindrical lens barrel having an inner accommodation space for accommodating and holding the optical element, and the lens group includes a first lens located closest to the object side thereof; and a second lens adjacent to the first lens on the image side thereof, and optical elements and/or the optical element and the lens barrel are bonded to each other in an airtight state, such that an inter-lens space between the first lens and the second lens is sealed to the outside.

Abstract: A honeycomb structure includes a honeycomb structure body having porous partition walls, wherein a value of a porosity of the partition wall in a partitioning wall portion between the two cells is defined as a porosity A, a value of a porosity of the partition wall in an intersecting portion that is a region connecting two or more wall portions is defined as a porosity B, a value of A/B obtained by dividing the porosity A by the porosity B is from 0.5 to 0.95, and the porosity A is from 10 to 40%.

Abstract: There is provided a wound thread package that is unlikely to cause problems such as cob-webbing and collapse at the time of unwinding even when the wound thread is a multi-filament thread or tape-like thread, and a manufacturing method for the same. To manufacture a wound thread package 1 by winding a plurality of multi-filament threads or tape-like threads having a total fineness of 100 to 6400 dtex per thread around a bobbin 2 by a traverse method, the threads constituting a thread layer 3 are arranged at intervals therebetween and wound with the same in traverse width w and at different traverse reverse positions.

Abstract: A motor includes a stator including a stator core and teeth respectively protruding from the stator core in predetermined directions of protrusion, and coils respectively wound onto the teeth n (n is an integer of 3 or greater) turns including first to n-th turns. A k-th (k is an integer, 1<k<n) turn of each of the coils lies at a center of a range wound with each of the coils onto the teeth in a corresponding one of the directions of protrusion of the teeth from the stator core. Each of the first turn and the n-th turn when each of the coils is cut in a corresponding one of the directions of protrusion of the teeth is greater in cross-sectional area than the k-th turn.

Abstract: A honeycomb filter includes a plugged honeycomb structure body which has cell rows arranged along one direction, in a cross section of the honeycomb structure body and including a first cell row constituted of at least one of an inflow cell and an outflow cell, and a through-cell, and a second cell row including no through-cells. A width P1 (mm) of the first cell row, a width P2 (mm) of the second cell row and a curvature radius R (?m) of a curved shape of corner portions of a polygonal shape of each cell satisfy a relation of Equation (1) below: Equation (1): 0.4 (R/1000)/((P1+P2)/2) 100 20.

Abstract: A motor includes a stator core, teeth respectively protruding from the stator core, and coils respectively wound onto the teeth n (n is an integer of 2 or greater) turns including first to n-th turns. Within each of ranges respectively wound with the coils onto the teeth in directions of protrusion of the teeth from the stator core, the first turn of each of the coil lies adjacent to a center of the motor. A k-th (k is an integer, 1<k?n) turn of each of the coils lies opposite to the center of the motor. The first turn when each of the coils is cut in a corresponding one of the directions of protrusion of the teeth from the stator core is greater in cross-sectional area than each of the k-th turn and the n-th turn.