Abstract: A chemically amplified photosensitive composition used for forming a patterned resist film by photolithography on a metal surface of a substrate which at least partly has a surface consisting of metal. The composition includes an acid generator which generates an acid by irradiation of active rays or radioactive rays; and a compound and/or a precursor compound, in which the molar absorption coefficient ? at a wavelength of 365 nm of the compound is at least 3000, the compound has a metal coordination group, and the compound can be formed from the precursor compound during formation of the patterned resist film.

Abstract: A chemically amplified photosensitive composition which forms a resist pattern whose cross-sectional shape is rectangular, and which has a wide depth of focus margin; a photosensitive dry film having a photosensitive layer made from the composition; a method of manufacturing a patterned-resist film using the composition; a method of manufacturing a substrate with a template using the composition; a method of manufacturing a plated article using the substrate with a template; and a novel compound. An acid diffusion suppressing agent having a specific structure is blended into the composition including an acid generator which generates acid upon exposure to an irradiated active ray or radiation.

Abstract: A chemically amplified positive-type photosensitive resin composition capable of forming a resist pattern having excellent cross-sectional perpendicularity of a nonresist section even when a resist pattern is formed on a metal surface, and a method for manufacturing a substrate with a template and a method for manufacturing a plated article using the composition. The composition contains an acid generator, a resin, and a sulfur-containing compound including a sulfur-containing compound and a thiol compound that is different from the sulfur-containing compound.

Abstract: A chemically amplified photosensitive composition used for forming a patterned resist film by photolithography on a metal surface of a substrate which at least partly has a surface consisting of metal. The composition includes an acid generator which generates an acid by irradiation of active rays or radioactive rays; and a compound and/or a precursor compound, in which the molar absorption coefficient ? at a wavelength of 365 nm of the compound is at least 3000, the compound has a metal coordination group, and the compound can be formed from the precursor compound during formation of the patterned resist film.

Abstract: A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than the top (the side proximal to the surface of a resist layer) in the nonresist portion when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate having a metal surface using the composition. A mercapto compound having the formula (C) shown below is added to the composition and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation and a resin the solubility of which in alkali increases under the action of acid: wherein n1, n2, Rc1, and Rc are defined in claim 1.

Abstract: A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

Abstract: A method for manufacturing a plated molded article, the method capable of forming a plated molded article having good adhesion with respect to a metal surface on a substrate using a mold, while forming a pattern used as the mold for forming the plated molded article by using a photosensitive composition while suppressing footing in the pattern. A resist pattern is formed by using the photosensitive composition that includes a sulfur-containing compound having a predetermined structure and/or a nitrogen-containing compound, and before forming the plated molded article, ashing is performed on the surface including a metal that is exposed from a nonresist section of the resist pattern used as the mold.

Abstract: A chemically amplified photosensitive composition which forms a resist pattern whose cross-sectional shape is rectangular, and which has a wide depth of focus margin; a photosensitive dry film having a photosensitive layer made from the composition; a method of manufacturing a patterned-resist film using the composition; a method of manufacturing a substrate with a template using the composition; a method of manufacturing a plated article using the substrate with a template; and a novel compound. An acid diffusion suppressing agent having a specific structure is blended into the composition including an acid generator which generates acid upon exposure to an irradiated active ray or radiation.

Abstract: A chemically amplified positive-type photosensitive resin composition, a method of manufacturing a patterned resist film using the composition, a method of manufacturing a substrate with a template using the composition, and a method of manufacturing a plated article using the substrate with a template. The resin composition includes an acid generator (A) which generates acid upon exposure to an irradiated active ray or radiation, and a resin (B) whose solubility in alkali increases under an action of acid. The acid generator (A) includes an acid generator (A-1) having a naphthalimide skeleton, and an acid generator (A-2) whose molar absorbance coefficient at a wavelength of 365 nm is lower than that of the acid generator (A-1).

Abstract: A chemically amplified positive-type photosensitive resin composition that can be well developed with an aqueous basic solution having low pH, a substrate with a photosensitive film formed from the composition, and a method for patterned resist film formation using the composition. The composition includes an acid generator that produces an acid upon irradiation with an active ray or radiation; a resin whose solubility in alkali increases under the action of acid; and an organic solvent, in which a predetermined amount of an alkali-soluble resin soluble in an aqueous basic solution having a pH of 12 and containing alkali-soluble groups with hydrogen atoms in at least a part thereof is substituted with an acid-dissociative dissolution-controlling group contained in the resin.

Abstract: A chemically amplified positive-type photosensitive resin composition capable of forming a resist pattern having excellent cross-sectional perpendicularity of a nonresist section even when a resist pattern is formed on a metal surface, and a method for manufacturing a substrate with a template and a method for manufacturing a plated article using the composition. The composition contains an acid generator, a resin, and a sulfur-containing compound including a sulfur-containing compound and a thiol compound that is different from the sulfur-containing compound.

Abstract: A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

Abstract: A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than the top (the side proximal to the surface of a resist layer) in the nonresist portion when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate having a metal surface using the composition. A mercapto compound with a specific structure is added to the composition and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation and a resin the solubility of which in alkali increases under the action of acid.

Abstract: A chemically amplified positive-type photosensitive resin composition for a thick film including an acid generator which is capable of producing an acid when irradiated with an active beam or radiation and includes a compound having a carboxyl group; a resin whose solubility in alkali increases under the action of an acid and which includes an acrylic resin containing a structural unit derived from acrylic ester having a cyclic group containing —SO2— or a cyclic group containing lactone; and an organic solvent.

Abstract: A chemically amplified positive-type photosensitive resin composition that can be well developed with an aqueous basic solution having low pH, a substrate with a photosensitive film formed from the composition, and a method for patterned resist film formation using the composition. The composition includes an acid generator that produces an acid upon irradiation with an active ray or radiation; a resin whose solubility in alkali increases under the action of acid; and an organic solvent, in which a predetermined amount of an alkali-soluble resin soluble in an aqueous basic solution having a pH of 12 and containing alkali-soluble groups with hydrogen atoms in at least a part thereof is substituted with an acid-dissociative dissolution-controlling group contained in the resin.

Abstract: A chemically amplified positive-type photosensitive resin composition for a thick film including an acid generator which is capable of producing an acid when irradiated with an active beam or radiation and includes a compound having a carboxyl group; a resin whose solubility in alkali increases under the action of an acid and which includes an acrylic resin containing a structural unit derived from acrylic ester having a cyclic group containing —SO2— or a cyclic group containing lactone; and an organic solvent.

Abstract: What is provided is a positive-type photoresist composition containing an acid generator (A) capable of generating an acid when irradiated with an active ray or radiation, a resin (B) whose solubility in alkali increases under the action of acid, and an organic solvent (S), the photoresist composition further containing an alkali-metal salt (C).

Abstract: A vehicle carries a battery package as its power source. Plural battery modules in the battery package respectively have a memory device for memorizing identification information that proves authenticity of each of the battery modules. A battery control unit in the vehicle has an authentication unit. The authentication unit determines whether or not each of the battery modules is a genuine product. When the battery module is determined as a non-genuine product, a control unit performs a restricted charging. The restricted charging restricts a charge amount of the battery, for effectively improving usability of the battery and for restricting use of a non-compliant battery.

Abstract: What is provided is a positive-type photoresist composition containing an acid generator (A) capable of generating an acid when irradiated with an active ray or radiation, a resin (B) whose solubility in alkali increases under the action of acid, and an organic solvent (S), the photoresist composition further containing an alkali-metal salt (C).

Abstract: A vehicle carries a battery package as its power source. Plural battery modules in the battery package respectively have a memory device for memorizing identification information that proves authenticity of each of the battery modules. A battery control unit in the vehicle has an authentication unit. The authentication unit determines whether or not each of the battery modules is a genuine product. When the battery module is determined as a non-genuine product, a control unit performs a restricted charging. The restricted charging restricts a charge amount of the battery, for effectively improving usability of the battery and for restricting use of a non-compliant battery.