Abstract: There is provided a plasma processing apparatus comprising: a chamber; a gas supply configured to supply a gas into the chamber; an exhaust device configured to exhaust a gas in the chamber; a substrate support including a lower electrode and provided in the chamber; an upper electrode provided above the substrate support; a high-frequency power supply configured to supply high-frequency power to the upper electrode; an impedance circuit connected between the lower electrode and ground; and a controller configured to control the gas supply and the exhaust device such that a pressure of the gas in the chamber is 26.66 Pa or higher. A frequency of the high-frequency power is lower than 13.56 MHz, and an impedance of the impedance circuit is set such that an impedance of an electrical path from the lower electrode through the impedance circuit to the ground is higher than an impedance of an electrical path from a wall of the chamber to the ground.

Abstract: A redox flow battery includes: a cell having a first chamber and a second chamber separated by a membrane; a first tank for storing a first electrolytic solution; a first circulation device for circulating the first electrolytic solution between the first chamber and the first tank; a second tank for storing a second electrolytic solution; and a second circulation device for circulating the second electrolytic solution between the second chamber and the second tank. Each of the first electrolytic solution and the second electrolytic solution contains an active material, and at least one of the active material contained in the first electrolytic solution or the active material contained in the second electrolytic solution is a quinone multimer in which a plurality of quinones are connected via an alkyl chain or a hydroquinone multimer in which a plurality of hydroquinones are connected an alkyl chain.

Abstract: A strut mount cap is provided on an upper surface of a strut mount, and is configured to close a hole housing a fastening component for the strut mount and a shock absorber. The strut mount cap includes a cap body configured to close the hole, an annular water stop lip provided on an outer periphery of the cap body and in elastic contact with the upper surface of the strut mount to prevent water from entering the hole, a press-fit tube provided on a back side of the cap body and held on an inner peripheral surface of the hole by being press-fitted into the hole, and a check valve configured to open the hole when an internal pressure in the hole is equal to or higher than a preset pressure, and close the hole when the internal pressure is lower than the preset pressure.

Abstract: A film forming apparatus includes a vacuum-evacuable processing chamber, a lower electrode for mounting thereon a target substrate, an upper electrode disposed to face the lower electrode, a gas supply unit, a voltage application unit and a switching unit. The gas supply unit supplies a film forming source gas to be formed into plasma to a processing space between the upper and the lower electrode. The voltage application unit applies to the upper electrode a voltage outputted from at least one of a high frequency power supply and a DC power supply included therein. The switching unit selectively switches the voltage to be applied to the upper electrode among a high frequency voltage outputted from the high frequency power supply, a DC voltage outputted from the DC power supply, and a superimposed voltage in which the DC voltage is superimposed with the high frequency voltage.

Abstract: A heating and hot-water-supply apparatus is provided with: a control unit that performs control on the basis of detection parameters of a plurality of detection means installed at the aforementioned locations and a setting parameter set in an operation unit. The distribution means can adjust the distribution ratio so as to correspond to a heating operation, a hot-water supply operation, and the simultaneous heating and hot-water-supply operation. The control unit prohibits the simultaneous heating and hot-water-supply operation in a case in which the required heating capacity for the hot-water supply operation calculated on the basis of the detection parameters and the setting parameter is equal to or greater than a predetermined standard capacity.

Abstract: A plasma processing apparatus is provided to perform plasma processing on a substrate. The plasma processing apparatus includes a processing chamber, a substrate support disposed in the processing chamber to place thereon the substrate, a grounded lower electrode provided in the substrate support, an upper electrode disposed to face the lower electrode, a gas supply unit to supply a processing gas to a space between the upper electrode and the substrate support, and a radio frequency power supply to apply RF power to the upper electrode to generate plasma of the processing gas. The plasma processing apparatus further includes a voltage waveform shaping unit provided between the RF power supply and the upper electrode to shape a voltage waveform of the RF power supply to suppress a positive voltage of the RF voltage applied to the upper electrode.

Abstract: A hot water heating system is provided with: a hot water heating device; a heating terminal; a heat circulation circuit; a circulation means; and an expansion-absorbing means. The hot water heating device is provided with: a heating passage; a heating means for heating a heat medium inside the heating passage; a pressure detection means; a supply passage connected to the heating passage; an opening/closing means for the supply passage; and a control means which opens the opening/closing means to supply the heat medium when the internal pressure of the heating passage is less than a reference value. The control means determines that the positional relationship between the circulation means and the expansion-absorbing means is inappropriate when the pressure detected by the pressure detection means at the moment the circulation means starts to be driven is lower than the pressure detected prior to driving the circulation means.

Abstract: A heating and hot water supplying device includes: a circulation passage that connects a heat exchanger and an external heating terminal; a bypass passage that bypasses the heating terminal by branching from the circulation passage; a hot water supply passage for supplying the hot water heated to a preset hot water supply temperature by the heat exchanger for hot water supply; a control unit that controls operations in which this plurality of units are used; and an operation terminal for performing various operations. A distribution valve is provided in the branching portion of the bypass passage. The distribution valve adjusts the distribution ratio so that each of a heating operation, a hot water supplying operation, and a simultaneous heating and hot water supplying operation is possible. The operation terminal is provided with a prohibit switch to prohibit the simultaneous heating and hot water supplying operation.

Abstract: In a heating and hot water supply device including a burning means, a first heat exchanger, a circulation passage for circulating a heating thermal medium, a circulation pump, a first bypass passage, a second heat exchanger for hot water supply, a hot water supply passage, a distribution means at a branching portion of the first bypass passage, and a second bypass passage bypassing the second heat exchanger, a flow rate adjustment means for adjusting a bypass flow rate in the second bypass passage is provided. The distribution means is capable of adjusting its distribution ratio for heating, or hot water supply, or simultaneous heating/hot water supply. All passage connection portions on the second heat exchanger were provided on its one side portion.

Abstract: A heating and hot-water-supply apparatus is provided with: a control unit that performs control on the basis of detection parameters of a plurality of detection means installed at the aforementioned locations and a setting parameter set in an operation unit. The distribution means can adjust the distribution ratio so as to correspond to a heating operation, a hot-water supply operation, and the simultaneous heating and hot-water-supply operation. The control unit prohibits the simultaneous heating and hot-water-supply operation in a case in which the required heating capacity for the hot-water supply operation calculated on the basis of the detection parameters and the setting parameter is equal to or greater than a predetermined standard capacity.

Abstract: In a heating and hot water supply device including a burning means, a first heat exchanger, a circulation passage for circulating a heating thermal medium, a circulation pump, a first bypass passage, a second heat exchanger for hot water supply, a hot water supply passage, a second bypass passage bypassing the second heat exchanger, a control unit, and an operating terminal, a distribution means is provided at a branching portion of the first bypass passage and is capable of adjusting its distribution ratio for heating, or hot water supply, or simultaneous heating/hot water supply, a display means of the operating terminal is capable of providing displays corresponding to various types of operation.

Abstract: An electrode sheet including a multi-walled carbon nanotube including plural graphene layers, each of which has a trioxotriangulene derivative of formula (1) dispersed therein, where X's are hydrogen, a halogen, or a monovalent organic group, and may be the same as or different from each other.

Abstract: A heating system includes: a heat source machine which heats a heat medium; heating terminals which performs heating using heat of the heat medium; circulation components of the heat medium; a circulation circuit which is configured by connecting the heat source machine, the heating terminals, and the circulation components; and a bypass passage which is arranged in the circulation circuit to bypass the heat source machine. The heat medium heated by the heat source machine and the heat medium of the bypass passage are mixed and circulated. The circulation circuit includes distribution and mixing parts which have a first distribution part for distributing the heat medium heated by the heat source machine, a second distribution part for distributing the heat medium flowing through the bypass passage, and mixing parts for mixing the heat mediums distributed by the first and second distribution parts and corresponding to each other.

Abstract: A film forming apparatus includes a vacuum-evacuable processing chamber, a lower electrode for mounting thereon a target substrate, an upper electrode disposed to face the lower electrode, a gas supply unit, a voltage application unit and a switching unit. The gas supply unit supplies a film forming source gas to be formed into plasma to a processing space between the upper and the lower electrode. The voltage application unit applies to the upper electrode a voltage outputted from at least one of a high frequency power supply and a DC power supply included therein. The switching unit selectively switches the voltage to be applied to the upper electrode among a high frequency voltage outputted from the high frequency power supply, a DC voltage outputted from the DC power supply, and a superimposed voltage in which the DC voltage is superimposed with the high frequency voltage.

Abstract: A heating and hot water supplying device is provided. The device comprising: a circulation passage that connects a heat exchanger and an external heating terminal; a bypass passage that bypasses the heating terminal by branching from the circulation passage; a hot water supply passage for supplying the hot water heated to a preset hot water supply temperature by the heat exchanger for hot water supply; a control unit that controls operations in which this plurality of units are used; and an operation unit for performing various operations. A distribution means is provided in the branching portion of the bypass passage. The distribution means adjusts the distribution ratio so that each of a heating operation, a hot water supplying operation, and a simultaneous heating and hot water supplying operation is possible. The operation unit is provided with a prohibit switch to prohibit the simultaneous heating and hot water supplying operation.

Abstract: In a heating and hot water supply device comprising a burning means, a first heat exchanger, a circulation passage for circulating a heating thermal medium, a circulation pump, a first bypass passage, a second heat exchanger for hot water supply, a hot water supply passage, a second bypass passage bypassing the second heat exchanger, and a control unit, a distribution means is provided at a first branching portion of the first bypass passage and is capable of adjusting its distribution ratio for heating, or hot water supply, or simultaneous heating/hot water supply, during heating operation, the hot water supply passage is closed by a flow rate adjustment means provided in the hot water supply passage.

Abstract: The present invention proposes a semiconductor device, its manufacturing method and to an electronic apparatus thereof equipped with the semiconductor device where it becomes possible to make a CMOS type solid-state imaging device, an imager area formed with a MOS transistor of an LDD structure without having a metal silicide layer of a refractory metal, an area of DRAM cells and the like into a single semiconductor chip. According to the present invention, a semiconductor device is constituted such that an insulating film having a plurality of layers is used, sidewalls at the gate electrodes are formed by etchingback the insulating film of the plurality of layers or a single layer film in the region where metal silicide layers are formed and in the region where the metal silicide layers are not formed, sidewalls composed of an upper layer insulating film is formed on a lower layer insulating film whose surface is coated or the insulating film of the plurality of layers remain unchanged.

Abstract: In a heating and hot water supply device including a burning means, a first heat exchanger, a circulation passage for circulating a heating thermal medium, a circulation pump, a first bypass passage, a second heat exchanger for hot water supply, a hot water supply passage, a distribution means at a branching portion of the first bypass passage, and a second bypass passage bypassing the second heat exchanger, a flow rate adjustment means for adjusting a bypass flow rate in the second bypass passage is provided. The distribution means is capable of adjusting its distribution ratio for heating, or hot water supply, or simulataneous heating/hot water supply. All passage connection portions on the second heat exchanger were provided on its one side portion.

Abstract: In a heating and hot water supply device including a burning means, a first heat exchanger, a circulation passage for circulating a heating thermal medium, a circulation pump, a first bypass passage, a second heat exchanger for hot water supply, a hot water supply passage, a second bypass passage bypassing the second heat exchanger, a control unit, and an operating terminal, a distribution means is provided at a branching portion of the first bypass passage and is capable of adjusting its distribution ratio for heating, or hot water supply, or simulataneous heating/hot water supply, a display means of the operating terminal is capable of providing dispalys corresponding to various types of operation.

Abstract: A heating device with hot water supply function includes: a combustion means; a first heat exchanger; a circulation passage that connects the first heat exchanger and an room heating unit; a circulation pump; a bypass passage that branches off from the circulation passage; a second heat exchanger for hot water supply provided in the bypass passage; a cold water supply passage; a hot water supply passage for supply of hot water from the second heat exchanger; and a distribution means that is provided at a branching section and whose distribution ratio can be adjusted, so that it becomes possible selectively to execute either only room heating operation, or only hot water supply operation, or simultaneous room heating operation and hot water supply operation; wherein the hot water supply outlet, the thermal medium inlet, and the room heating outlet of the distribution means are at the same height.