Patents by Inventor Yasushi Niitsu

Yasushi Niitsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8531455
    Abstract: There is provided a parallax barrier filter realizing far higher brightness than a conventional barrier filter. A large number of apertures 12 are arranged obliquely and at equal intervals in a parallax barrier filter 10 of a five-parallax type. For a five-parallax type, the apertures 12 are rectangles with the same shape and the same area, and under the condition that an opening height is 8/7 times as large as a sub-pixel height, that is, the opening height Ht=8/7Hsp, an opening width is set to 2-2.5 times as large as a sub-pixel width. A positional relation between the adjacent apertures 12 is that based on expressions Pt=5·Wsp and Dtr=(5/7)·Wsp, where Pt is a pitch of the plural apertures 12 along a lateral direction X and Dtr is a deviation amount between the apertures 12 adjacent in a vertical direction Y.
    Type: Grant
    Filed: November 12, 2010
    Date of Patent: September 10, 2013
    Assignee: Netplus Co., Ltd.
    Inventors: Ingo Relke, Yasushi Niitsu
  • Publication number: 20110109623
    Abstract: There is provided a parallax barrier filter realizing far higher brightness than a conventional barrier filter. A large number of apertures 12 are arranged obliquely and at equal intervals in a parallax barrier filter 10 of a five-parallax type. For a five-parallax type, the apertures 12 are rectangles with the same shape and the same area, and under the condition that an opening height is 8/7 times as large as a sub-pixel height, that is, the opening height Ht=8/7Hsp, an opening width is set to 2-2.5 times as large as a sub-pixel width. A positional relation between the adjacent apertures 12 is that based on expressions Pt=5·Wsp and Dtr=(5/7)·Wsp, where Pt is a pitch of the plural apertures 12 along a lateral direction X and Dtr is a deviation amount between the apertures 12 adjacent in a vertical direction Y.
    Type: Application
    Filed: November 12, 2010
    Publication date: May 12, 2011
    Inventors: Ingo Relke, Yasushi Niitsu
  • Patent number: 7639348
    Abstract: The stress of a sample semiconductor wafer is detected with high accuracy in the form of an absolute value without rotating the sample or the entire optical system. A laser light R is subjected to photoelastic modulation in a PEM 6 to generate a birefringence phase difference and then it is passed through first and second quarter wavelength plates and passes through a semiconductor wafer D having residual stress. When it is passed through a test piece, the direction of the stress of the test piece is detected when the angle between the laser light R and a linear polarization light is 0 and 90 degrees. The transmitted electric signal is delivered to an analog/digital converter 16, and the signal is inputted to a signal processor thus generating transmission signal data. The signal processor reads out the stored reference signal data and the transmission signal data and calculates a reference birefringence phase difference and the absolute values of the birefringence phase difference.
    Type: Grant
    Filed: March 5, 2004
    Date of Patent: December 29, 2009
    Assignee: Tokyo Denki University
    Inventors: Yasushi Niitsu, Kensuke Ichinose, Kenji Gomi
  • Publication number: 20070273865
    Abstract: The stress of a sample semiconductor wafer is detected with high accuracy in the form of an absolute value without rotating the sample or the entire optical system. A laser light R is subjected to photoelastic modulation in a PEM 6 to generate a birefringence phase difference and then it is passed through first and second quarter wavelength plates and detected. This reference signal data is stored in a signal processor. The laser light R of polarized wave subjected to photoelastic modulation in the PEM 6 and passed through the quarter wavelength plate has a birefringence phase difference and passes through a semiconductor wafer D having residual stress. When it is passed through a test piece, the direction of the stress of the test piece is detected when the angle between the laser light R and a linear polarization light is 0 and 90 degrees.
    Type: Application
    Filed: March 5, 2004
    Publication date: November 29, 2007
    Inventors: Yasushi Niitsu, Kensuke Ichinose, Kenji Gomi
  • Patent number: 6600486
    Abstract: A method for three-dimensional solid graphic generation: First, a basic graphic command and a variable showing a size of the graphics are inputted into an input unit as graphic data and a condition for changing the variable is inputted into the input unit. Next, a three-dimensional solid graphics is generated in an arithmetic unit by changing the size of the graphics based on the condition for changing the variable to change the shape of the graphics. Thereby, it becomes possible to express a solid with its shape changing and to express a movable solid.
    Type: Grant
    Filed: April 4, 2001
    Date of Patent: July 29, 2003
    Inventor: Yasushi Niitsu
  • Publication number: 20010043211
    Abstract: A method for three-dimensional solid graphic generation:
    Type: Application
    Filed: April 4, 2001
    Publication date: November 22, 2001
    Inventor: Yasushi Niitsu