Patents by Inventor Yasushi Sakaida
Yasushi Sakaida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230420749Abstract: Provided is a secondary battery electrode additive with which an active material can be coated without heat treatment that is performed at a high temperature for a long period of time, an alkaline component can be neutralized, and the decomposition of an electrolytic solution can be suppressed. For example, provided is a secondary battery electrode additive comprising a boronic acid derivative represented by formula (5). (In the formula, R1-R5 each independently represent a hydrogen atom, an alkyl group, an ester group, a glycol chain, an alkoxy group, or a hydroxy group, and R6 represents a hydrogen atom, a methyl group, or an ethyl group.Type: ApplicationFiled: November 16, 2021Publication date: December 28, 2023Applicant: NISSAN CHEMICAL CORPORATIONInventors: Tatsuya HATANAKA, Yasushi SAKAIDA, Takahiro KASEYAMA, Mari YAJIMA
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Publication number: 20210336271Abstract: Provided is a composition for forming a thin film for an energy storage device that contains a cationic polymer, and does not contain an electrically conductive carbon material.Type: ApplicationFiled: August 19, 2019Publication date: October 28, 2021Applicant: NISSAN CHEMICAL CORPORATIONInventors: Mari YAJIMA, Tatsuya HATANAKA, Yasushi SAKAIDA
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Patent number: 11131928Abstract: The invention provides a resist underlayer film forming composition which contains a compound having a glycoluril skeleton and which prevents collapse of a resist pattern formed on a substrate in a lithography process during semiconductor production; a resist underlayer film which uses this composition; and a method for producing a semiconductor device. The compound is of formula (1-1), wherein each of R1-R4 represents a C2-C10 alkyl group wherein a hydrogen atom is substituted by at least one substituent selected from the group consisting of a hydroxy group, a thiol group, a carboxyl group, C1-C5 alkoxyethyl groups, C1-C5 alkylsulfanyl groups and organic groups containing an ester bond, or a C2-C10 alkenyl group; the R1-R4 moieties may be the same as or different from each other; and each of R5 and R6 represents a hydrogen atom or a group selected from among C1-C10 alkyl groups and a phenyl group.Type: GrantFiled: March 29, 2017Date of Patent: September 28, 2021Assignee: NISSAN CHEMICAL CORPORATIONInventors: Yuki Usui, Takahiro Kishioka, Yasushi Sakaida, Hiroto Ogata
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Patent number: 11112696Abstract: A composition for forming protective films against aqueous hydrogen peroxide solutions, including: a compound of the following formula (1a) or formula (1b) or a compound having a substituent of the following formula (2) and having a molecular weight of 300 or more and less than 800 or a weight-average molecular weight of 300 or more and less than 800; and a solvent, the composition containing the compound of the formula (1a) or formula (1b) of 0.1% by mass to 60% by mass or the compound having the substituent of the formula (2) of 10% by mass to 100% by mass, relative to solids excluding the solvent: (wherein R1 is a C1-4 alkylene or alkenylene group or a direct bond, k is 0 or 1, m is an integer of 1 to 3, and n is an integer of 2 to 4.Type: GrantFiled: September 15, 2017Date of Patent: September 7, 2021Assignee: NISSAN CHEMICAL CORPORATIONInventors: Yuto Hashimoto, Hikaru Tokunaga, Hiroto Ogata, Tomoya Ohashi, Yasushi Sakaida, Takahiro Kishioka
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Patent number: 11003078Abstract: A composition for forming a protective film against basic aqueous hydrogen peroxide solution, including a crosslinker having, in one molecule, two or more groups at least one selected from the group consisting of a glycidyl group, a terminal epoxy group, an epoxycyclopentyl group, an epoxycyclohexyl group, an oxetanyl group, a vinyl ether group, an isocyanate group, and a blocked isocyanate, a compound having a group of Formula (1): (wherein X1 is a substituent reacting with the crosslinker, R0 is a direct bond or a C1-2 alkylene group, X2 is a C1-2 alkyl group, C1-2 alkoxy group, or fluoro group, a is an integer of 0-2, b is an integer of 1-3, c is an integer of 0-4, and b and c satisfy a relational expression of 1?(b+c)?5) on a side chain or a terminal and having a weight average molecular weight of 800 or more, and an organic solvent.Type: GrantFiled: April 21, 2017Date of Patent: May 11, 2021Assignee: NISSAN CHEMICAL CORPORATIONInventors: Tomoya Ohashi, Hiroto Ogata, Yuto Hashimoto, Yuki Usui, Yasushi Sakaida, Takahiro Kishioka
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Publication number: 20210028463Abstract: Provided is an undercoat layer-forming composition which is for an energy storage device and is characterized by including a conductive carbon material, a dispersant, and a solvent, and having an expected conductivity of 50 S/cm or less when the density of the conductive carbon material is 1 g/cm3.Type: ApplicationFiled: March 19, 2019Publication date: January 28, 2021Applicant: NISSAN CHEMICAL CORPORATIONInventors: Tatsuya HATANAKA, Yasushi SAKAIDA
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Publication number: 20210020952Abstract: Provided is an undercoat layer-forming composition which is for an energy storage device and is characterized by including a conductive carbon material, a dispersant, and a solvent, and having a density of 1.15 g/cm3 or more measured when a pressure of 20 kN/cm2 is applied to a powder of the conductive carbon material.Type: ApplicationFiled: March 19, 2019Publication date: January 21, 2021Applicant: NISSAN CHEMICAL CORPORATIONInventors: Tatsuya HATANAKA, Yasushi SAKAIDA
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Patent number: 10684546Abstract: A composition for forming a resist underlayer film has excellent storage stability at normal temperature. A composition for forming a resist underlayer film for lithography including a nitrogen-containing compound having 2 to 6 substituents of the following Formula (1) which bond to nitrogen atoms in one molecule, a polymer, a compound that promotes a crosslinking reaction, and an organic solvent. The nitrogen-containing compound having 2 to 6 substituents of Formula (1) in one molecule is for example a glycoluril derivative of the following Formula (1A). In the formula, each R1 is a methyl group or an ethyl group, and R2 and R3 are independently a hydrogen atom, a C1-4 alkyl group, or phenyl group.Type: GrantFiled: April 11, 2017Date of Patent: June 16, 2020Assignee: NISSAN CHEMICAL CORPORATIONInventors: Yasushi Sakaida, Kenji Takase, Takahiro Kishioka, Rikimaru Sakamoto
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Publication number: 20200183282Abstract: A composition for forming protective films against aqueous hydrogen peroxide solutions, including: a compound of the following formula (1a) or formula (1b) or a compound having a substituent of the following formula (2) and having a molecular weight of 300 or more and less than 800 or a weight-average molecular weight of 300 or more and less than 800; and a solvent, the composition containing the compound of the formula (1a) or formula (1b) of 0.1% by mass to 60% by mass or the compound having the substituent of the formula (2) of 10% by mass to 100% by mass, relative to solids excluding the solvent: (wherein R1 is a C1-4 alkylene or alkenylene group or a direct bond, k is 0 or 1, m is an integer of 1 to 3, and n is an integer of 2 to 4.Type: ApplicationFiled: September 15, 2017Publication date: June 11, 2020Applicant: NISSAN CHEMICAL CORPORATIONInventors: Yuto HASHIMOTO, Hikaru TOKUNAGA, Hiroto OGATA, Tomoya OHASHI, Yasushi SAKAIDA, Takahiro KISHIOKA
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Patent number: 10509320Abstract: There is provided an underlayer coating forming composition for lithography that is used in lithography process of the manufacture of semiconductor devices and that has a high dry etching rate in comparison to photoresists, does not intermix with photoresists, and is capable of flattening the surface of a semi conductor substrate having holes of a high aspect ratio. The underlayer coating forming composition for lithography comprises, a compound having two or more protected carboxylic groups, a compound having two or more epoxy groups, and a solvent.Type: GrantFiled: January 6, 2006Date of Patent: December 17, 2019Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Satoshi Takei, Tetsuya Shinjo, Keisuke Hashimoto, Yasushi Sakaida
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Publication number: 20190163064Abstract: A composition for forming a protective film against basic aqueous hydrogen peroxide solution, including a crosslinker having, in one molecule, two or more groups at least one selected from the group consisting of a glycidyl group, a terminal epoxy group, an epoxycyclopentyl group, an epoxycyclohexyl group, an oxetanyl group, a vinyl ether group, an isocyanate group, and a blocked isocyanate, a compound having a group of Formula (1): (wherein X1 is a substituent reacting with the crosslinker, R0 is a direct bond or a C1-2 alkylene group, X2 is a C1-2 alkyl group, C1-2 alkoxy group, or fluoro group, a is an integer of 0-2, b is an integer of 1-3, c is an integer of 0-4, and b and c satisfy a relational expression of 1?(b+c)?5) on a side chain or a terminal and having a weight average molecular weight of 800 or more, and an organic solvent.Type: ApplicationFiled: April 21, 2017Publication date: May 30, 2019Applicant: NISSAN CHEMICAL CORPORATIONInventors: Tomoya OHASHI, Hiroto OGATA, Yuto HASHIMOTO, Yuki USUI, Yasushi SAKAIDA, Takahiro KISHIOKA
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Publication number: 20190163063Abstract: A composition for forming a resist underlayer film has excellent storage stability at normal temperature. A composition for forming a resist underlayer film for lithography including a nitrogen-containing compound having 2 to 6 substituents of the following Formula (1) which bond to nitrogen atoms in one molecule, a polymer, a compound that promotes a crosslinking reaction, and an organic solvent. The nitrogen-containing compound having 2 to 6 substituents of Formula (1) in one molecule is for example a glycoluril derivative of the following Formula (1A). In the formula, each R1 is a methyl group or an ethyl group, and R2 and R3 are independently a hydrogen atom, a C1-4 alkyl group, or phenyl group.Type: ApplicationFiled: April 11, 2017Publication date: May 30, 2019Applicant: NISSAN CHEMICAL CORPORATIONInventors: Yasushi SAKAIDA, Kenji TAKASE, Takahiro KISHIOKA, Rikimaru SAKAMOTO
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Patent number: 10289002Abstract: An electron beam resist underlayer film-forming composition includes a polymer containing a unit structure having a lactone ring and a unit structure having a hydroxy group. The polymer may be a polymer obtained by copolymerizing a monomer mixture containing a lactone (meth)acrylate, a hydroxyalkyl (meth)acrylate, and phenyl (meth)acrylate or benzyl (meth)acrylate. A method for producing a semiconductor device including: applying the electron beam resist underlayer film-forming composition onto a substrate and heating the applied composition to form an electron beam resist underlayer film; coating the electron beam resist underlayer film with an electron beam resist; irradiating the substrate coated with the electron beam resist underlayer film and the electron beam resist with an electron beam; developing the substrate; and transferring an image onto the substrate by dry etching to form an integrated circuit element.Type: GrantFiled: December 5, 2014Date of Patent: May 14, 2019Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Yasushi Sakaida, Ryuta Mizuochi, Rikimaru Sakamoto
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Publication number: 20190086806Abstract: The invention provides a resist underlayer film forming composition which contains a compound having a glycoluril skeleton and which prevents collapse of a resist pattern formed on a substrate in a lithography process during semiconductor production; a resist underlayer film which uses this composition; and a method for producing a semiconductor device. The compound is of formula (1-1), wherein each of R1-R4 represents a C2-C10 alkyl group wherein a hydrogen atom is substituted by at least one substituent selected from the group consisting of a hydroxy group, a thiol group, a carboxyl group, C1-C5 alkoxyethyl groups, C1-C5 alkylsulfanyl groups and organic groups containing an ester bond, or a C2-C10 alkenyl group; the R1-R4 moieties may be the same as or different from each other; and each of R5 and R6 represents a hydrogen atom or a group selected from among C1-C10 alkyl groups and a phenyl group.Type: ApplicationFiled: March 29, 2017Publication date: March 21, 2019Applicant: NISSAN CHEMICAL CORPORATIONInventors: Yuki USUI, Takahiro KISHIOKA, Yasushi SAKAIDA, Hiroto OGATA
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Patent number: 10113083Abstract: The present invention provides a resist underlayer film that has a wide focus position range within which a good resist shape can be obtained. A resist underlayer film-forming composition for lithography comprising a linear polymer that is obtained by a reaction of a diepoxy group-containing compound (A) with a dicarboxyl group-containing compound (B). The linear polymer has structures of the following formulae (1), (2), and (3) derived from the diepoxy group-containing compound (A) or the dicarboxyl group-containing compound (B): The linear polymer preferably contains a polymer obtained by a reaction of two diepoxy group-containing compounds (A) each having structures of Formulae (1) and (2) with a dicarboxyl group-containing compound (B) having a structure of Formula (3), or a polymer obtained by a reaction of a diepoxy group-containing compound (A) having a structure of Formula (1) with two dicarboxyl group-containing compounds (B) each having structures of Formulae (2) and (3).Type: GrantFiled: August 1, 2014Date of Patent: October 30, 2018Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Ryuji Ohnishi, Ryuta Mizuochi, Tokio Nishita, Yasushi Sakaida, Rikimaru Sakamoto
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Patent number: 10067423Abstract: An additive for a resist underlayer film-forming composition containing a copolymer having structural units of Formulae (1) to (4), and a resist underlayer film-forming composition containing the additive: (where each R1 is independently a hydrogen atom or methyl group, Ar is arylene group, Pr is a protecting group or a hydrogen atom, X is a direct bond or a —C(?O)O—R2— group, R2 constituting the —C(?O)O—R2— group is a C1-3 alkylene group, the alkylene group is bonded to a sulfur atom, R3 is a hydrogen atom, methyl group, methoxy group, or halogeno group, R4 is a C1-3 alkyl group in which at least one hydrogen atom is substituted with a fluoro group, and Z is an organic group having 4 to 7-membered ring lactone skeleton, adamantane skeleton, or norbornane skeleton).Type: GrantFiled: February 25, 2015Date of Patent: September 4, 2018Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Yuto Hashimoto, Yasushi Sakaida, Kenji Takase, Rikimaru Sakamoto
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Patent number: 10042247Abstract: There is provided a mask blank including on a substrate: a thin film for forming a transfer pattern; a resist underlayer formed on the thin film and made of a resist underlayer composition containing a polymer having a unit structure having a lactone ring and a unit structure having a hydroxyl group; a resist film formed on the resist underlayer film and made of a resist composition; and a mixed film formed so as to be interposed between the resist underlayer film and the resist film and made of a mixed component containing the resist underlayer composition and the resist composition.Type: GrantFiled: August 25, 2015Date of Patent: August 7, 2018Assignees: HOYA CORPORATION, NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Takahiro Hiromatsu, Masahiro Hashimoto, Yasushi Sakaida, Ryuta Mizuochi, Rikimaru Sakamoto, Masaki Nagai
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Patent number: 10025191Abstract: There is provided a polymer-containing coating liquid which is applied to a resist pattern and which is used in place of a conventional rinsing liquid. A coating liquid that is applied to a resist pattern comprising a polymer having a structural unit of Formula (1): (wherein R1 is a C1-12 organic group, and X is an organic group of Formula (2): (wherein R2 and R3 are each independently a linear or branched alkylene group having a carbon atom number of 1 to 3, R2 is bonded to an oxygen atom in Formula (1), R4 is a C1-4 alkoxy group, an allyloxy group, or a hydroxy group, and p is 0, 1, or 2)), and a solvent containing water and/or alcohols.Type: GrantFiled: February 3, 2015Date of Patent: July 17, 2018Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Shuhei Shigaki, Yasushi Sakaida, Rikimaru Sakamoto
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Patent number: 9910354Abstract: A composition for forming a resist underlayer film which make possible to form a desired high-adhesion resist pattern. A resist underlayer film-forming composition for lithography containing a polymer having the following structure Formula (1) or (2) at a terminal of a polymer chain, crosslinker, compound promoting crosslinking reaction, and organic solvent. (wherein R1 is a C1-6 alkyl group optionally having a substituent, phenyl group, pyridyl group, halogeno group, or hydroxy group, R2 is a hydrogen atom, a C1-6 alkyl group, hydroxy group, halogeno group, or ester group of —C(?O)O—X wherein X is a C1-6 alkyl group optionally having a substituent, R3 is a hydrogen atom, a C1-6 alkyl group, hydroxy group, or halogeno group, R4 is a direct bond or divalent C1-8 organic group, R5 is a divalent C1-8 organic group, A is an aromatic ring or heteroaromatic ring, t is 0 or 1, and u is 1 or 2.Type: GrantFiled: April 14, 2015Date of Patent: March 6, 2018Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Yasushi Sakaida, Tokio Nishita, Noriaki Fujitani, Rikimaru Sakamoto
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Publication number: 20170285460Abstract: There is provided a mask blank including on a substrate: a thin film for forming a transfer pattern; a resist underlayer formed on the thin film and made of a resist underlayer composition containing a polymer having a unit structure having a lactone ring and a unit structure having a hydroxyl group; a resist film formed on the resist underlayer film and made of a resist composition; and a mixed film formed so as to be interposed between the resist underlayer film and the resist film and made of a mixed component containing the resist underlayer composition and the resist composition.Type: ApplicationFiled: August 25, 2015Publication date: October 5, 2017Applicants: HOYA CORPORATION, NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Takahiro HIROMATSU, Masahiro HASHIMOTO, Yasushi SAKAIDA, Ryuta MIZUOCHI, Rikimaru SAKAMOTO, Masaki NAGAI