Abstract: In one embodiment, a plasma induced flow electrode structure has an electrode block, an insulating layer and an electrode layer. The electrode block has first and second surfaces and through holes penetrating between these first and second surfaces. The insulating layer is disposed on the first surface and inside the through holes. The electrode layer is disposed on the insulating layer of the first surface.

Abstract: In one embodiment, a plasma induced flow electrode structure has an electrode block, an insulating layer and an electrode layer. The electrode block has first and second surfaces and through holes penetrating between these first and second surfaces. The insulating layer is disposed on the first surface and inside the through holes. The electrode layer is disposed on the insulating layer of the first surface.

Abstract: A gas processing apparatus of an embodiment includes: first and second dielectric substrates facing with each other; first and second discharge electrodes respectively disposed on a pair of facing principal surfaces of the dielectric substrates; first and second ground electrodes respectively disposed on a pair of principle surfaces at opposite sides of the principle surfaces of the dielectric substrates; a gas flow path to supply gas to be processed between the discharge electrodes; an AC power source to generate first and second plasma-induced flows by applying an AC voltage between the discharge electrodes and the ground electrodes; and a region disposed between the dielectric substrates at downstream of the plasma-induced flows from the discharge electrodes, and a gap between the dielectric substrates being 1.3 times or less of a sum of thicknesses of the plasma-induced flows.

Abstract: A gas processing apparatus of an embodiment includes: first and second dielectric substrates facing with each other; first and second discharge electrodes respectively disposed on a pair of facing principal surfaces of the dielectric substrates; first and second ground electrodes respectively disposed on a pair of principle surfaces at opposite sides of the principle surfaces of the dielectric substrates; a gas flow path to supply gas to be processed between the discharge electrodes; an AC power source to generate first and second plasma-induced flows by applying an AC voltage between the discharge electrodes and the ground electrodes; and a region disposed between the dielectric substrates at downstream of the plasma-induced flows from the discharge electrodes, and a gap between the dielectric substrates being 1.3 times or less of a sum of thicknesses of the plasma-induced flows.

Abstract: In a magnetic refrigeration device, magnetic bodies having a magnetocaloric effect and solid heat accumulation members having heat accumulation effect are arranged alternately with gaps therebetween. Magnetic field apply units start and stop application of magnetic fields to the magnetic bodies. A contact mechanism brings each of the magnetic bodies into contact with one of the solid heat accumulation members adjacent to the each magnetic body. Alternatively, the contact mechanism brings each of the solid heat accumulation members into contact with one of the magnetic bodies adjacent to the each solid heat accumulation members.

Abstract: A battery pack of a battery includes a plurality of laminated cells that are hermetically sealed by a laminated film, a case for storing the plurality of the laminated cells, a positive electrode terminal and a negative electrode terminal of a battery for connecting the cells in parallel or series for connection to the outside of the case, a lid member for pressing the cells from the uppermost surface of the laminate of the cells stored in the case toward the inner side of the case in the direction opposite to the laminating direction of the cells, and a fixing member for fixing the lid member to the case at a position where a predetermined pressing force is applied.

Abstract: A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.

Abstract: A pattern inspecting method, comprising preparing a sample having a first and a second inspection regions and an imaging device having a plurality of pixels, scanning the first inspection region to a first direction using the imaging device to obtain a first measurement pattern representing at least parts of the first inspection region, scanning the second inspection region to the first direction using the imaging device to obtain a second measurement pattern representing at least parts of the second inspection region, comparing the first measurement pattern and the second measurement pattern with each other to determine presence or absence of a defect formed on the sample, and controlling a scanning condition for scanning a pattern of the second inspection region by the imaging device so as to keep the same with the scanning condition when the pattern of the first inspection region is scanned by the imaging device.

Abstract: A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.

Abstract: A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.

Abstract: A pattern inspecting method, comprising preparing a sample having a first and a second inspection regions and an imaging device having a plurality of pixels, scanning the first inspection region to a first direction using the imaging device to obtain a first measurement pattern representing at least parts of the first inspection region, scanning the second inspection region to the first direction using the imaging device to obtain a second measurement pattern representing at least parts of the second inspection region, comparing the first measurement pattern and the second measurement pattern with each other to determine presence or absence of a defect formed on the sample, and controlling a scanning condition for scanning a pattern of the second inspection region by the imaging device so as to keep the same with the scanning condition when the pattern of the first inspection region is scanned by the imaging device.

Abstract: A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.

Abstract: A battery pack of a battery includes a plurality of laminated cells that are hermetically sealed by a laminated film, a case for storing the plurality of the laminated cells, a positive electrode terminal and a negative electrode terminal of a battery for connecting the cells in parallel or series for connection to the outside of the case, a lid member for pressing the cells from the uppermost surface of the laminate of the cells stored in the case toward the inner side of the case in the direction opposite to the laminating direction of the cells, and a fixing member for fixing the lid member to the case at a position where a predetermined pressing force is applied.

Abstract: A battery pack includes: a plurality of flat-shaped cells each including a generator element sealed by a laminate film; a case for accommodating the cells so as to be laminated in a thickness direction thereof, the case having an opening formed at least at one end thereof; a lid member fixed to the opening of the case and pressing the laminated cells in a laminating direction thereof; a bottom member provided between the case and the cell located at an end of the laminated cells on a side opposite to the opening of the case; a first tray provided between the cells and brought into contact with the case; a second tray provided between the lid member and the cells and brought into contact with the case; and a third tray provided between the bottom member and the cells and brought into contact with the case. The lid member and the bottom member are formed of a material having a thermal conductivity lower than a thermal conductivity of any one of the first tray, the second tray and the third tray.

Abstract: A pattern inspection apparatus includes a light source irradiating a plate having a pattern, a photoelectric device photoelectrically converting the image of the pattern, a generator generating detected pattern data based on a photoelectrically converted signal, a generator generating reference pattern data from designed data, a comparator comparing the detected pattern data with the reference pattern data, a sensor detecting a light intensity of the light source, a barometric pressure sensor detecting a barometric pressure in the apparatus, a detector detecting at least one of the light intensity and barometric pressure deviating from predetermined ranges, a memory storing the detected and reference pattern data at a point of time when the abnormal status is generated in synchronization with position data and detected values of the light intensity and barometric pressure and an output device which outputs these.

Abstract: A pattern inspection apparatus includes a pulse laser light source sequentially generating pulse laser light, an illumination optics applying the pulse laser light onto a mask substrate, an imaging optics collecting light from the mask substrate to form an image thereof, an area sensor sensing the image of the mask substrate obtained by the optics in a rectangular area unit, a comparator comparing image data acquired by the area sensor with previously prepared reference data to detect a defect of a pattern, a stage driving apparatus two-dimensionally scanning a stage having the mask substrate placed thereon, and a stage position detector detecting a position of the stage. With the above configuration, it is possible to efficiently inspect the surface of the mask substrate by adequately setting the moving speed of the mask substrate and the sensing timing of the sensing apparatus.

Abstract: A pattern inspecting method, comprising preparing a sample having a first and a second inspection regions and an imaging device having a plurality of pixels, scanning the first inspection region to a first direction using the imaging device to obtain a first measurement pattern representing at least parts of the first inspection region, scanning the second inspection region to the first direction using the imaging device to obtain a second measurement pattern representing at least parts of the second inspection region, comparing the first measurement pattern and the second measurement pattern with each other to determine presence or absence of a defect formed on the sample, and controlling a scanning condition for scanning a pattern of the second inspection region by the imaging device so as to keep the same with the scanning condition when the pattern of the first inspection region is scanned by the imaging device.

Abstract: A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.

Abstract: A pattern inspection apparatus includes a light source irradiating a plate having a pattern with light, a photoelectric device photoelectrically converting the optical image of the pattern, a detected pattern data generator generating detected pattern data based on a photoelectrically converted signal, a reference pattern data generator generating reference pattern data from designed data, a comparator comparing the detected pattern data with the reference pattern data, a light intensity sensor detecting a light intensity of the light, a barometric pressure sensor detecting a barometric pressure in the apparatus, a status detector detecting at least one of the light intensity and barometric pressure deviating from predetermined ranges, a data memory storing the detected and reference pattern data at the same time when the abnormal status is generated in synchronization with position data and detected values of the light intensity and barometric pressure and an output device which outputs these.

Abstract: A pattern inspection apparatus includes a pulse laser light source sequentially generating pulse laser light, an illumination optics applying the pulse laser light onto a mask substrate, an imaging optics collecting light from the mask substrate to form an image thereof, an area sensor sensing the image of the mask substrate obtained by the optics in a rectangular area unit, a comparator comparing image data acquired by the area sensor with previously prepared reference data to detect a defect of a pattern, a stage driving apparatus two-dimensionally scanning a stage having the mask substrate placed thereon, and a stage position detector detecting a position of the stage. With the above configuration, it is possible to efficiently inspect the surface of the mask substrate by adequately setting the moving speed of the mask substrate and the sensing timing of the sensing apparatus.