Patents by Inventor Yasushi Saotome
Yasushi Saotome has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240082189Abstract: A therapeutic agent may be effective for hypertrophic cardiomyopathy. The therapeutic agent may include 5-aminolevulinic acid, an ester thereof, or a salt thereof, as an active ingredient. A method for treating hypertrophic cardiomyopathy may include administering 5-aminolevulinic acid, an ester thereof, or a salt thereof in an effective dose, as may a method for improving left ventricular diastolic function in hypertrophic cardiomyopathy, and a method for improving myocardial relaxation rate in hypertrophic cardiomyopathy.Type: ApplicationFiled: January 24, 2022Publication date: March 14, 2024Applicant: JUNTENDO EDUCATIONAL FOUNDATIONInventors: Yasushi OKAZAKI, Atsuko OKAZAKI, Osamu MINOWA, Hideo SAOTOME, Yukiko YATSUKA, Katsuharu TSUCHIDA, Noriko ICHINO
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Publication number: 20220186197Abstract: The present invention provides engineered RNA polymerase variants and compositions comprising these variants. The present invention further provides engineered T7 RNA polymerase variants and compositions comprising these variants. These variants have been evolved for selective incorporation of the m7G(5?)ppp(5?)m7G cap analog over GTP at the initiation of in vitro transcription. The present invention also provides methods for selective capping of RNA transcripts.Type: ApplicationFiled: December 21, 2021Publication date: June 16, 2022Inventors: Mathew G. Miller, Chinping Chng, Oscar Alvizo, Melissa Ann Mayo, James Nicholas Riggins, Xiang Yi, Jonathan S. Penfield, Gjalt W. Huisman, Jared Davis, Yasushi Saotome
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Patent number: 11236312Abstract: The present invention provides engineered RNA polymerase variants and compositions comprising these variants. The present invention further provides engineered T7 RNA polymerase variants and compositions comprising these variants. These variants have been evolved for selective incorporation of the m7G(5?)ppp(5?)m7G cap analog over GTP at the initiation of in vitro transcription. The present invention also provides methods for selective capping of RNA transcripts.Type: GrantFiled: July 29, 2020Date of Patent: February 1, 2022Assignee: Codexis, Inc.Inventors: Mathew G. Miller, Chinping Chng, Oscar Alvizo, Melissa Ann Mayo, James Nicholas Riggins, Xiang Yi, Jonathan S. Penfield, Gjalt W. Huisman, Jared Davis, Yasushi Saotome
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Patent number: 11236311Abstract: The present invention provides engineered RNA polymerase variants and compositions comprising these variants. The present invention further provides engineered T7 RNA polymerase variants and compositions comprising these variants. These variants have been evolved for selective incorporation of the m7G(5?)ppp(5?)m7G cap analog over GTP at the initiation of in vitro transcription. The present invention also provides methods for selective capping of RNA transcripts.Type: GrantFiled: July 24, 2020Date of Patent: February 1, 2022Assignee: Codexis, Inc.Inventors: Mathew G. Miller, Chinping Chng, Oscar Alvizo, Melissa Ann Mayo, James Nicholas Riggins, Xiang Yi, Jonathan S. Penfield, Gjalt W. Huisman, Jared Davis, Yasushi Saotome
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Publication number: 20200354699Abstract: The present invention provides engineered RNA polymerase variants and compositions comprising these variants. The present invention further provides engineered T7 RNA polymerase variants and compositions comprising these variants. These variants have been evolved for selective incorporation of the m7G(5?)ppp(5?)m7G cap analog over GTP at the initiation of in vitro transcription. The present invention also provides methods for selective capping of RNA transcripts.Type: ApplicationFiled: July 29, 2020Publication date: November 12, 2020Inventors: Mathew G. Miller, Chinping Chng, Oscar Alvizo, Melissa Ann Mayo, James Nicholas Riggins, Xiang Yi, Jonathan S. Penfield, Gjalt W. Huisman, Jared Davis, Yasushi Saotome
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Publication number: 20200354698Abstract: The present invention provides engineered RNA polymerase variants and compositions comprising these variants. The present invention further provides engineered T7 RNA polymerase variants and compositions comprising these variants. These variants have been evolved for selective incorporation of the m7G(5?)ppp(5?)m7G cap analog over GTP at the initiation of in vitro transcription. The present invention also provides methods for selective capping of RNA transcripts.Type: ApplicationFiled: July 24, 2020Publication date: November 12, 2020Inventors: Mathew G. Miller, Chinping Chng, Oscar Alvizo, Melissa Ann Mayo, James Nicholas Riggins, Xiang Yi, Jonathan S. Penfield, Gjalt W. Huisman, Jared Davis, Yasushi Saotome
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Patent number: 10738286Abstract: The present invention provides engineered RNA polymerase variants and compositions comprising these variants. The present invention further provides engineered T7 RNA polymerase variants and compositions comprising these variants. These variants have been evolved for selective incorporation of the m7G(5?)ppp(5?)m7G cap analog over GTP at the initiation of in vitro transcription. The present invention also provides methods for selective capping of RNA transcripts.Type: GrantFiled: June 19, 2018Date of Patent: August 11, 2020Assignee: Codexis, Inc.Inventors: Mathew G. Miller, Chinping Chng, Oscar Alvizo, Melissa Ann Mayo, James Nicholas Riggins, Xiang Yi, Jonathan S. Penfield, Gjalt W. Huisman, Jared Davis, Yasushi Saotome
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Publication number: 20190002850Abstract: The present invention provides engineered RNA polymerase variants and compositions comprising these variants. The present invention further provides engineered T7 RNA polymerase variants and compositions comprising these variants. These variants have been evolved for selective incorporation of the m7G(5?)ppp(5?)m7G cap analog over GTP at the initiation of in vitro transcription. The present invention also provides methods for selective capping of RNA transcripts.Type: ApplicationFiled: June 19, 2018Publication date: January 3, 2019Inventors: Mathew G. Miller, Chinping Chng, Oscar Alvizo, Melissa Ann Mayo, James Nicholas Riggins, Xiang Yi, Jonathan S. Penfield, Gjalt W. Huisman, Jared Davis, Yasushi Saotome
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Patent number: 7607735Abstract: A vehicle seat may include a seat cushion that includes a central portion, first and second side support portions, and a vertical moving mechanism. The first and second side support portions are capable of laterally supporting femoral portions of a passenger. The vertical moving mechanism is capable of vertically moving the first and second side support portions in synchronism with each other, so as to change heights of the first and second side support portions relative to the central portion. The vertical moving mechanism is arranged and constructed to vertically move each of the first and second side support portions within a use range thereof in which each of the first and second side support portions has side support function. The vertical moving mechanism is arranged and constructed to further vertically move the second side support portion downwardly beyond the use range to a release position in which the second side support portion does not have the side support function.Type: GrantFiled: April 4, 2008Date of Patent: October 27, 2009Assignee: Toyota Boshoku Kabushiki KaishaInventors: Satoru Kuno, Tokuyuki Nishikawa, Yasushi Saotome
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Publication number: 20080252123Abstract: A vehicle seat may include a seat cushion that includes a central portion, first and second side support portions, and a vertical moving mechanism. The first and second side support portions are capable of laterally supporting femoral portions of a passenger. The vertical moving mechanism is capable of vertically moving the first and second side support portions in synchronism with each other, so as to change heights of the first and second side support portions relative to the central portion. The vertical moving mechanism is arranged and constructed to vertically move each of the first and second side support portions within a use range thereof in which each of the first and second side support portions has side support function. The vertical moving mechanism is arranged and constructed to further vertically move the second side support portion downwardly beyond the use range to a release position in which the second side support portion does not have the side support function.Type: ApplicationFiled: April 4, 2008Publication date: October 16, 2008Applicant: TOYOTA BOSHOKU KABUSHIKI KAISHAInventors: Satoru KUNO, Tokuyuki NISHIKAWA, Yasushi SAOTOME
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Patent number: 4873301Abstract: Disclosed are an optically active, ethylenically unsaturated monomer represented by the following structural formula: ##STR1## wherein: A stands for S, SO or SO.sub.2 ; X and Y each stand for a hydrogen atom or a substituent selected from the group consisting of alkyl groups and acyl groups; Z stands for a substituent selected from the group consisting of alkoxy, alkylamino, hydroxyl and silyloxy groups; and X and Y can be bonded together to form a ring with the nitrogen atom to which they are bonded or X and Y can be a single group bonded to said nitrogen atom through a double bond, with the proviso that at least one of X and Z is an alkenyl equivalent to said group, and polymers of this monomer. One typical instance of the monomer is benzyl 6-acrylaminopenicillanate.Type: GrantFiled: January 25, 1988Date of Patent: October 10, 1989Assignee: M & D Research Co., Ltd.Inventors: Yasushi Saotome, Takeo Miyazawa, Takeshi Endo
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Patent number: 4624909Abstract: Disclosed is a novel novolak resin comprising structural units having a trimethylsilyl group. A resist material highly resistive to dry etching is obtained by adding a photosensitive diazo compound to this novolak resin. The resist material is useful in various lithography methods to form a positive resist pattern. This resist material is used in a pattern forming method of a two-layer type, in which a fine pattern is formed in a thin film of the resist material by lithography and then transferred into an underlying thick organic polymer layer by dry etching of the underlying layer with the resist pattern as mask. Curing of the resist pattern by irradiation with deep UV rays is effective for further improvement in the precision of the transferred pattern.Type: GrantFiled: April 18, 1985Date of Patent: November 25, 1986Assignee: NEC CorporationInventors: Yasushi Saotome, Hiroshi Gokan, Kazuhide Saigo, Masayoshi Suzuki, Yoshitake Ohnishi