Patents by Inventor Yasushi Sugiyama

Yasushi Sugiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6602562
    Abstract: The invention generally relates to an electro-optical liquid-crystal display having a re-alignment layer, for re-aligning the liquid crystals, whose field has a component parallel to the liquid-crystal layer which is desirable for the re-alignment, including a liquid-crystalline medium of positive dielectric anisotropy, where the medium can include one or more compounds of the formula I and one or more compounds selected from the group of compounds of the formulae II and III in which R1, R2 and R3 are each, independent of one another, alkyl or alkoxy having 1 to 7 carbon atoms or alkenyl, alkenyloxy or alkoxyalkyl having 2 to 7 carbon atoms, Y11, Y12, Y21, Y22, Y31 and Y32 are each, independent of one another, H or F, are each, independent of one another,  and Q—X is F, Cl, —OCF2H or —OCF3.
    Type: Grant
    Filed: April 28, 2000
    Date of Patent: August 5, 2003
    Assignee: Merck Patent Gesellschaft mit
    Inventors: Shinji Nakajima, Hideo Ichinose, Akiko Takashima, Yasushi Sugiyama
  • Publication number: 20030113482
    Abstract: The invention generally relates to an electro-optical liquid-crystal display having a re-alignment layer, for re-aligning the liquid crystals, whose field has a component parallel to the liquid-crystal layer which is desirable for the re-alignment, including a liquid-crystalline medium of positive dielectric anisotropy, where the medium can include one or more compounds of the formula I and one or more compounds selected from the group of compounds of the formulae II and III 1
    Type: Application
    Filed: April 28, 2000
    Publication date: June 19, 2003
    Inventors: Shinji Nakajima, Hideo Ichinose, Akiko Takashima, Yasushi Sugiyama
  • Patent number: 6551172
    Abstract: In order to measure a thickness of a surface to be polished of a material to be polished for a short time, two-dimensional images are obtained from a light reflected from the surface to be polished of the material to be polished, a location at which a thickness is to be observed is specified by the obtained two-dimensional images, and thickness measurement is carried out.
    Type: Grant
    Filed: September 1, 2000
    Date of Patent: April 22, 2003
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masaru Nyui, Mikichi Ban, Takehiko Suzuki, Yasushi Sugiyama
  • Publication number: 20030052306
    Abstract: The instant invention relates to liquid crystal media comprising a component A, comprising one or more compounds of formula I 1
    Type: Application
    Filed: January 16, 2002
    Publication date: March 20, 2003
    Applicant: Merck Patent GmbH
    Inventors: Hideo Ichinose, Shinji Nakajima, Yasushi Sugiyama
  • Publication number: 20030039769
    Abstract: The invention relates to a liquid-crystalline medium based on a mixture of polar compounds having negative dielectric anisotropy, which contains at least one compound of formula I 1
    Type: Application
    Filed: April 22, 2002
    Publication date: February 27, 2003
    Applicant: Merck Patent GmbH
    Inventors: Seung-Eun Lee, Nobuo Kubo, Masahiro Iijima, Hideo Ichinose, Yukiomi Takana, Shinji Nakajima, Yasushi Sugiyama, Takanori Takeda
  • Publication number: 20020017634
    Abstract: The invention relates to liquid-crystal media which comprise at least one compound selected from the group of the compounds of the formulae I to III 1
    Type: Application
    Filed: April 30, 2001
    Publication date: February 14, 2002
    Inventors: Michael Heckmeier, Herbert Plach, Hideo Ichinose, Shinji Nakajima, Yasushi Sugiyama, Akiko Takashima
  • Patent number: 6142855
    Abstract: In order to measure a thickness of a surface to be polished of a material to be polished for a short time, two-dimensional images are obtained from a light reflected from the surface to be polished of the material to be polished, a location at which a thickness is to be observed is specified by the obtained two-dimensional images, and thickness measurement is carried out.
    Type: Grant
    Filed: October 30, 1998
    Date of Patent: November 7, 2000
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masaru Nyui, Mikichi Ban, Takehiko Suzuki, Yasushi Sugiyama
  • Patent number: 6137575
    Abstract: A method and apparatus for measuring the thickness of a film layer provided on a predetermined surface includes a step and device for detecting light reception signals of interference light of different wavelengths generated when light illuminates the film layer on the predetermined surface, a step or device for performing a first process for obtaining an approximate value for the film thickness by selecting a combination of solutions with the closest values from among solutions for the film thickness obtainable from at least three of the light reception signals corresponding to the respective wavelengths, and a step or device for performing a second process for obtaining an exact value for the film thickness by selecting a combination of solutions with the closest values from among solutions for the film thickness obtainable from all the light reception signals corresponding to the respective wavelengths.
    Type: Grant
    Filed: October 23, 1998
    Date of Patent: October 24, 2000
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yasushi Sugiyama, Mikichi Ban, Takehiko Suzuki, Masaru Nyui
  • Patent number: 5791035
    Abstract: A plurality of holes 2, each of which permits insertion of a small-diameter of an article to be manufactured, are formed in a flexible metal retaining plate 1 having a thickness of about 100 micrometers. A pair of notches 3, 3 are formed in the internal periphery of each hole 2 so as to be opposite to each other, and a cantilever 4 is defined between a pair of the notches 3, 3. The small-diameter portion of the article to be manufactured is inserted into each hole 2, and the cantilevers 4 and the hole 2 are integrally fixed together by welding. A plurality of the articles to be manufactured retained by the retaining plate 1 are fed as a unit to a surface abrasion step, a film-forming step, and others. As a result, a plurality of sensor elements can be simultaneously manufactured.
    Type: Grant
    Filed: September 13, 1996
    Date of Patent: August 11, 1998
    Assignee: Nok Corporation
    Inventors: Kazuo Yamashita, Yasushi Sugiyama
  • Patent number: 5357814
    Abstract: A method of detecting engagement/disengagement characteristics of a less-force required type mating connector, and apparatus therefor. In the less-force required type mating connector, a lever provided in a first connector is pivoted to engage or disengage a second connector with or from the first connector. The first connector is pivoted about a center of pivotal movement of the lever while the pivotal movement of the lever is prevented. A load required to prevent the pivotal movement of the lever is detected. Since the lever is unchanged in its position and angle, the load acting in one direction alone may be detected. Hence, the engagement/disengagement characteristics can be accurately detected.
    Type: Grant
    Filed: June 9, 1993
    Date of Patent: October 25, 1994
    Assignee: Sumitomo Wiring Systems, Ltd.
    Inventor: Yasushi Sugiyama