Patents by Inventor Yasushi Taniyama
Yasushi Taniyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240038554Abstract: The EFEM comprises: a transfer chamber in which a transfer robot is disposed, a first fan that forms a downward air flow in the transfer chamber, a gas return space that circulates the gas flowing downward in the transfer chamber above the first fan, a box that communicates with the transfer chamber and is provided with a gas outlet, and a connecting and disconnecting means configured to switch connection and disconnection of the box to and from the transport chamber. A circulation path in which gas circulates is formed by the transfer chamber, the gas return space, and the box. When the transfer chamber and the box are separated by the connecting and disconnecting means, a shortened circulation path is formed in which the gas circulates without passing through the box.Type: ApplicationFiled: October 11, 2023Publication date: February 1, 2024Applicant: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
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Patent number: 11851289Abstract: A conveyance system discriminates the front and back of a frame wafer without human intervention. A frame is partially formed asymmetrically with respect to a predetermined center line when viewed in a direction orthogonal to a surface of a wafer. The conveyance system includes a hand configured to hold the frame so that the frame extends in a predetermined virtual plane, a first sensor configured to detect a portion of the frame held on the hand and located in a predetermined first region in the virtual plane, a second sensor configured to detect a portion of the frame held on the hand and located in a second region opposite to the first region across the center line, and a controller configured to determine the front and back of the frame wafer based on a detection result obtained by the first sensor and a detection result obtained by the second sensor.Type: GrantFiled: September 23, 2020Date of Patent: December 26, 2023Assignee: Sinfonia Technology Co., Ltd.Inventors: Hiroaki Nakamura, Toshihiro Kawai, Kosuke Sugiura, Gengoro Ogura, Yasushi Taniyama
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Patent number: 11823934Abstract: A wafer stocker capable of further improving an environment around wafers is provided. The wafer stocker includes a housing, a loading device provided on a front surface of the housing, a wafer cassette shelf arranged in the housing, a wafer transfer robot configured to move the wafers from a transfer container mounted on the loading device to a wafer cassette in the wafer cassette shelf, a wafer cassette delivery device configured to move the wafer cassette in the wafer cassette shelf to a stage having a different height, and a fan filter unit configured to generate a laminar flow in a wafer transfer space and in a wafer cassette transfer space.Type: GrantFiled: February 28, 2023Date of Patent: November 21, 2023Assignee: Sinfonia Technology Co., Ltd.Inventors: Yasushi Taniyama, Toshihiro Kawai
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Patent number: 11823923Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).Type: GrantFiled: July 8, 2022Date of Patent: November 21, 2023Assignee: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
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Patent number: 11710652Abstract: A transport system for transporting a plurality of objects between a storage container configured to store the plurality of objects and a processing apparatus configured to collectively process the plurality of objects held on a tray, including a mounting part on which the storage container is mounted, a stage on which the plurality of objects are mounted, a tray support part configured to support the tray, a first transport device configured to transport the plurality of objects between the storage container mounted on the mounting part and the stage, and a second transport device configured to transport the plurality of objects between the stage and the tray supported by the tray support part.Type: GrantFiled: September 23, 2020Date of Patent: July 25, 2023Assignee: Sinfonia Technology Co., Ltd.Inventors: Toshihiro Kawai, Hiroaki Nakamura, Gengoro Ogura, Kosuke Sugiura, Yasushi Taniyama
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Publication number: 20230207367Abstract: A wafer stocker capable of further improving an environment around wafers is provided. The wafer stocker includes a housing, a loading device provided on a front surface of the housing, a wafer cassette shelf arranged in the housing, a wafer transfer robot configured to move the wafers from a transfer container mounted on the loading device to a wafer cassette in the wafer cassette shelf, a wafer cassette delivery device configured to move the wafer cassette in the wafer cassette shelf to a stage having a different height, and a fan filter unit configured to generate a laminar flow in a wafer transfer space and in a wafer cassette transfer space.Type: ApplicationFiled: February 28, 2023Publication date: June 29, 2023Applicant: Sinfonia Technology Co., Ltd.Inventors: Yasushi Taniyama, Toshihiro Kawai
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Patent number: 11658047Abstract: There is provided an exhaust nozzle unit capable of discharging a gas atmosphere in a substrate storage container having a loading/unloading opening from the container to an outside of the container through a port formed on a bottom surface of the container. The exhausted nozzle includes a nozzle capable of switching the port from a closed state to an open state by pressing a valve of the port; and a housing configured to hold the nozzle so as to be movable up and down between a use posture in which the port is in the open state and a standby posture in which the port is in the closed state.Type: GrantFiled: April 18, 2019Date of Patent: May 23, 2023Assignee: Sinfonia Technology Co., Ltd.Inventors: Atsushi Suzuki, Yasushi Taniyama, Tomoya Mizutani
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Patent number: 11610797Abstract: A wafer stocker is capable of further improving an environment around wafers. The wafer stocker includes a housing, a loading device provided on a front surface of the housing, a wafer cassette shelf arranged in the housing, a wafer transfer robot configured to move the wafers from a transfer container mounted on the loading device to a wafer cassette in the wafer cassette shelf, a wafer cassette delivery device configured to move the wafer cassette in the wafer cassette shelf to a stage having a different height, and a fan filter unit configured to generate a laminar flow in a wafer transfer space and in a wafer cassette transfer space.Type: GrantFiled: November 25, 2019Date of Patent: March 21, 2023Assignee: Sinfonia Technology Co., Ltd.Inventors: Yasushi Taniyama, Toshihiro Kawai
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Publication number: 20230033168Abstract: A conveyance system discriminates the front and back of a frame wafer without human intervention. A frame is partially formed asymmetrically with respect to a predetermined center line when viewed in a direction orthogonal to a surface of a wafer. The conveyance system includes a hand configured to hold the frame so that the frame extends in a predetermined virtual plane, a first sensor configured to detect a portion of the frame held on the hand and located in a predetermined first region in the virtual plane, a second sensor configured to detect a portion of the frame held on the hand and located in a second region opposite to the first region across the center line, and a controller configured to determine the front and back of the frame wafer based on a detection result obtained by the first sensor and a detection result obtained by the second sensor.Type: ApplicationFiled: September 23, 2020Publication date: February 2, 2023Applicant: Sinfonia Technology Co., Ltd.Inventors: Hiroaki Nakamura, Toshihiro Kawai, Kosuke Sugiura, Gengoro Ogura, Yasushi Taniyama
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Publication number: 20220344182Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).Type: ApplicationFiled: July 8, 2022Publication date: October 27, 2022Applicant: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
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Publication number: 20220336245Abstract: There is provided a technique capable of efficiently transporting a plurality of objects between a storage container configured to store the plurality of objects and a processing apparatus configured to collectively process the plurality of objects. A transport system 1 for transporting a plurality of objects between a storage container 9 configured to store the plurality of objects and a processing apparatus 2 configured to collectively process the plurality of objects held on a tray 8, includes: a mounting part 31 on which the storage container 9 is mounted; a stage 41 on which the plurality of objects are mounted; a tray support part 51 configured to support the tray 8; a first transport device 44 configured to transport the plurality of objects between the storage container 9 mounted on the mounting part 31 and the stage 41; and a second transport device 53 configured to transport the plurality of objects between the stage 41 and the tray 8 supported by the tray support part 51.Type: ApplicationFiled: September 23, 2020Publication date: October 20, 2022Applicant: Sinfonia Technology Co., Ltd.Inventors: Toshihiro Kawai, Hiroaki Nakamura, Gengoro Ogura, Kosuke Sugiura, Yasushi Taniyama
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Patent number: 11424145Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).Type: GrantFiled: April 10, 2020Date of Patent: August 23, 2022Assignee: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
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Publication number: 20220037184Abstract: A wafer stocker capable of further improving an environment around wafers is provided. The wafer stocker includes a housing, a loading device provided on a front surface of the housing, a wafer cassette shelf arranged in the housing, a wafer transfer robot configured to move the wafers from a transfer container mounted on the loading device to a wafer cassette in the wafer cassette shelf, a wafer cassette delivery device configured to move the wafer cassette in the wafer cassette shelf to a stage having a different height, and a fan filter unit configured to generate a laminar flow in a wafer transfer space and in a wafer cassette transfer space.Type: ApplicationFiled: November 25, 2019Publication date: February 3, 2022Applicant: Sinfonia Technology Co., Ltd.Inventors: Yasushi Taniyama, Toshihiro Kawai
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Patent number: 11139188Abstract: A purging nozzle unit of a gas supply device according to the present invention including: a housing that is capable of passing a predetermined gas so as to replace the internal atmosphere of a FOUP with the predetermined gas; a nozzle coming into intimate contact with the proximity of a port that is provided on one face of the FOUP, the nozzle being pressed to thereby open the port; an operation adjustment space configured to increase or decrease so as to operate the nozzle between a use posture in which the predetermined gas can be supplied into the target container via the port and a standby posture in which the predetermined gas cannot be supplied into the target container via the port; and a gas introducing part configured to export or import compression air relative to the operation adjustment space to thereby control an operation of the nozzle.Type: GrantFiled: April 24, 2018Date of Patent: October 5, 2021Assignee: SINFONIA TECHNOLOGY CO., LTD.Inventors: Yasushi Taniyama, Toshimitsu Morihana
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Patent number: 10947063Abstract: A load port including: a base as part of a wall partitioning a transportation space from an external space; an opening provided to the base; a door configured to open and close the opening and securing a lid to, and releasing a lid from, a container containing contents; and a first seal member for sealing the space between the base and the container. At least some of the container-side end surface of the door is located nearer to the transportation space than the container-side end part of the first seal member. The load port can keep a surrounding space clean when a FOUP is connected to a casing.Type: GrantFiled: November 8, 2019Date of Patent: March 16, 2021Assignee: SINFONIA TECHNOLOGY CO., LTD.Inventors: Atsushi Suzuki, Yasushi Taniyama
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Patent number: 10930537Abstract: Provided are a door opening/closing system which prevents the entry of atmospheric air into a front-opening unified pod (FOUP) and an equipment front end module (EFEM) when the FOUP and the EFEM are placed in communication with each other, and a load port equipped with the door opening/closing system.Type: GrantFiled: January 28, 2020Date of Patent: February 23, 2021Assignee: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Yasushi Taniyama, Munekazu Komiya, Takashi Shigeta
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Patent number: 10923372Abstract: There is provided a gas injection device configured to prevent entry of atmospheric air when charging gas into a FOUP. In order to realize such a gas injection device, the gas injection device is structured so as to include: a gas supply port 72 through which inert gas is supplied; a nozzle main body 71 including a gas passage 77 communicating with the gas supply port 72; an opening/closing mechanism 92 configured to close the gas supply port 72; and an opener 96 configured to cause the opening/closing mechanism 92 to open the gas supply port 72 closed by the opening/closing mechanism 92.Type: GrantFiled: August 19, 2016Date of Patent: February 16, 2021Assignee: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Yasushi Taniyama, Munekazu Komiya, Takashi Shigeta
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Publication number: 20200312686Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).Type: ApplicationFiled: April 10, 2020Publication date: October 1, 2020Applicant: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
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Patent number: 10672632Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).Type: GrantFiled: February 5, 2016Date of Patent: June 2, 2020Assignee: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
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Publication number: 20200168495Abstract: Provided are a door opening/closing system which prevents the entry of atmospheric air into a front-opening unified pod (FOUP) and an equipment front end module (EFEM) when the FOUP and the EFEM are placed in communication with each other, and a load port equipped with the door opening/closing system.Type: ApplicationFiled: January 28, 2020Publication date: May 28, 2020Applicant: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro KAWAI, Yasushi TANIYAMA, Munekazu KOMIYA, Tkashi SHIGETA