Patents by Inventor Yasushi Umeda

Yasushi Umeda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5100763
    Abstract: Disclosed is a water-developable photosensitive resin composition capable of hot melt molding, which comprises:(i) a water soluble or water dispersible polyvinyl alcohol prepared by saponifying a copolymer of a vinyl ester and another copolymerizable monomer, which has a saponification degree of the vinyl ester unit of 50 to 70 mol % and a hot melt flow starting temperature of 60.degree. to 130.degree. C.,(ii) a polymerizable monomer, and(iii) a photopolymerization initiator.
    Type: Grant
    Filed: March 12, 1990
    Date of Patent: March 31, 1992
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Koichi Kimoto, Yasushi Umeda, Chitoshi Kawaguchi, Toshitaka Kawanami
  • Patent number: 5039592
    Abstract: A photosensitive resin base printing material in the form of laminate comprising, in successive order, a support, a photosensitive resin layer, a slip layer of a high molecular substance which is soluble or swellable in a developer, an optional releasing layer and a sheet or film form of protective layer, which is characterized in that a dyestuff is included in an amount of 0.01 to 20% by weight of the high molecular weight substances in said slip layer.The present printing material is specifically excellent in resolution and far improved as compared with heretofore proposed printing materials in respect to both handling and visual inspection properties.
    Type: Grant
    Filed: May 17, 1990
    Date of Patent: August 13, 1991
    Assignee: Nippon Paint Co., Ltd.
    Inventor: Yasushi Umeda
  • Patent number: 5006447
    Abstract: The present invention provides a photosensitive resin plate for flexographic printing, comprising;(A) a substrate comprising a polyester film and a polyurethane or polyolefin foam layer on one side of said polyester film;(B) an adhesive layer on the foam layer of said substrate;(C) a polyurethane layer on said adhesive layer;(D) a photosensitive layer which is provided on the polyurethane layer and is chemically bonded with the polyurethane layer, comprising a polymer having rubber elasticity, addition polymerizable unsaturated monomer and a polymerization initiator;(E) a slip layer on the photosensitive layer which is dissolved with a developing solution; and(F) a protective layer on the slip layer.
    Type: Grant
    Filed: April 13, 1989
    Date of Patent: April 9, 1991
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Yasushi Umeda, Hisao Satoh
  • Patent number: 4935333
    Abstract: Disclosed is a water-developable photosensitive resin composition capable of hot melt molding, which comprises:(i) a water soluble or water dispersible polyvinyl alcohol prepared by saponifying a copolymer which is obtained from copolymerizing 0 to 20 mol % of a monomer not having an ionic group (hereinafter referred to as "nonionic monomer"), 0 to 10 mol % of an ionic group-containing monomer (hereinafter referred to as "ionic monomer") and the remaining amount of a vinyl ester in the presence of a thiolic acid wherein the total content of the ionic monomer and nonionic monomer is 0.1 to 20 mol %; said polyvinyl alcohol having a terminal mercapto group, a saponification degree of the vinyl ester unit of 50 to 70 mol %, and a hot melt flow starting temperature of 60.degree. to 130.degree. C.(ii) a polymerizable monomer, and(iii) a photopolymerization initiator.
    Type: Grant
    Filed: January 15, 1988
    Date of Patent: June 19, 1990
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Koichi Kimoto, Yasushi Umeda, Chitoshi Kawaguchi, Toshitaka Kawanami
  • Patent number: 4737666
    Abstract: A semiconductor integrated circuit device includes a switch for switching an external clock; a signal generator for generating a power down signal for controlling said switch; said signal generator being responsive to an external signal input designating the status of the output of the microprocessor provided at the periphery of the device and an internal control signal of the device for producing said power down signal in a special combination logic state of said external signal input and said internal control signal; the device being set in a power dissipation reduction mode when said power down signal is generated.
    Type: Grant
    Filed: May 12, 1986
    Date of Patent: April 12, 1988
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Yasushi Umeda, Toshio Ichiyama
  • Patent number: 4226930
    Abstract: A method of production of photopolymer printing plates particularly characterized in the transfer procedure. In the method, an electrostatic latent image of original material is produced on a photoconductive medium, the image is developed by application of toner particles, and the toner image is transferred onto photopolymer printing plates having photosensitive resin layer or containing polymerizable monomer through linear pressure of line contact. The toner image thus transferred is then exposed to light without being fixed, plate portions defined by the toner image being subsequently removed together with the toner particles.
    Type: Grant
    Filed: November 8, 1978
    Date of Patent: October 7, 1980
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Yasuyuki Takimoto, Kunsei Tanabe, Shin Saito, Masakatsu Nishimura, Yasushi Umeda