Patents by Inventor Yasutaka Natsuka

Yasutaka Natsuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist developer and method for fabricating substrate by using the developer thereof
    Patent number: 8808976
    Abstract: A photoresist developer including a basic aqueous solution containing 0.5˜10 mass % of a particular nonionic surfactant and 0.01-10 mass % of particular ammonium compound, the photoresist developer makes it possible to form a favorable resist pattern with out causing scum even when developing thick photoresists.
    Type: Grant
    Filed: June 13, 2006
    Date of Patent: August 19, 2014
    Assignee: Tokuyama Corporation
    Inventors: Shunkichi Omae, Seiji Tono, Toshiaki Otani, Yasutaka Natsuka
  • PHOTORESIST DEVELOPER AND METHOD FOR FABRICATING SUBSTRATE BY USING THE DEVELOPER THEREOF
    Publication number: 20090130606
    Abstract: A photoresist developer including a basic aqueous solution containing 0.5˜10 mass % of a particular nonionic surfactant and 0.01-10 mass % of particular ammonium compound, the photoresist developer makes it possible to form a favorable resist pattern with out causing scum even when developing thick photoresists.
    Type: Application
    Filed: June 13, 2006
    Publication date: May 21, 2009
    Inventors: Shunkichi Omae, Seiji Tono, Toshiaki Otani, Yasutaka Natsuka