Abstract: An exhaust gas purification device that allows suppressing an increase in pressure loss is provided. The exhaust gas purification device of the present disclosure includes a honeycomb substrate and an inflow cell side catalyst layer. The substrate includes a porous partition wall which defines inflow cells and outflow cells extending from an inflow side end to an outflow side end. The inflow cell side catalyst layer is disposed on a surface on the inflow cell side in an inflow cell side catalyst region from an inflow side end to a position close to an outflow side end of the partition wall. The permeability of a portion including an outflow side region from the position to the outflow side end of the partition wall is higher than a gas permeability of a portion including the inflow cell side catalyst region of the partition wall and the inflow cell side catalyst layer.

Abstract: There is provided a structure including: a substrate including a first and a second ends, and a porous partition wall defining a first and a second cells extending between the first and the second ends; a first catalyst; and a second catalyst. In a first area, the first catalyst is disposed on a first surface of the partition wall, and the partition wall with the first catalyst disposed on the partition wall is impermeable to gas. In a second area, the first catalyst is not provided, the second catalyst is disposed in a region including at least a part inside the partition wall, the part facing the first cell, and the partition wall with the second catalyst disposed in the partition wall is permeable to gas. In a third area, any of the first catalyst or the second catalyst is not provided, and the partition wall is permeable to gas.

Abstract: An exhaust gas purifying catalyst includes: a wall-flow structure substrate including an inlet cell, an outlet cell, and a porous partition; a first catalyst layer formed inside the partition such that a thickness of the first catalyst layer is between 40% and 60%, inclusive, of an overall thickness Tw of the partition; and a second catalyst layer formed inside the partition such that the second catalyst layer extends across an entire region of the partition in a thickness direction thereof.

Abstract: An exhaust gas purification including: a base of wall flow structure having inlet side cells wherein an end on the exhaust gas inflow side is open and outlet side cells wherein an end on the exhaust gas outflow side is open, and a porous partition wall that partitions the side cells; and first and second catalyst layers disposed in the interior of the porous partition wall so as to be in contact with the side cells, wherein either of the catalyst layers contains an oxidation catalyst but does not contain a reduction catalyst, and the other contains the reduction catalyst but does not contain the oxidation catalyst; and a ratio of the lengths of the catalyst layers differs between a surface of the porous partition wall on the side in contact with the inlet side cells and a surface on the side in contact with the outlet side cells.

Abstract: An exhaust gas cleaning catalyst that has: a substrate having a wall flow structure, wherein an entry side cell, in which the end part on an exhaust gas inflow side is open, and an exit side cell, in which the end part on the exhaust gas outflow side is open, are divided by a porous dividing wall; and a first catalyst layer that includes a metal catalyst and is disposed within the dividing wall so as to be in contact with the exit side cell and not in contact with the entry side cell, and no catalyst layer is provided in the region in contact with the entry side cell.

Abstract: An exhaust gas control apparatus includes: a honeycomb substrate including an inflow cell and an outflow cell adjacent to each other with a partition wall sandwiched between the inflow cell and the outflow cell; a first sealing part provided at an outflow side end of the inflow cell, and a second sealing part provided at an inflow side end of the outflow cell; and a catalyst layer provided on the partition wall, and at least one of the first sealing part and the second sealing part is an OSC material-containing sealing part containing an OSC material and a sealant, and a concentration of the OSC material in the OSC material-containing sealing part is uniform in an extending direction.

Abstract: The exemplary embodiments relate to an exhaust gas purification catalyst, in which exhaust gas purification performance is secured and an increase in pressure loss is suppressed, which is an exhaust gas purification catalyst, in which a porous filter wall of a substrate having a wall-flow structure is coated with a catalyst material containing an OSC material having oxygen storage capacity and a catalyst metal, wherein the density of percolation paths having percolation path diameters of 4 ?m or more per unit area inside of the filter wall coated with the catalyst material is 100 paths/mm2 to 1000 paths/mm2.

Abstract: An exhaust gas purification device that allows suppressing an increase in pressure loss is provided. The exhaust gas purification device of the present disclosure includes a honeycomb substrate and an inflow cell side catalyst layer. The substrate includes a porous partition wall which defines inflow cells and outflow cells extending from an inflow side end to an outflow side end. The inflow cell side catalyst layer is disposed on a surface on the inflow cell side in an inflow cell side catalyst region from an inflow side end to a position close to an outflow side end of the partition wall. The permeability of a portion including an outflow side region from the position to the outflow side end of the partition wall is higher than a gas permeability of a portion including the inflow cell side catalyst region of the partition wall and the inflow cell side catalyst layer.

Abstract: There is provided a structure including: a substrate including a first and a second ends, and a porous partition wall defining a first and a second cells extending between the first and the second ends; a first catalyst; and a second catalyst. In a first area, the first catalyst is disposed on a first surface of the partition wall, and the partition wall with the first catalyst disposed on the partition wall is impermeable to gas. In a second area, the first catalyst is not provided, the second catalyst is disposed in a region including at least a part inside the partition wall, the part facing the first cell, and the partition wall with the second catalyst disposed in the partition wall is permeable to gas. In a third area, any of the first catalyst or the second catalyst is not provided, and the partition wall is permeable to gas.

Abstract: There is provided a filter catalyst that has a wall-flow structure, and the filter catalyst has an excellent purification performance. The embodiment is a filter catalyst including a wall-flow type substrate that includes an inlet-side cell, an outlet-side cell, and a partition wall. The inlet-side cell has an open end portion on an exhaust gas flow-in side and a closed end portion on an exhaust gas flow-out side. The outlet-side cell is adjacent to the inlet-side cell and has an open end portion on the exhaust gas flow-out side and a closed end portion on the exhaust gas flow-in side. The partition wall has a porous structure and interposes between the inlet-side cell and the outlet-side cell. The filter catalyst includes an oxygen occlusion portion and a catalyst portion dispersed and disposed in the porous structure. The oxygen occlusion portion is disposed on a wall surface of the porous structure.

Abstract: Provided is an exhaust gas purification catalyst that allows enhancing purification performance on exhaust gas. The exhaust gas purification catalyst according to the present invention has a substrate 10 of wall flow structure having a porous partition wall 16 which partitions inlet cells 12 and outlet cells 14, a first catalyst layer 20 formed on the surface of the partition wall 16, on the side facing the inlet cells 12, and a second catalyst layer 30 formed in the interior of the partition wall 16, at least in a region facing the outlet cells 14.

Abstract: An exhaust gas purifying catalyst includes: a wall-flow structure substrate including an inlet cell, an outlet cell, and a porous partition; a first catalyst layer formed inside the partition such that a thickness of the first catalyst layer is between 40% and 60%, inclusive, of an overall thickness Tw of the partition; and a second catalyst layer formed inside the partition such that the second catalyst layer extends across an entire region of the partition in a thickness direction thereof.

Abstract: An exhaust gas purification including: a base of wall flow structure having inlet side cells wherein an end on the exhaust gas inflow side is open and outlet side cells wherein an end on the exhaust gas outflow side is open, and a porous partition wall that partitions the side cells; and first and second catalyst layers disposed in the interior of the porous partition wall so as to be in contact with the side cells, wherein either of the catalyst layers contains an oxidation catalyst but does not contain a reduction catalyst, and the other contains the reduction catalyst but does not contain the oxidation catalyst; and a ratio of the lengths of the catalyst layers differs between a surface of the porous partition wall on the side in contact with the inlet side cells and a surface on the side in contact with the outlet side cells.

Abstract: An exhaust gas purification device includes: a substrate of wall-flow structure having an inlet cell, an outlet cell and a porous partition wall; an upstream catalyst layer provided inside the partition wall and disposed in an upstream portion, including an exhaust gas inflow end section, of the substrate; and a downstream catalyst layer provided inside the partition wall and disposed in a downstream portion, including an exhaust gas outflow end section, of the substrate. The downstream catalyst layer contains a carrier, and Rh supported on the carrier. The upstream catalyst layer contains a carrier, and Pd and/or Pt supported on the carrier.

Abstract: An exhaust gas cleaning catalyst that has: a substrate having a wall flow structure, wherein an entry side cell, in which the end part on an exhaust gas inflow side is open, and an exit side cell, in which the end part on the exhaust gas outflow side is open, are divided by a porous dividing wall; and a first catalyst layer that includes a metal catalyst and is disposed within the dividing wall so as to be in contact with the exit side cell and not in contact with the entry side cell, and no catalyst layer is provided in the region in contact with the entry side cell.

Abstract: The exemplary embodiments relate to an exhaust gas purification catalyst, in which exhaust gas purification performance is secured and an increase in pressure loss is suppressed, which is an exhaust gas purification catalyst, in which a porous filter wall of a substrate having a wall-flow structure is coated with a catalyst material containing an OSC material having oxygen storage capacity and a catalyst metal, wherein the density of percolation paths having percolation path diameters of 4 ?m or more per unit area inside of the filter wall coated with the catalyst material is 100 paths/mm2 to 1000 paths/mm2.

Abstract: An exhaust gas purification device includes: a substrate of wall-flow structure having an inlet cell, an outlet cell and a porous partition wall; an upstream catalyst layer provided inside the partition wall and disposed in an upstream portion, including an exhaust gas inflow end section, of the substrate; and a downstream catalyst layer provided inside the partition wall and disposed in a downstream portion, including an exhaust gas outflow end section, of the substrate. The downstream catalyst layer contains a carrier, and Rh supported on the carrier. The upstream catalyst layer contains a carrier, and Pd and/or Pt supported on the carrier.

Abstract: Provided is an exhaust gas purification catalyst that combines reduction of pressure loss and enhancement of purification performance. This invention provides an exhaust gas purification catalyst comprising a wall-flow-type substrate and first and second catalytic layers. The first catalytic layer is provided to the interior of a partition wall, in contact with an entrance cell, from an exhaust inlet-side end in the running direction, having a length L1 less than Lw. The second catalytic layer is provided to the interior of a partition wall, in contact with an exit cell, from an exhaust outlet-side end in the running direction, having a length L2 less than Lw. An internal portion of partition wall in contact with entrance cell has a substrate-exposing segment near the exhaust outlet-side end.

Abstract: The exhaust gas purification device includes: a substrate of wall flow structure having inlet cells, outlet cells and a porous partition wall; and a catalyst layer provided in at least part of internal pores of the partition wall and held on the surface of the internal pores. The relationship between an average filling factor A of the catalyst layer held in pores having a pore diameter of 5 ?m to less than 10 ?m, an average filling factor B of the catalyst layer held in pores having a pore diameter of 10 ?m to less than 20 ?m and an average filling factor C of the catalyst layer held in pores having a pore diameter of 20 ?m to less than 30 ?m, among the internal pores of the partition wall 16 in which the catalyst layer is held, satisfies the following expression: A<B<C.

Abstract: A wall-flow-type exhaust gas purification catalyst with an oxygen storage material that has an increased OSC and exhibits its OSC without a compromise provides an exhaust gas purification catalyst having a wall-flow-type substrate, a first catalytic layer and a second catalytic layer. The first catalytic layer is provided to an internal portion of a partition wall in contact with an entrance cell. The second catalytic layer is provided to an internal portion of a partition wall in contact with an exit cell. Each of the first and second catalytic layers has an oxygen storage material. The ratio (D1/D2) of the coating density D1 of the first catalytic layer to the coating density D2 of the second catalytic layer is 1.1 to 1.8.