Patents by Inventor Yasutaka Otsuka

Yasutaka Otsuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11936250
    Abstract: A movable magnet is configured by alternately magnetizing an even number of magnetic poles at an outer periphery of a shaft part; a number of core magnetic poles as magnetic poles of a core body and a number of magnetic poles of the movable magnet are equal to each other; the core magnetic poles are disposed to face the movable magnet with an air gap therebetween on an outer peripheral side of the movable magnet in a direction orthogonal to the shaft part; a drive unit is provided with a magnet position holding part provided to face the movable magnet and magnetically attracts the movable magnet to a reference position; the core body is formed to surround an even number of the core magnetic poles; and a coil body is disposed at the core body adjacent to each of the even number of the core magnetic poles.
    Type: Grant
    Filed: August 5, 2021
    Date of Patent: March 19, 2024
    Assignee: MITSUMI ELECTRIC CO., LTD.
    Inventors: Yasutaka Kitamura, Yuki Takahashi, Masaharu Kagami, Yuki Otsuka
  • Patent number: 11017988
    Abstract: An charged particle beam apparatus includes: a gas introduction chamber to which raw gas is introduced; a plasma generation chamber connected to the gas introduction chamber; a coil wound around an outer circumference of the plasma generation chamber and receiving a high-frequency power; an extraction electrode applying an extraction voltage to plasma discharged from a plasma aperture at an outlet of the plasma generation chamber; an ampere meter measuring a magnitude of a plasma current caused by the plasma moved out of the plasma aperture; an extraction voltage calculator calculating, based on variation in the magnitude of the plasma current measured by the ampere meter with respect to variation in the extraction voltage, an extraction voltage set value; and a controller controlling the extraction voltage based on the extraction voltage set value calculated by the extraction voltage calculator.
    Type: Grant
    Filed: September 16, 2019
    Date of Patent: May 25, 2021
    Assignee: HITACH HIGH-TECH SCIENCE CORPORATION
    Inventors: Hiroshi Oba, Yasuhiko Sugiyama, Yasutaka Otsuka
  • Publication number: 20200135437
    Abstract: An charged particle beam apparatus includes: a gas introduction chamber to which raw gas is introduced; a plasma generation chamber connected to the gas introduction chamber; a coil wound around an outer circumference of the plasma generation chamber and receiving a high-frequency power; an extraction electrode applying an extraction voltage to plasma discharged from a plasma aperture at an outlet of the plasma generation chamber; an ampere meter measuring a magnitude of a plasma current caused by the plasma moved out of the plasma aperture; an extraction voltage calculator calculating, based on variation in the magnitude of the plasma current measured by the ampere meter with respect to variation in the extraction voltage, an extraction voltage set value; and a controller controlling the extraction voltage based on the extraction voltage set value calculated by the extraction voltage calculator.
    Type: Application
    Filed: September 16, 2019
    Publication date: April 30, 2020
    Inventors: Hiroshi OBA, Yasuhiko SUGIYAMA, Yasutaka OTSUKA
  • Publication number: 20120043211
    Abstract: Provided is a capillary electrophoresis apparatus capable of avoiding electric discharge even when a conductive component is arranged near a cathode end of a capillary. The capillary electrophoresis apparatus of the present invention has a structure in which a spatial distance and a creeping distance between an electrode attached to the cathode end of the capillary and the conductive component are large even when the conductive component is arranged near the cathode end of the capillary. That is to say, the capillary electrode, which protrudes from a lower surface of the load header, penetrates through a space between the load header and an anti-evaporation film and further penetrates through a capillary hole formed on the anti-evaporation film to extend into a container. At least a portion exposed to the space between the load header and the anti-evaporation film of the capillary electrode is covered with an insulating member.
    Type: Application
    Filed: April 8, 2010
    Publication date: February 23, 2012
    Inventors: Yasutaka Otsuka, Toshiyuki Sakurai, Tomohiro Shoji, Takeshi Ohura
  • Patent number: D851151
    Type: Grant
    Filed: January 24, 2018
    Date of Patent: June 11, 2019
    Assignee: Hitachi High-Tech Science Corporation
    Inventors: Ai Masuda, Hiroyuki Noda, Hiroyuki Suzuki, Yasutaka Otsuka