Patents by Inventor Yasutaka Takemura

Yasutaka Takemura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11414780
    Abstract: The amount of gas evacuation from a reaction chamber of an apparatus for manufacturing epitaxial wafers is controlled to any one of: a first amount of gas evacuation when an epitaxial film formation process is performed in the reaction chamber; a second amount of gas evacuation smaller than the first amount of gas evacuation when a gate valve is opened to load or unload a wafer between the reaction chamber and a wafer transfer chamber; and a third amount of gas evacuation larger than the first amount of gas evacuation until a purge process for a gas in the reaction chamber is completed after the epitaxial film formation process is completed in the reaction chamber.
    Type: Grant
    Filed: November 5, 2018
    Date of Patent: August 16, 2022
    Assignee: SUMCO CORPORATION
    Inventors: Yu Minamide, Naoyuki Wada, Yasutaka Takemura
  • Publication number: 20210123159
    Abstract: The amount of gas evacuation from a reaction chamber of an apparatus for manufacturing epitaxial wafers is controlled to any one of: a first amount of gas evacuation when an epitaxial film formation process is performed in the reaction chamber; a second amount of gas evacuation smaller than the first amount of gas evacuation when a gate valve is opened to load or unload a wafer between the reaction chamber and a wafer transfer chamber; and a third amount of gas evacuation larger than the first amount of gas evacuation until a purge process for a gas in the reaction chamber is completed after the epitaxial film formation process is completed in the reaction chamber.
    Type: Application
    Filed: November 5, 2018
    Publication date: April 29, 2021
    Applicant: SUMCO CORPORATION
    Inventors: Yu MINAMIDE, Naoyuki WADA, Yasutaka TAKEMURA
  • Patent number: 9236162
    Abstract: Provided is a transparent conductive ink which contains metal nanowires and/or metal nanotubes as a conductive component and can form a coating film which has good conductivity and a high light transmittance property, and also provided is a transparent conductive pattern forming method wherein this transparent conductive ink is used for forming a transparent conductive pattern by simple production steps, to thereby suppress the production cost and environmental load. At least one of metal nanowires and metal nanotubes are dispersed in a dispersion medium containing a shape-holding material which contains an organic compound having a molecular weight in the range of 150 to 500 and which has a viscosity of 1.0×103 to 2.0×106 mPa·s at 25° C., to prepare a transparent conductive ink.
    Type: Grant
    Filed: April 26, 2013
    Date of Patent: January 12, 2016
    Assignees: OSAKA UNIVERSITY, SHOWA DENKO K.K.
    Inventors: Katsuaki Suganuma, Kuniaki Ohtsuka, Koichiro Murahashi, Yasutaka Takemura, Hiroshi Uchida
  • Publication number: 20150056382
    Abstract: Provided is a transparent conductive ink which contains metal nanowires and/or metal nanotubes as a conductive component and can form a coating film which has good conductivity and a high light transmittance property, and also provided is a transparent conductive pattern forming method wherein this transparent conductive ink is used for forming a transparent conductive pattern by simple production steps, to thereby suppress the production cost and environmental load. At least one of metal nanowires and metal nanotubes are dispersed in a dispersion medium containing a shape-holding material which contains an organic compound having a molecular weight in the range of 150 to 500 and which has a viscosity of 1.0×103 to 2.0×106 mPa·s at 25° C., to prepare a transparent conductive ink.
    Type: Application
    Filed: April 26, 2013
    Publication date: February 26, 2015
    Applicants: SHOWA DENKO K. K., OSAKA UNIVERSITY
    Inventors: Katsuaki Suganuma, Kuniaki Ohtsuka, Koichiro Murahashi, Yasutaka Takemura, Hiroshi Uchida