Abstract: In a concentration measuring mechanism, a first concentration meter that measures the concentration of a first gas inside an enclosed space is isolated by an isolator in an isolatable space isolated from the enclosed space in order to achieve high-precision measurement.

Abstract: An exposure apparatus for exposing a substrate to light from a light source via a reticle. The apparatus includes an optical system configured to introduce the light via the reticle to the substrate, a chamber configured to house at least a part of the optical system, a supply system configured to supply inert gas into the chamber at a variable supply flow rate, an exhaust system configured to exhaust gas from the chamber at a variable exhaust flow rate, and a controller configured to control the supply system so as to reduce the supply flow rate, and configured to control the exhaust system so as to reduce the exhaust flow rate prior to the reduction of the supply flow rate.

Abstract: An exposure apparatus for exposing a substrate to light from a light source via a reticle. The exposure apparatus includes an optical system configured to expose the substrate to light from the light source via the reticle, and has a first optical element, a motor configured to move the first optical element, a first housing accommodating at least the first optical element and the motor, a second housing accommodated in the first housing, accommodating at least a part of the motor, and configured to isolate the part of the motor from the first optical element, a first exhaust system configured to exhaust a first space between the first housing and the second housing, and a second exhaust system configured to exhaust a second space in the second housing.

Abstract: In a concentration measuring mechanism, a first concentration meter that measures the concentration of a first gas inside an enclosed space is isolated by an isolator in an isolatable space isolated from the enclosed space in order to achieve high-precision measurement.

Abstract: An exposure apparatus includes an optical system to direct light to project a pattern of an original onto a substrate, a chamber to house at least a part of the optical system, a supply system to supply inert gas into the chamber, a supply control system to control a supply speed of the inert gas from the supply system; an exhaust system to exhaust gas from the chamber, and an exhaust control system to increase resistance of the exhaust system in synchronization with a reduction of the supply speed by the supply control system.

Abstract: The present invention provides an exposure apparatus for transferring a pattern of an original to a substrate by use of light from a light source. The exposure apparatus includes an optical system to direct light from said light source to the substrate through the original, and to have a first element; a second element different from said first element; a first housing accommodating at least said first element and said second element; a second housing accommodated in said first housing and accommodating at least a part of said second element; and a first purge system to purge a first space between said first housing and said second housing.