Patents by Inventor Yasuto Hoshikawa

Yasuto Hoshikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8999052
    Abstract: Fine mesoporous silica particles are provided by which not only the functions of low reflectance (Low-n), low dielectric constant (Low-k) and low thermal conductivity but also improved strength of a molded article are achieved. The fine mesoporous silica particles are manufactured by a process including a surfactant composite fine silica particle preparation step and a mesoporous particle formation step. In the silica fine particle preparation step, a surfactant, water, an alkali and a hydrophobic part-containing additive including a hydrophobic part for increasing the volume of micelles are mixed with a silica source to thereby prepare surfactant composite fine silica particles. In the mesoporous particle formation step, the mixture is mixed with an acid and an organosilicon compound to thereby remove the surfactant and hydrophobic part-containing additive from the surfactant composite fine silica particles and provide the surface of each silica fine particle with an organic functional group.
    Type: Grant
    Filed: May 18, 2010
    Date of Patent: April 7, 2015
    Assignees: Panasonic Corporation, The University of Tokyo
    Inventors: Hiroki Yabe, Takeyuki Yamaki, Yasuto Hoshikawa, Tatsuya Okubo, Atsushi Shimojima
  • Publication number: 20120192762
    Abstract: Fine mesoporous silica particles are provided by which not only the functions of low reflectance (Low-n), low dielectric constant (Low-k) and low thermal conductivity but also improved strength of a molded article are achieved. The fine mesoporous silica particles are manufactured by a process including a surfactant composite fine silica particle preparation step and a mesoporous particle formation step. In the silica fine particle preparation step, a surfactant, water, an alkali and a hydrophobic part-containing additive including a hydrophobic part for increasing the volume of micelles are mixed with a silica source to thereby prepare surfactant composite fine silica particles. In the mesoporous particle formation step, the mixture is mixed with an acid and an organosilicon compound to thereby remove the surfactant and hydrophobic part-containing additive from the surfactant composite fine silica particles and provide the surface of each silica fine particle with an organic functional group.
    Type: Application
    Filed: May 18, 2010
    Publication date: August 2, 2012
    Applicants: THE UNIVERSITY OF TOKYO, Panasonic Corporation
    Inventors: Hiroki Yabe, Takeyuki Yamaki, Yasuto Hoshikawa, Tatsuya Okubo, Atsushi Shimojima