Patents by Inventor Yasutomo Kurono

Yasutomo Kurono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exposure apparatus, method of controlling the same, and manufacturing method
    Patent number: 7733498
    Abstract: An exposure apparatus comprises an optical system support supporting a projection optical system, a stage surface plate, first stage and second stages, a first interferometer configured to measure stage position in a first area, a second interferometer configured to measure stage position in a second area, a third interferometer which is interposed between the first interferometer and the second interferometer, a gap sensor configured to measure a gap between the optical system support and the stage surface plate, and a control unit configured to pass, in the swapping, the measurement result obtained by one of the first interferometer and the second interferometer to the other one of the first interferometer and the second interferometer using the measurement result obtained by the third interferometer, and to correct the passed measurement result based on the measurement result obtained by the gap sensor.
    Type: Grant
    Filed: April 8, 2008
    Date of Patent: June 8, 2010
    Assignee: Canon Kabushiki Kaisha
    Inventor: Yasutomo Kurono
  • EXPOSURE APPARATUS, METHOD OF CONTROLLING THE SAME, AND MANUFACTURING METHOD
    Publication number: 20080259347
    Abstract: An exposure apparatus comprises an optical system support supporting a projection optical system, a stage surface plate, first stage and second stages, a first interferometer configured to measure stage position in a first area, a second interferometer configured to measure stage position in a second area, a third interferometer which is interposed between the first interferometer and the second interferometer, a gap sensor configured to measure a gap between the optical system support and the stage surface plate, and a control unit configured to pass, in the swapping, the measurement result obtained by one of the first interferometer and the second interferometer to the other one of the first interferometer and the second interferometer using the measurement result obtained by the third interferometer, and to correct the passed measurement result based on the measurement result obtained by the gap sensor.
    Type: Application
    Filed: April 8, 2008
    Publication date: October 23, 2008
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Yasutomo Kurono