Patents by Inventor Yasutomo OHASHI

Yasutomo OHASHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Device, method of manufacturing the device, and method of manufacturing array type of ultrasound probe
    Patent number: 10568607
    Abstract: A ultrasound probe according to this invention is provided with: a first dry film resist having a plurality of first apertures formed in an array shape, and respectively supporting the piezoelectric elements in close contact with a rim part of each of the first apertures in a state of partly exposing the function elements; a second dry film resist laminated on the first dry film resist, and also having second apertures respectively enclosing each of the function elements, the second dry film resist being of a thickness equivalent to that of each of the function elements; and a third dry film resist laminated on the second dry film resist, and also having third apertures, and respectively sandwiching each of the piezoelectric elements with the first dry film resist in a state of partly exposing the piezoelectric elements in close contact with a rim part of each of the third apertures.
    Type: Grant
    Filed: August 15, 2017
    Date of Patent: February 25, 2020
    Assignees: ULVAC, INC., TOHOKU UNIVERSITY
    Inventors: Taichi Suzuki, Koh Fuwa, Ken Maehira, Yasutomo Ohashi, Katsuhiro Fujita, Yoichi Haga, Tadao Matsunaga
  • DEVICE, METHOD OF MANUFACTURING THE DEVICE, AND METHOD OF MANUFACTURING ARRAY TYPE OF ULTRASOUND PROBE
    Publication number: 20190290244
    Abstract: A ultrasound probe according to this invention is provided with: a first dry film resist having a plurality of first apertures formed in an array shape, and respectively supporting the piezoelectric elements in close contact with a rim part of each of the first apertures in a state of partly exposing the function elements; a second dry film resist laminated on the first dry film resist, and also having second apertures respectively enclosing each of the function elements, the second dry film resist being of a thickness equivalent to that of each of the function elements; and a third dry film resist laminated on the second dry film resist, and also having third apertures, and respectively sandwiching each of the piezoelectric elements with the first dry film resist in a state of partly exposing the piezoelectric elements in close contact with a rim part of each of the third apertures.
    Type: Application
    Filed: August 15, 2017
    Publication date: September 26, 2019
    Applicants: Ulvac, Inc., Tohoku University
    Inventors: Taichi SUZUKI, Koh FUWA, Ken MAEHIRA, Yasutomo OHASHI, Katsuhiro FUJITA, Yoichi HAGA, Tadao MATSUNAGA