Patents by Inventor Yasuyoshi Hisamatsu

Yasuyoshi Hisamatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for producing fluorine-containing block copolymer
    Patent number: 6160051
    Abstract: A fluorine-containing copolymer having a solvent resistance and a cold resistance is produced by subjecting vinylidene fluoride and at least one of other fluorine-containing monomers to copolymerization reaction in the presence of a polyfluoropolyether having iodo groups at both terminals, represented by the following formula:I(R)pCF(CF.sub.3)O[CF.sub.2 CF(CF.sub.3)O]mRf[OCF(CF.sub.3)CF.sub.2 ]nOCF(CF.sub.3)(R)pIwherein Rf: perfluoroalkylene group of C.sub.2 -C.sub.6 ; R: alkylene group or polyfluoroalkylene group of C.sub.2 -C.sub.8 ; these alkylene groups may contain an ether bond or may be an alkyleneamide-containing or phenylene diamide-containing group; m+n: 20 or more; and p: 0 or 1. The copolymerization reaction is carried out preferably in the presence of a bromine-containing or iodine-containing monomer compound.
    Type: Grant
    Filed: May 20, 1999
    Date of Patent: December 12, 2000
    Assignee: Nippon Mektron, Limited
    Inventors: Haruyoshi Tatsu, Yasuyoshi Hisamatsu