Patents by Inventor Yasuyuki Hoshino

Yasuyuki Hoshino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220309848
    Abstract: The present technology relates to a signal processing device, a signal processing method, a program, and an imaging device capable of promptly making notification of abnormality such as an accident. A signal processing device includes a recognition unit that recognizes content of a captured image imaged by an imaging unit, a text information generation unit that generates text information including data representing the recognized content of the captured image in characters, and a transmission control unit that controls transmission of the text information. The present technology may be applied to, for example, a system that makes notification of abnormality of a vehicle.
    Type: Application
    Filed: May 15, 2020
    Publication date: September 29, 2022
    Inventors: KAZUHIRO HOSHINO, YASUYUKI KATO
  • Patent number: 11370505
    Abstract: An operating device comprises a base member and an operating member. The base member includes a first end portion, a second end portion, and a grip portion. The first end portion is configured to be coupled to a handlebar. The second end portion is opposite to the first end portion. The grip portion is provided between the first end portion and the second end portion. The operating member is pivotally coupled to the base member about a pivot axis. The base member includes a first lateral surface, a second lateral surface, and a first positioning portion. The second lateral surface is provided on a reverse side of the first lateral surface in a pivot axis direction parallel to the pivot axis. The first positioning portion is provided on the first lateral surface. The first positioning portion is configured to position a rider's finger.
    Type: Grant
    Filed: August 30, 2018
    Date of Patent: June 28, 2022
    Assignee: SHIMANO INC.
    Inventors: Shun Kakehashi, Yasuyuki Komada, Yuusuke Nishikawa, Yasunobu Goto, Hayata Mizutani, Soichiro Hoshino
  • Patent number: 11312625
    Abstract: To provide a hydrogen sulfide mixture hardly corroding metals. The hydrogen sulfide mixture contains hydrogen sulfide and water. The hydrogen sulfide mixture is filled into a filling container so that at least one part of the hydrogen sulfide mixture is liquid and the moisture concentration of a gaseous phase is 0.001 mol ppm or more and less than 75 mol ppm.
    Type: Grant
    Filed: May 17, 2017
    Date of Patent: April 26, 2022
    Assignee: SHOWA DENKO K.K
    Inventors: Yosuke Tanimoto, Yasuyuki Hoshino
  • Publication number: 20200354217
    Abstract: A method for producing a hydrogen chloride mixture containing hydrogen chloride and water, the method including: a first dehydration step of cooling a hydrogen chloride mixture in which a concentration of water is 1 mol ppm or more, to condense and separate water in the hydrogen chloride mixture; a second dehydration step of bringing a hydrogen chloride mixture obtained in the first dehydration step into contact with a water adsorbent to allow a concentration of water to be less than 0.5 mol ppm; and a filling step of filling a filling container with a hydrogen chloride mixture obtained in the second dehydration step so that at least a part of the hydrogen chloride mixture is liquid, and a concentration of water in a liquid phase at a time of completion of the filling is 0.01 mol ppm or more and less than 1 mol ppm.
    Type: Application
    Filed: June 4, 2020
    Publication date: November 12, 2020
    Applicant: SHOWA DENKO K.K.
    Inventors: Yosuke TANIMOTO, Yasuyuki Hoshino
  • Publication number: 20190185323
    Abstract: To provide a hydrogen sulfide mixture hardly corroding metals. The hydrogen sulfide mixture contains hydrogen sulfide and water. The hydrogen sulfide mixture is filled into a filling container so that at least one part of the hydrogen sulfide mixture is liquid and the moisture concentration of a gaseous phase is 0.001 mol ppm or more and less than 75 mol ppm.
    Type: Application
    Filed: May 17, 2017
    Publication date: June 20, 2019
    Applicant: SHOWA DENKO K.K.
    Inventors: Yosuke TANIMOTO, Yasuyuki HOSHINO
  • Publication number: 20180354790
    Abstract: There is provided a hydrogen chloride mixture hardly corroding a metal. The hydrogen chloride mixture contains hydrogen chloride and water. The hydrogen chloride mixture is filled into a filling container so that a part of the hydrogen chloride mixture is liquid. The concentration of water in a gas phase in the hydrogen chloride mixture is 0.001 mol ppm or more and less than 4.5 mol ppm.
    Type: Application
    Filed: December 1, 2016
    Publication date: December 13, 2018
    Applicant: SHOWA DENKO K.K.
    Inventors: Yosuke TANIMOTO, Yasuyuki HOSHINO
  • Publication number: 20080085604
    Abstract: The present invention develops a process for plasma treatment using a gas having no greenhouse effect in order to realize global environmental preservation and sophistication of plasma process performance and provides a process for plasma etching with high accuracy which process can depress damage to devices. The process for plasma treatment according to the present invention comprises the steps of feeding a treatment gas containing fluorine gas (F2) into a plasma generating chamber, alternately repeating application of high frequency electric field and stop of the application thereof to generate plasma, and carrying out substrate treatment by irradiating the plasma to a substrate. Furthermore, the substrate treatment may be carried out by individually or alternately extracting negative ions or positive ions from the plasma, or selectively extracting only negative ions, neutralizing them, to generate a neutral beam and irradiating the neutral beam to the substrate.
    Type: Application
    Filed: July 6, 2005
    Publication date: April 10, 2008
    Applicants: SHOWA DENKO K.K.
    Inventors: Yasuyuki Hoshino, Seiji Samukawa
  • Patent number: 6955801
    Abstract: A step (1) of heating a fluoronickel compound to release a fluorine gas, a step (2) of allowing a fluorine gas to be occluded into a fluorinated compound, and a step (3) of heating the fluoronickel compound and reducing an inner pressure are conducted in a container, respectively, at least once, and thereafter a high-purity fluorine gas is obtained in the step (1). Also, a step (5) of heating a fluoronickel compound and reducing an inner pressure and a step (6) of allowing a fluorine gas reduced in a hydrogen fluoride content to be occluded into the fluoronickel compound are conducted in a container having a fluorinated layer formed on its surface, respectively, at least once, the step (5) is further conducted, and thereafter a fluorine gas containing impurity gases is contacted with the fluoronickel compound to fix and remove the fluorine gas, and the impurities are analyzed by gas chromatography.
    Type: Grant
    Filed: June 27, 2002
    Date of Patent: October 18, 2005
    Assignee: Showa Denka K.K.
    Inventors: Junichi Torisu, Hitoshi Atobe, Yasuyuki Hoshino
  • Publication number: 20050115674
    Abstract: Exhaust gas containing fluorine gas or halogen fluoride gas emitted from etching or cleaning steps is burned in a combustion chamber having a fluoride passivation film formed on its surface. It is possible to treat exhaust gas emitted from semiconductor fabrication processes which contains fluorine gas or halogen fluoride gas in high concentrations or large volumes, while abatement treatment can be accomplished safely and efficiently with less energy usage.
    Type: Application
    Filed: February 13, 2003
    Publication date: June 2, 2005
    Inventors: Hiroyasu Taguchi, Yasuyuki Hoshino, Byoung-sup Park, Bingzhe Jin
  • Publication number: 20040028600
    Abstract: A step (1) of heating a fluoronickel compound to release a fluorine gas, a step (2) of allowing a fluorine gas to be occluded into a fluorinated compound, and a step (3) of heating the fluoronickel compound and reducing an inner pressure are conducted in a container, respectively, at least once, and thereafter a high-purity fluorine gas is obtained in the step (1). Also, a step (5) of heating a fluoronickel compound and reducing an inner pressure and a step (6) of allowing a fluorine gas reduced in a hydrogen fluoride content to be occluded into the fluoronickel compound are conducted in a container having a fluorinated layer formed on its surface, respectively, at least once, the step (5) is further conducted, and thereafter a fluorine gas containing impurity gases is contacted with the fluoronickel compound to fix and remove the fluorine gas, and the impurities are analyzed by gas chromatography.
    Type: Application
    Filed: February 27, 2003
    Publication date: February 12, 2004
    Inventors: Junichi Torisu, Hitoshi Atobe, Yasuyuki Hoshino
  • Publication number: 20040006249
    Abstract: According to the invention, a fluorination treated substance remarkably reduced in the light absorption loss of a substance to be treated, such as a fluoride thin film, a fluorination treatment apparatus capable of producing the fluorination treated substance, and a process for producing a fluorination treated substance can be provided. Disclosed is a process for producing a fluorination treated substance, comprising an enclosure step of enclosing a substance to be treated in a reactor and a fluorination reaction step of introducing a fluorine gas into the reactor to bring the substance to be treated into contact with the fluorine gas and thereby carry out fluorination reaction.
    Type: Application
    Filed: July 8, 2003
    Publication date: January 8, 2004
    Applicant: SHOWA DENKO K.K., NIKON CORPORATION
    Inventors: Yasuyuki Hoshino, Yusuke Taki
  • Patent number: 6609540
    Abstract: A supplying method and a supplying apparatus for supplying fluorine gas, in which when a fluorine-occluding substance is used for the fluorine gas-generating means, a necessary amount of fluorine gas can be stably and swiftly supplied to have a uniform concentration to &a chamber of an excimer laser device or the like even at running, to say nothing of the gas exchange time. In a fluorine gas-generating means, fluorine gas is generated at the use point by controlling a fluorine-occluding substance to a predetermined temperature, the fluorine gas is introduced into a mixing container, a diluting gas is introduced into the mixing container to mix it with the fluorine gas to prepare a fluorine mixed gas having a predetermined pressure and a predetermined fluorine gas concentration, and the fluorine mixed gas reserved in the mixing container is supplied to a use side such as chamber, using the pressure difference.
    Type: Grant
    Filed: June 26, 2000
    Date of Patent: August 26, 2003
    Assignee: Showa Denko Kabushiki Kaisha
    Inventors: Junichi Torisu, Mituyoshi Yamazaki, Yasuyuki Hoshino, Yuji Sakai, Shunzou Nakagawa
  • Patent number: 6309618
    Abstract: A treating method comprising contacting a fluorine-containing interhalogen compound first with a treating agent for the fluorine component and then with a treating agent for the halogen component, treating agents therefor, and a method for treating exhaust gas containing a fluorine-containing interhalogen compound, comprising filling a treating agent for the fluorine component into the internal cylinder of a treating apparatus having a double cylinder structure consisting of an internal cylinder and an external cylinder, filling a treating agent for the halogen component into the external cylinder, feeding exhaust gas containing a fluorine-containing interhalogen compound into the internal cylinder to travel the internal cylinder and the external cylinder in this order, and then discharging the treated gas from the external cylinder.
    Type: Grant
    Filed: October 28, 1999
    Date of Patent: October 30, 2001
    Assignee: Showa Denko K. K.
    Inventors: Manabu Ohira, Junichi Torisu, Yasuyuki Hoshino, Yuji Sakai, Andrei S. Kuznetsov