Patents by Inventor Yasuyuki Iwabuchi

Yasuyuki Iwabuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Magnetic film and perpendicular magnetic recording medium
    Patent number: 11939663
    Abstract: Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.
    Type: Grant
    Filed: March 2, 2023
    Date of Patent: March 26, 2024
    Assignee: JX Metals Corporation
    Inventors: Manami Masuda, Masayoshi Shimizu, Yasuyuki Iwabuchi
  • Sputtering target and magnetic film
    Patent number: 11894221
    Abstract: Provided is a sputtering target, comprising: from 0.001 mol % to 0.5 mol % of Bi; from 45 mol % or less of Cr; 45 mol % or less of Pt; 60 mol % or less of Ru; and a total of 1 mol % to 35 mol % of at least one metal oxide, the balance being Co and inevitable impurities.
    Type: Grant
    Filed: May 23, 2019
    Date of Patent: February 6, 2024
    Assignee: JX Metals Corporation
    Inventors: Yasuyuki Iwabuchi, Manami Masuda, Takashi Kosho
  • Sputtering Target, Manufacturing Method Therefor, And Manufacturing Method For Magnetic Recording Medium
    Publication number: 20230272521
    Abstract: A sputtering target containing silicon nitride (Si3N4) with reduced specific resistance of is provided. A sputtering target including Si3N4, SiC, MgO and TiCN, wherein a specific resistance of the sputtering target is 10 m?·cm or less.
    Type: Application
    Filed: July 28, 2021
    Publication date: August 31, 2023
    Inventor: Yasuyuki Iwabuchi
  • Magnetic Film and Perpendicular Magnetic Recording Medium
    Publication number: 20230227964
    Abstract: Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.
    Type: Application
    Filed: March 2, 2023
    Publication date: July 20, 2023
    Inventors: Manami Masuda, Masayoshi Shimizu, Yasuyuki Iwabuchi
  • Sputtering target, magnetic film, and perpendicular magnetic recording medium
    Patent number: 11618944
    Abstract: Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.
    Type: Grant
    Filed: May 23, 2019
    Date of Patent: April 4, 2023
    Assignee: JX Nippon Mining & Metals Corporation
    Inventors: Manami Masuda, Masayoshi Shimizu, Yasuyuki Iwabuchi
  • Sputtering target, granular film and perpendicular magnetic recording medium
    Patent number: 11591688
    Abstract: Provided is a sputtering target containing 0.05 at % or more of Bi, and having a total content of metal oxides of from 10 vol % to 70 vol %, the balance containing at least Ru.
    Type: Grant
    Filed: May 23, 2019
    Date of Patent: February 28, 2023
    Assignee: JX Nippon Mining & Metals Corporation
    Inventors: Masayoshi Shimizu, Manami Masuda, Yasuyuki Iwabuchi, Takashi Kosho
  • Sputtering Target
    Publication number: 20230019656
    Abstract: A sputtering target according to the present invention contains Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, and wherein the sputtering target contains Nb2O5 as a metal oxide component.
    Type: Application
    Filed: September 23, 2022
    Publication date: January 19, 2023
    Inventors: Masayoshi Shimizu, Yasuyuki Iwabuchi, Manami Masuda
  • Sputtering Target, Method for Producing Laminated Film, Laminated Film and Magnetic Recording Medium
    Publication number: 20220005505
    Abstract: A sputtering target according to the present invention contains Co and one or more metals selected from the group consisting of Cr and Ru, as metal components, wherein a molar ratio of the content of the one or more metals to the content of Co is ½ or more, and wherein the sputtering target contains Nb2O5 as a metal oxide component.
    Type: Application
    Filed: September 15, 2021
    Publication date: January 6, 2022
    Inventors: Masayoshi Shimizu, Yasuyuki Iwabuchi, Manami Masuda
  • SPUTTERING TARGET, MAGNETIC FILM, AND PERPENDICULAR MAGNETIC RECORDING MEDIUM
    Publication number: 20210310114
    Abstract: Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.
    Type: Application
    Filed: May 23, 2019
    Publication date: October 7, 2021
    Inventors: Manami Masuda, Masayoshi Shimizu, Yasuyuki Iwabuchi
  • SPUTTERING TARGET, GRANULAR FILM AND PERPENDICULAR MAGNETIC RECORDING MEDIUM
    Publication number: 20210246543
    Abstract: Provided is a sputtering target containing 0.05 at % or more of Bi, and having a total content of metal oxides of from 10 vol % to 70 vol %, the balance containing at least Ru.
    Type: Application
    Filed: May 23, 2019
    Publication date: August 12, 2021
    Inventors: Masayoshi Shimizu, Manami Masuda, Yasuyuki Iwabuchi, Takashi Kosho
  • SPUTTERING TARGET, METHOD FOR PRODUCING LAMINATED FILM, LAMINATED FILM AND MAGNETIC RECORDING MEDIUM
    Publication number: 20210172050
    Abstract: A sputtering target according to the present invention contains Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, and wherein the sputtering target contains Nb2O5 as a metal oxide component.
    Type: Application
    Filed: August 16, 2018
    Publication date: June 10, 2021
    Inventors: Masayoshi Shimizu, Yasuyuki Iwabuchi, Manami Masuda
  • Sputtering Target and Magnetic Film
    Publication number: 20200357438
    Abstract: Provided is a sputtering target, comprising: from 0.001 mol % to 0.5 mol % of Bi; from 45 mol % or less of Cr; 45 mol % or less of Pt; 60 mol % or less of Ru; and a total of 1 mol % to 35 mol % of at least one metal oxide, the balance being Co and inevitable impurities.
    Type: Application
    Filed: May 23, 2019
    Publication date: November 12, 2020
    Inventors: Yasuyuki Iwabuchi, Manami Masuda, Takashi Kosho
  • Sputtering Target, Method for Producing Laminated Film, Laminated Film and Magnetic Recording Medium
    Publication number: 20200051589
    Abstract: A sputtering target according to the present invention contains Co and one or more metals selected from the group consisting of Cr and Ru, as metal components, wherein a molar ratio of the content of the one or more metals to the content of Co is ½ or more, and wherein the sputtering target contains Nb2O5 as a metal oxide component.
    Type: Application
    Filed: August 16, 2018
    Publication date: February 13, 2020
    Inventors: Masayoshi Shimizu, Yasuyuki Iwabuchi, Manami Masuda