Patents by Inventor Yasuyuki Kometani

Yasuyuki Kometani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8512478
    Abstract: A cleaning and drying-preventing method including: positioning a nozzle in a container such that a funnel-like inner circumferential surface of the container is located around a periphery of a distal end of the nozzle; sucking a liquid in the nozzle to retract a level of the liquid to a side of a supply passage; supplying a solvent into the container to form a swirl flow of the solvent turning around the distal end of the nozzle, and cleaning the nozzle by the swirl flow; supplying a solvent into the container to form a liquid pool of the solvent; and further retracting the level of the liquid in the nozzle to the side of the supply passage. A liquid layer, an air layer, and a solvent layer are formed in the nozzle in this order from the side of the supply passage, to prevent drying of the liquid in the nozzle.
    Type: Grant
    Filed: June 20, 2012
    Date of Patent: August 20, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Yasuyuki Kometani, Takeshi Hirao, Kentaro Yamamura, Kenichi Miyamoto
  • Publication number: 20120255581
    Abstract: A cleaning and drying-preventing method including: positioning a nozzle in a container such that a funnel-like inner circumferential surface of the container is located around a periphery of a distal end of the nozzle; sucking a liquid in the nozzle to retract a level of the liquid to a side of a supply passage; supplying a solvent into the container to form a swirl flow of the solvent turning around the distal end of the nozzle, and cleaning the nozzle by the swirl flow; supplying a solvent into the container to form a liquid pool of the solvent; and further retracting the level of the liquid in the nozzle to the side of the supply passage. A liquid layer, an air layer, and a solvent layer are formed in the nozzle in this order from the side of the supply passage, to prevent drying of the liquid in the nozzle.
    Type: Application
    Filed: June 20, 2012
    Publication date: October 11, 2012
    Applicant: Tokyo Electron Limited
    Inventors: Yasuyuki KOMETANI, Takeshi Hirao, Kentaro Yamamura, Kenichi Miyamoto
  • Patent number: 8216390
    Abstract: A cleaning and drying-preventing method including: positioning a nozzle in a container such that a funnel-like inner circumferential surface of the container is located around a periphery of a distal end of the nozzle; sucking a liquid in the nozzle to retract a level of the liquid to a side of a supply passage; supplying a solvent into the container to form a swirl flow of the solvent turning around the distal end of the nozzle, and cleaning the nozzle by the swirl flow; supplying a solvent into the container to form a liquid pool of the solvent; and further retracting the level of the liquid in the nozzle to the side of the supply passage. A liquid layer, an air layer, and a solvent layer are formed in the nozzle in this order from the side of the supply passage, to prevent drying of the liquid in the nozzle.
    Type: Grant
    Filed: August 28, 2009
    Date of Patent: July 10, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Yasuyuki Kometani, Takeshi Hirao, Kentaro Yamamura, Kenichi Miyamoto
  • Publication number: 20100051059
    Abstract: A cleaning and drying-preventing method including: positioning a nozzle in a container such that a funnel-like inner circumferential surface of the container is located around a periphery of a distal end of the nozzle; sucking a liquid in the nozzle to retract a level of the liquid to a side of a supply passage; supplying a solvent into the container to form a swirl flow of the solvent turning around the distal end of the nozzle, and cleaning the nozzle by the swirl flow; supplying a solvent into the container to form a liquid pool of the solvent; and further retracting the level of the liquid in the nozzle to the side of the supply passage. A liquid layer, an air layer, and a solvent layer are formed in the nozzle in this order from the side of the supply passage, to prevent drying of the liquid in the nozzle.
    Type: Application
    Filed: August 28, 2009
    Publication date: March 4, 2010
    Applicant: Tokyo Electron Limited
    Inventors: Yasuyuki Kometani, Takeshi Hirao, Kentaro Yamamura, Kenichi Miyamoto
  • Patent number: 7485188
    Abstract: A coating process method in which a coating liquid is discharged onto the surface of a target substrate to be processed while rotating the target substrate so as to expand the coating liquid radially outward on the target substrate and, thus, to form a coated film comprises the step of detecting that the actual discharging of a coating liquid from a coating liquid discharging nozzle is started, and the step of controlling based on a signal of the detection at least one of the driving timing of a pump for allowing the coating liquid to be discharged from the coating liquid discharging nozzle, the operation timing of a valve mounted to a pipe for supplying the coating liquid into the coating liquid discharging nozzle, and the rotation starting or stopping timing of the target substrate.
    Type: Grant
    Filed: February 27, 2006
    Date of Patent: February 3, 2009
    Assignee: Tokyo Electron Limited
    Inventors: Takashi Takekuma, Yasuyuki Kometani, Yoshiteru Fukuda, Junya Minamida
  • Publication number: 20060144330
    Abstract: A coating process method in which a coating liquid is discharged onto the surface of a target substrate to be processed while rotating the target substrate so as to expand the coating liquid radially outward on the target substrate and, thus, to form a coated film comprises the step of detecting that the actual discharging of a coating liquid from a coating liquid discharging nozzle is started, and the step of controlling based on a signal of the detection at least one of the driving timing of a pump for allowing the coating liquid to be discharged from the coating liquid discharging nozzle, the operation timing of a valve mounted to a pipe for supplying the coating liquid into the coating liquid discharging nozzle, and the rotation starting or stopping timing of the target substrate.
    Type: Application
    Filed: February 27, 2006
    Publication date: July 6, 2006
    Inventors: Takashi Takekuma, Yasuyuki Kometani, Yoshiteru Fukuda, Junya Minamida
  • Publication number: 20030180444
    Abstract: A coating process method in which a coating liquid is discharged onto the surface of a target substrate to be processed while rotating the target substrate so as to expand the coating liquid radially outward on the target substrate and, thus, to form a coated film comprises the step of detecting that the actual discharging of a coating liquid from a coating liquid discharging nozzle is started, and the step of controlling based on a signal of the detection at least one of the driving timing of a pump for allowing the coating liquid to be discharged from the coating liquid discharging nozzle, the operation timing of a valve mounted to a pipe for supplying the coating liquid into the coating liquid discharging nozzle, and the rotation starting or stopping timing of the target substrate.
    Type: Application
    Filed: March 11, 2003
    Publication date: September 25, 2003
    Inventors: Takashi Takekuma, Yasuyuki Kometani, Yoshiteru Fukuda, Junya Minamida