Abstract: A semiconductor wafer evaluation method includes acquiring a reflection image as a bright-field image by receiving reflected light which is obtained when irradiating one surface side of a semiconductor wafer to be evaluated with light; acquiring a scattered image as a dark-field image by receiving scattered light which is obtained when irradiating the surface side of the semiconductor wafer with light; and obtaining a distance between a bright zone that is observed in the reflection image and a bright zone that is observed in the scattered image. The semiconductor wafer to be evaluated is a semiconductor wafer in which a chamfered surface is formed in a wafer outer peripheral edge section, and the method includes evaluating a shape of a boundary part between a main surface on the surface side irradiated with the light of the semiconductor wafer to be evaluated and a chamfered surface adjacent to the main surface.

Abstract: A process for detecting presumed IgA nephropathy by detection of Treponema bacteria and/or Campylobacter bacteria present in a sample from the tonsil of a subject who, optionally, has a positive result in a urinary protein test and/or a urinary occult blood test, or whom is diagnosed with possible IgA nephropathy. Also, a process for detecting an IgA nephropathy patient for whom tonsillectomy is effective by detecting Treponema bacteria or Campylobacter bacteria.

Abstract: Based on detection of Treponema bacteria or Campylobacter bacteria present in a sample derived from the tonsil of a subject who has a positive result on at least one of a urinary protein test and a urinary occult blood test, or of a patient diagnosed with possible IgA nephropathy, presumed IgA nephropathy can be detected with a high accuracy, in a simple and quick manner without physical burden on subjects. Also, an IgA nephropathy patient for whom tonsillectomy is effective in therapy of IgA nephropathy can be selected with a high accuracy, in a simple and quick manner without physical burden on subjects.