Patents by Inventor Yasuyuki Nakagawa

Yasuyuki Nakagawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9341566
    Abstract: To obtain a resin type identification method and a resin type identification apparatus with which an optimum infrared reflection spectrum for identifying a resin piece can be selected and accurate identification processing can be performed successively on individual resin pieces even when the resin pieces are identified using a single optical detector, at least one identifying signal power is selected by executing signal processing on the basis of signal powers corresponding to infrared reflection intensities obtained by emitting infrared light onto the resin piece, and the resin type of the resin piece is identified on the basis of an infrared reflection spectrum corresponding to the selected identifying signal power.
    Type: Grant
    Filed: January 16, 2014
    Date of Patent: May 17, 2016
    Assignees: Mitsubishi Electric Corporation, Shimadzu Corporation
    Inventors: Masaru Kinugawa, Muneaki Mukuda, Sonoko Umemura, Yasuyuki Nakagawa, Naoji Moriya, Toru Yamaguchi, Yukihisa Wada
  • Publication number: 20140203177
    Abstract: To obtain a resin type identification method and a resin type identification apparatus with which an optimum infrared reflection spectrum for identifying a resin piece can be selected and accurate identification processing can be performed successively on individual resin pieces even when the resin pieces are identified using a single optical detector, at least one identifying signal power is selected by executing signal processing on the basis of signal powers corresponding to infrared reflection intensities obtained by emitting infrared light onto the resin piece, and the resin type of the resin piece is identified on the basis of an infrared reflection spectrum corresponding to the selected identifying signal power.
    Type: Application
    Filed: January 16, 2014
    Publication date: July 24, 2014
    Applicants: Shimadzu Corporation, Mitsubishi Electric Corporation
    Inventors: Masaru Kinugawa, Muneaki Mukuda, Sonoko Umemura, Yasuyuki Nakagawa, Naoji Moriya, Toru Yamaguchi, Yukihisa Wada
  • Patent number: 8733995
    Abstract: An objective is to provide a light source device having a light emission source such as a semiconductor laser (LD), an LED and a lamp, and an optical part such as a lens and a fiber for transmitting, transferring and light-focusing, in which, by controlling the amount of sulfate ions inside the device at a low level, adhesion of ammonium sulfate to the optical part can be prevented. The light source device includes a light source for emitting light, an optical part for processing light emitted from the light source, and a housing in which the optical part is housed, or to which the optical part is mounted, and the housing is formed by machining material that includes no sulfur component, and the material is exposed on the surface thereof.
    Type: Grant
    Filed: August 17, 2010
    Date of Patent: May 27, 2014
    Assignee: Mitsubishi Electric Corporation
    Inventors: Yukio Sato, Mitoru Yabe, Toru Yoshihara, Yasuyuki Nakagawa, Hiroshi Kurokawa
  • Patent number: 8443959
    Abstract: A coin processing apparatus according to the present invention includes: a coin conveying section that conveys coins on a coin passage; an identifying section that identifies coins on the coin passage; at least one discharging section that discharges normal coins that are identified as normal by the identifying section from the coin passage; at least first and second removing sections that remove abnormal coins that are identified as abnormal by the identifying section from the coin passage; and a control section that distributes abnormal coins to either one of the first and second removing sections in order to remove the abnormal coins, in accordance with identification factors of the abnormal coins.
    Type: Grant
    Filed: December 20, 2010
    Date of Patent: May 21, 2013
    Assignee: Laurel Precision Machines Co., Ltd.
    Inventors: Nobushige Horiguchi, Shoichi Uda, Mitsumasa Tsuruda, Yasuyuki Nakagawa
  • Publication number: 20110151759
    Abstract: A coin processing apparatus according to the present invention includes: a coin conveying section that conveys coins on a coin passage; an identifying section that identifies coins on the coin passage; at least one discharging section that discharges normal coins that are identified as normal by the identifying section from the coin passage; at least first and second removing sections that remove abnormal coins that are identified as abnormal by the identifying section from the coin passage; and a control section that distributes abnormal coins to either one of the first and second removing sections in order to remove the abnormal coins, in accordance with identification factors of the abnormal coins.
    Type: Application
    Filed: December 20, 2010
    Publication date: June 23, 2011
    Inventors: Nobushige HORIGUCHI, Shoichi UDA, Mitsumasa TSURUDA, Yasuyuki NAKAGAWA
  • Publication number: 20110044069
    Abstract: An objective is to provide a light source device having a light emission source such as a semiconductor laser (LD), an LED and a lamp, and an optical part such as a lens and a fiber for transmitting, transferring and light-focusing, in which, by controlling the amount of sulfate ions inside the device at a low level, adhesion of ammonium sulfate to the optical part can be prevented. The light source device includes a light source for emitting light, an optical part for processing light emitted from the light source, and a housing in which the optical part is housed, or to which the optical part is mounted, and the housing is formed by machining material that includes no sulfur component, and the material is exposed on the surface thereof.
    Type: Application
    Filed: August 17, 2010
    Publication date: February 24, 2011
    Inventors: Yukio SATO, Mitoru Yabe, Toru Yoshihara, Yasuyuki Nakagawa, Hiroshi Kurokawa
  • Patent number: 7892866
    Abstract: The invention provides an end-face-processing jig that allows the formation of a reflectance control film on an end face of a semiconductor laser body while preventing possible degradation due to catastrophic optical damage (COD) of a semiconductor laser, and a method of manufacturing a semiconductor laser employing such an end-face-processing jig. A window part of the end-face-processing jig is made of at least one of an oxide and a nitride, and semiconductor laser bars are fixed by the end-face-processing jig so that their end faces are exposed through a window of the window part. In this condition, a reflectance control film is formed on the end faces of the semiconductor laser bars for the manufacture of a semiconductor laser. This prevents a metal from being taken in the reflectance control film, thus preventing the absorption of light caused by a metal taken in the reflectance control film.
    Type: Grant
    Filed: December 31, 2008
    Date of Patent: February 22, 2011
    Assignee: Mitsubishi Electric Corporation
    Inventor: Yasuyuki Nakagawa
  • Patent number: 7826507
    Abstract: A semiconductor light-emitting device includes a light generation unit generating light with an oscillation wavelength ?, a light outgoing facet from which light generated at the light generation unit emerges, a light reflecting facet at which light generated at the light generation unit is reflected, and a high reflection film at the light reflecting facet and made of a dielectric multilayered film of at least three layers. The high reflection film includes a first layer which is in contact with the light reflection facet, is constituted of Al2O3, and has a thickness smaller than ?/4n, wherein n is the refractive index of Al2O3, a second layer which is in contact with the first layer, and a third layer which is in contact with the second layer and has a refractive index different from the refractive index of the second layer.
    Type: Grant
    Filed: January 30, 2008
    Date of Patent: November 2, 2010
    Assignee: Mitsubishi Electric Corporation
    Inventors: Harumi Nishiguchi, Hiromasu Matsuoka, Yasuyuki Nakagawa, Yasuhiro Kunitsugu
  • Patent number: 7796664
    Abstract: A GaN laser, includes a coating film on a front end surface through which laser light is emitted. The coating film includes a first insulating film in contact with the front end surface and a second insulating film on the first insulating film. The optical film thickness of the second insulating film is an odd multiple of ?/4 with respect to the wavelength ? of laser light produced by the semiconductor laser. The adhesion of the first insulating film to GaN is stronger than the adhesion of the second insulating film to GaN. The refractive index of the second insulating film is 2 to 2.3 thick. The first insulating film is 10 nm or less. The first insulating film is an oxide film having a stoichiometric composition.
    Type: Grant
    Filed: January 2, 2009
    Date of Patent: September 14, 2010
    Assignee: Mitsubishi Electric Corporation
    Inventors: Yasuyuki Nakagawa, Harumi Nishiguchi, Kyosuke Kuramoto, Masatsugu Kusunoki, Takeo Shirahama, Yosuke Suzuki, Hiromasu Matsuoka
  • Patent number: 7698880
    Abstract: A coin wrapping machine includes a discrimination unit which detects images of the front face and rear face of coins during conveyance, and which discriminates the coins, a sorting unit which sorts the coins to one of a first side and a second side based on the discrimination results of the discrimination unit, a stacking unit which stacks the coins sorted to the first side by this sorting unit into columnar form with a prescribed number of coins, a wrapping unit which wraps stack of coins in columnar form, and a controller which controls the sorting unit based on the discrimination results so that at least one of an outside face of a coin at one end of the stack of coins and a second outside face of a coin at the other end of the stack of coins is the rear face.
    Type: Grant
    Filed: October 3, 2007
    Date of Patent: April 20, 2010
    Assignee: Laurel Precision Machines Co., Ltd.
    Inventors: Hisato Kasahara, Yasuyuki Nakagawa, Kiichiro Ikedaka
  • Patent number: 7616673
    Abstract: A semiconductor laser device includes a semiconductor laser body including a resonator and having a front end face and a rear end face facing each other, the resonator being located between the front end face and the rear end face. The front end face emits principal laser light. A reflectance control film is disposed on the front end face or the rear end face of the semiconductor laser body and is made up of either an aluminum oxide film or a five-layer film including the aluminum oxide film disposed such that it is the layer in the five-layer film farthest from the front end face or the rear end face. A silicon oxide film is disposed on the aluminum oxide film of the reflectance control film and has a thickness of 20 nm or less.
    Type: Grant
    Filed: May 24, 2006
    Date of Patent: November 10, 2009
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Hiromasu Matsuoka, Yasuyuki Nakagawa, Toshihiko Shiga
  • Publication number: 20090213891
    Abstract: A GaN semiconductor laser, includes a coating film on a front end surface through which laser light is emitted. The coating film includes a first insulating film in contact with the front end surface and a second insulating film on the first insulating film. The sum of the optical film thicknesses of the first insulating film and the second insulating film is an odd multiple of ?/4 with respect to the wavelength ? of laser light produced by the semiconductor laser. The adhesion of the first insulating film to GaN is stronger than that of the second insulating film to GaN. The refractive index of the first insulating film is 1.9 or less and the refractive index of the second insulating film is 2 to 2.3.
    Type: Application
    Filed: January 13, 2009
    Publication date: August 27, 2009
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Yasuyuki Nakagawa, Kyosuke Kuramoto
  • Patent number: 7577173
    Abstract: A semiconductor laser device comprises a GaN substrate having a refractive index of 3.5 or below, a semiconductor layer laminated on the substrate, and a pair of facets forming a resonator and in face-to-face-relation to each other in a direction perpendicular to the direction of the laminated layer. One of the facets of the resonator includes a low reflection film, of a first dielectric film, a second dielectric film, a third dielectric film, and a fourth dielectric film. When the refractive indexes of these films are taken as n1, n2, n3, and n4, n1=n3 and n2=n4. The following relationship between the first dielectric film and the third dielectric film, and between the second dielectric film and the fourth dielectric film is established, nd+n?d?=p?/4, where p is an integer, and ? is oscillation wavelength of a laser beam generated by the semiconductor laser device.
    Type: Grant
    Filed: November 13, 2007
    Date of Patent: August 18, 2009
    Assignee: Mitsubishi Electric Corporation
    Inventors: Kazushige Kawasaki, Yasuyuki Nakagawa, Hiromasu Matsuoka
  • Publication number: 20090185595
    Abstract: A GaN laser, includes a coating film on a front end surface through which laser light is emitted. The coating film includes a first insulating film in contact with the front end surface and a second insulating film on the first insulating film. The optical film thickness of the second insulating film is an odd multiple of ?/4 with respect to the wavelength ? of laser light produced by the semiconductor laser. The adhesion of the first insulating film to GaN is stronger than the adhesion of the second insulating film; to GaN. The refractive index of the second insulating film is 2 to 2.3 thick. The first insulating film is 10 nm or less. The first insulating film is an oxide film having a stoichiometric composition.
    Type: Application
    Filed: January 2, 2009
    Publication date: July 23, 2009
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Yasuyuki Nakagawa, Harumi Nishiguchi, Kyosuke Kuramoto, Masatsugu Kusunoki, Takeo Shirahama, Yosuke Suzuki, Hiromasu Matsuoka
  • Publication number: 20090181479
    Abstract: The invention provides an end-face-processing jig that allows the formation of a reflectance control film on an end face of a semiconductor laser body while preventing possible degradation due to catastrophic optical damage (COD) of a semiconductor laser, and a method of manufacturing a semiconductor laser employing such an end-face-processing jig. A window part of the end-face-processing jig is made of at least one of an oxide and a nitride, and semiconductor laser bars are fixed by the end-face-processing jig so that their end faces are exposed through a window of the window part. In this condition, a reflectance control film is formed on the end faces of the semiconductor laser bars for the manufacture of a semiconductor laser. This prevents a metal from being taken in the reflectance control film, thus preventing the absorption of light caused by a metal taken in the reflectance control film.
    Type: Application
    Filed: December 31, 2008
    Publication date: July 16, 2009
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventor: Yasuyuki Nakagawa
  • Publication number: 20090162962
    Abstract: The invention provides a high-reliability nitride semiconductor laser that reduces the stress of a nitride dielectric film formed on a resonator's end face, thus reducing possible damage to the resonator's end face, which may occur during the formation of the nitride dielectric film. A method of manufacturing a nitride semiconductor laser according to the invention uses a nitride-based III-V compound semiconductor and includes the steps of (a) forming an adherence layer of a nitride dielectric on both a light-emitting and a light-reflecting end face of a resonator in plasma containing a nitrogen gas; and (b) forming a low-reflective and a high-reflective face-coating film of a dielectric on the adherence layers.
    Type: Application
    Filed: December 1, 2008
    Publication date: June 25, 2009
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Yosuke SUZUKI, Yasuyuki NAKAGAWA, Kyosuke KURAMOTO, Takeo SHIRAHAMA
  • Publication number: 20080273556
    Abstract: A semiconductor light-emitting device includes a light generation unit generating light with an oscillation wavelength ?, a light outgoing facet from which light generated at the light generation unit emerges, a light reflecting facet at which light generated at the light generation unit is reflected, and a high reflection film at the light reflecting facet and made of a dielectric multilayered film of at least three layers. The high reflection film includes a first layer which is in contact with the light reflection facet, is constituted of Al2O3, and has a thickness smaller than ?/4n, wherein n is the refractive index of Al2O3, a second layer which is in contact with the first layer, and a third layer which is in contact with the second layer and has a refractive index different from the refractive index of the second layer.
    Type: Application
    Filed: January 30, 2008
    Publication date: November 6, 2008
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Harumi Nishiguchi, Hiromasu Matsuoka, Yasuyuki Nakagawa, Yasuhiro Kunitsugu
  • Publication number: 20080205468
    Abstract: A semiconductor laser device comprises a GaN substrate having a refractive index of 3.5 or below, a semiconductor layer laminated on the substrate, and a pair of facets forming a resonator and in face-to-face-relation to each other in a direction perpendicular to the direction of the laminated layer. One of the facets of the resonator includes a low reflection film, of a first dielectric film, a second dielectric film, a third dielectric film, and a fourth dielectric film. When the refractive indexes of these films are taken as n1, n2, n3, and n4, n1=n3 and n2=n4. The following relationship between the first dielectric film and the third dielectric film, and between the second dielectric film and the fourth dielectric film is established, nd+n?d?=p?/4, where p is an integer, and ? is oscillation wavelength of a laser beam generated by the semiconductor laser device.
    Type: Application
    Filed: November 13, 2007
    Publication date: August 28, 2008
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Kazushige Kawasaki, Yasuyuki Nakagawa, Hiromasu Matsuoka
  • Publication number: 20080083194
    Abstract: A coin wrapping machine includes a discrimination unit which detects images of the front face and rear face of coins during conveyance, and which discriminates the coins, a sorting unit which sorts the coins to one of a first side and a second side based on the discrimination results of the discrimination unit, a stacking unit which stacks the coins sorted to the first side by this sorting unit into columnar form with a prescribed number of coins, a wrapping unit which wraps stack of coins in columnar form, and a controller which controls the sorting unit based on the discrimination results so that at least one of an outside face of a coin at one end of the stack of coins and a second outside face of a coin at the other end of the stack of coins is the rear face.
    Type: Application
    Filed: October 3, 2007
    Publication date: April 10, 2008
    Applicant: LAUREL PRECISION MACHINES CO., LTD
    Inventors: Hisato Kasahara, Yasuyuki Nakagawa, Kiichiro Ikedaka
  • Publication number: 20070211776
    Abstract: In a semiconductor laser having a first facet (front facet) through which laser light is emitted and a second facet (rear facet), and a first coating film composed of a single-layer dielectric film on the first facet. The oscillating wavelength of the laser light is ? and the refractive index of the dielectric film is n. The thickness of the dielectric film is within a range between 5% and 50% of ?/4n.
    Type: Application
    Filed: March 1, 2007
    Publication date: September 13, 2007
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Yasuaki Yoshida, Yasuyuki Nakagawa