Patents by Inventor Yasuyuki Seino

Yasuyuki Seino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition for removing photoresist residue and/or polymer residue
    Patent number: 11091726
    Abstract: To provide a composition for removing photoresist residue and/or polymer residue formed in a process for producing a semiconductor circuit element, and a removal method employing same. A composition for removing photoresist residue and/or polymer residue, the composition containing saccharin and water, and the pH being no greater than 9.7.
    Type: Grant
    Filed: October 30, 2015
    Date of Patent: August 17, 2021
    Assignee: Kanto Kagaku Kabushiki Kaisha
    Inventor: Yasuyuki Seino
  • COMPOSITION FOR REMOVING PHOTORESIST RESIDUE AND/OR POLYMER RESIDUE
    Publication number: 20180051237
    Abstract: To provide a composition for removing photoresist residue and/or polymer residue formed in a process for producing a semiconductor circuit element, and a removal method employing same. A composition for removing photoresist residue and/or polymer residue, the composition containing saccharin and water, and the pH being no greater than 9.7.
    Type: Application
    Filed: October 30, 2015
    Publication date: February 22, 2018
    Applicant: Kanto Kagaku Kabushiki Kaisha
    Inventor: Yasuyuki Seino