Patents by Inventor Yasuyuki Taniguchi

Yasuyuki Taniguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080272995
    Abstract: [Summary] [Object] It is an object of the present invention to provide a portable information terminal device and a display device capable of effectively suppressing a display screen from being peeped from an oblique direction. [Means for Settlement] A first pattern area and a second pattern area are formed in a display area of a display device 5; in a wide viewing field mode, the whole of the display area is brought into a wide viewing angle state; and in a narrow viewing field mode, a first divided state in which the display area except the first pattern area is brought into a narrow viewing angle state, and a second divided state in which the display area except the second pattern area is brought into the narrow viewing angle state are dynamically switched.
    Type: Application
    Filed: March 28, 2006
    Publication date: November 6, 2008
    Applicant: Sharp Kabushiki Kaisha
    Inventors: Akio Sakaguchi, Yasuyuki Taniguchi, Keiji Inoue
  • Publication number: 20050070043
    Abstract: The present invention provides a method for manufacturing a semiconductor device equipped with a capacitor in which a dielectric film is used, wherein a complex oxide is used as a mask material when the dielectric film is etched.
    Type: Application
    Filed: September 30, 2003
    Publication date: March 31, 2005
    Inventors: Koji Yamakawa, Katsuaki Natori, Soichi Yamazaki, Osamu Arisumi, Hiroshi Itokawa, Hiroyuki Kanaya, Kazuhiro Tomioka, Keisuke Nakazawa, Yasuyuki Taniguchi, Uli Egger
  • Patent number: 6762065
    Abstract: A lower electrode is formed on an insulating film on a semiconductor substrate. A pair of ferroelectric films are formed on the lower electrode separately from each other. An upper electrode is formed on each of the pair of ferroelectric films. A portion of the lower electrode on which the ferroelectric film is formed is thicker than a portion thereof on which the ferroelectric film is not formed. Such a structure is obtained by sequentially depositing the lower electrode, the ferroelectric film, and the upper electrode on the insulating film, forming a mask on the upper-electrode, using this mask to etch the upper-electrode and the ferroelectric film to thereby pattern a pair of upper electrodes and a pair of ferroelectric electrodes, forming such a mask that continuously covers the pair of upper electrodes and the pair of ferroelectric films, and then etching the lower-electrode material film.
    Type: Grant
    Filed: May 30, 2003
    Date of Patent: July 13, 2004
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hiroyuki Kanaya, Yasuyuki Taniguchi, Tohru Ozaki, Yoshinori Kumura
  • Publication number: 20030205738
    Abstract: A lower electrode is formed on an insulating film on a semiconductor substrate. A pair of ferroelectric films are formed on the lower electrode separately from each other. An upper electrode is formed on each of the pair of ferroelectric films. A portion of the lower electrode on which the ferroelectric film is formed is thicker than a portion thereof on which the ferroelectric film is not formed. Such a structure is obtained by sequentially depositing the lower electrode, the ferroelectric film, and the upper electrode on the insulating film, forming a mask on the upper-electrode, using this mask to etch the upper-electrode and the ferroelectric film to thereby pattern a pair of upper electrodes and a pair of ferroelectric electrodes, forming such a mask that continuously covers the pair of upper electrodes and the pair of ferroelectric films, and then etching the lower-electrode material film.
    Type: Application
    Filed: May 30, 2003
    Publication date: November 6, 2003
    Inventors: Hiroyuki Kanaya, Yasuyuki Taniguchi, Tohru Ozaki, Yoshinori Kumura
  • Patent number: 6603161
    Abstract: There is provided a semiconductor device having a ferroelectric capacitor formed on a semiconductor substrate covered with an insulator film, wherein the ferroelectric capacitor comprises: a bottom electrode formed on the insulator film; a ferroelectric film formed on the bottom electrode; and a top electrode formed on the ferroelectric film. The ferroelectric film has a stacked structure of either of two-layer-ferroelectric film or three-layer-ferroelectric film. The upper ferroelectric film is metallized and prevents hydrogen from diffusing in lower ferroelectric layer. Crystal grains of the stacked ferroelectric films are preferably different.
    Type: Grant
    Filed: March 9, 2001
    Date of Patent: August 5, 2003
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hiroyuki Kanaya, Yasuyuki Taniguchi, Tohru Ozaki, Yoshinori Kumura
  • Publication number: 20010022372
    Abstract: There is provided a semiconductor device having a ferroelectric capacitor formed on a semiconductor substrate covered with an insulator film, wherein the ferroelectric capacitor comprises: a bottom electrode formed on the insulator film; a ferroelectric film formed on the bottom electrode; and a top electrode formed on the ferroelectric film. The ferroelectric film has a stacked structure of either of two-layer-ferroelectric film or three-layer-ferroelectric film. The upper ferroelectric film is metallized and prevents hydrogen from diffusing in lower ferroelectric layer. Crystal grains of the stacked ferroelectric films are preferably different.
    Type: Application
    Filed: March 9, 2001
    Publication date: September 20, 2001
    Inventors: Hiroyuki Kanaya, Yasuyuki Taniguchi, Tohru Ozaki, Yoshinori Kumura
  • Patent number: 5914206
    Abstract: A color filter having a resin black matrix on a transparent substrate, wherein the resin black matrix has a 20.degree. specular glossiness of from 100 to 200.
    Type: Grant
    Filed: June 30, 1997
    Date of Patent: June 22, 1999
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Ryuichiro Takasaki, Shingo Ikeda, Fumiyuki Matsuo, Shin Kawana, Yasuyuki Taniguchi
  • Patent number: 5756402
    Abstract: A method for etching a silicon nitride film, includes the steps of supplying a fluorine radical, a compound of fluorine and hydrogen, and an oxygen radical close to a substrate having the silicon nitride film, and selectively etching the silicon nitride film from the substrate with the fluorine radical, the compound of fluorine and hydrogen, and the oxygen radical.
    Type: Grant
    Filed: April 24, 1995
    Date of Patent: May 26, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Sadayuki Jimbo, Tokuhisa Ohiwa, Haruki Mori, Akira Kobayashi, Tadashi Shinmura, Yasuyuki Taniguchi
  • Patent number: 5719246
    Abstract: According to the present invention, there is provided an acrylic copolymer having a number average molecular weight of 1000-500,000, which comprises 1-90 % by weight of a structural unit represented by the following general formula ##STR1## (wherein R represents a hydrogen atom or a methyl group) and 99-10 % by weight of a structural unit-derived from an ethylenic unsaturated monomer, an acrylic copolymer composition and a paint containing the same.The coat obtained by applying the acrylic copolymer has excellent abrasion resistance, chemical resistance, flexibility, strength and the like.
    Type: Grant
    Filed: December 20, 1996
    Date of Patent: February 17, 1998
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Yasuyuki Taniguchi, Yuji Soejima
  • Patent number: 4923730
    Abstract: An anti-fouling surface structure having a multiplicity of ribbons made of plastics thin film and planted on a surface and a method of planting ribbons on a substrate. The ribbons fixed to the surface flutter in sea-water so as to prevent marine growth on the surface. The anti-fouling surface structure may be realized by directly planting ribbons on the surface of a structure to be protected or covering the surface of the structure by a covering material which has a multiplicity of ribbons planted on a substrate sheet or string. The method of planting ribbons comprises the steps of slitting a wide film into a multiplicity of parallel ribbons, flexing and folding the multiplicity of ribbons simultaneously in the direction perpendicular to the slitting direction thereby forming crests ribbons on opposite sides, bonding the ribbons to a substrate at their crests on one side, and cutting the crests opposite to the bonded crests.
    Type: Grant
    Filed: August 2, 1988
    Date of Patent: May 8, 1990
    Assignee: Dai-Ichi High Frequency Co. Ltd.
    Inventors: Yasuyuki Taniguchi, Yutaka Ohwada, Mitsunori Araki
  • Patent number: 4614461
    Abstract: The tendons of a tension leg platform (TLP) used for producing petroleum offshore at a depth of 400-1000 m are protected against fatigue corrosion which mainly determines the life of the tendons.The straight steel pipes (1) have an insulative, corrosion-protection coating (8) having good damage resistance. The screw couplings (2) have a sprayed aluminum layer (9) having the ends contiguous to the ends of the insulative, corrosion-protection, and a galvanic current anode (5) is electrically connected to the screw coupling (2).
    Type: Grant
    Filed: September 5, 1985
    Date of Patent: September 30, 1986
    Assignee: Nippon Steel Corporation
    Inventors: Yasuyuki Taniguchi, Kotaro Yoshida, Yasuhira Takeshi, Teruo Michishita, Michio Kawai, Makoto Kawakami