Patents by Inventor Yateng WANG

Yateng WANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mark recognition devices, mark recognition methods and pseudo pressure alignment devices
    Patent number: 11439050
    Abstract: A mark recognition device is applied to a substrate including a marked region. The mark recognition device includes; an image collecting mechanism and a first light source. The first light source emits a light beam, the light beam includes a first light beam and a second light beam. The first light beam is irradiated to the marked region of the substrate and blocked by a mark of the marked region to generate a marked orthographic projection on the image collecting mechanism. The second light beam is transmitted to the image collecting mechanism to form transmitted light. The image collecting mechanism recognizes the mark according to the marked orthographic projection of the mark and the second light beam. Recognition accuracy of the mark is effectively improved in embodiments of the present application.
    Type: Grant
    Filed: December 18, 2019
    Date of Patent: September 6, 2022
    Assignee: KunShan Go-Visionox Opto-Electronics Co., Ltd.
    Inventors: Yateng Wang, Peilin Xiong, Dong Han
  • MARK RECOGNITION DEVICES, MARK RECOGNITION METHODS AND PSEUDO PRESSURE ALIGNMENT DEVICES
    Publication number: 20200128707
    Abstract: A mark recognition device is applied to a substrate including a marked region. The mark recognition device includes; an image collecting mechanism and a first light source. The first light source emits a light beam, the light beam includes a first light beam and a second light beam. The first light beam is irradiated to the marked region of the substrate and blocked by a mark of the marked region to generate a marked orthographic projection on the image collecting mechanism. The second light beam is transmitted to the image collecting mechanism to form transmitted light. The image collecting mechanism recognizes the mark according to the marked orthographic projection of the mark and the second light beam. Recognition accuracy of the mark is effectively improved in embodiments of the present application.
    Type: Application
    Filed: December 18, 2019
    Publication date: April 23, 2020
    Applicant: KunShan Go-Visionox Opto-Electronics Co., Ltd.
    Inventors: Yateng WANG, Peilin XIONG, Dong HAN