Patents by Inventor Yautzong Hsu

Yautzong Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200240947
    Abstract: A DNA sequencing device and methods of making. The device includes a pair of electrodes having a spacing of no greater than about 2 nm, the electrodes being exposed within a nanopore to measure a DNA strand passing through the nanopore. The device can be made by depositing a conductive layer over a sacrificial channel and then removing the sacrificial channel to form the electrode gap.
    Type: Application
    Filed: April 10, 2020
    Publication date: July 30, 2020
    Inventors: ShuaiGang XIAO, David S. KUO, Xiaomin YANG, Kim Yang LEE, Yautzong HSU, Michael R. FELDBAUM
  • Publication number: 20180259475
    Abstract: A DNA sequencing device, and related method, which include a nanopore having a maximum width dimension of no greater than about 50 nm, and a pair of electrodes having a spacing of no greater than about 2 nm, the electrodes being exposed within the nanopore to measure a DNA strand passing through the nanopore.
    Type: Application
    Filed: February 1, 2018
    Publication date: September 13, 2018
    Applicant: SEAGATE TECHNOLOGY LLC
    Inventors: ShuaiGang XIAO, David S. KUO, Xiaomin YANG, Kim Yang LEE, Yautzong HSU, Michael R. FELDBAUM
  • Patent number: 9964855
    Abstract: A method is disclosed that includes forming at least one substrate alignment mark and at least one lithography alignment mark in a substrate; forming a seed layer on the substrate; and forming a guide pattern and at least one guide pattern alignment mark in the seed layer, where the at least one guide pattern alignment mark is formed over the at least one substrate alignment mark. The method further includes determining an alignment error of the at least one guide pattern alignment mark relative to the at least one substrate alignment mark; and patterning features on at least one region of the substrate, where the features are positioned on the substrate based on the at least one lithography alignment mark and the alignment error.
    Type: Grant
    Filed: October 10, 2016
    Date of Patent: May 8, 2018
    Assignee: Seagate Technology LLC
    Inventors: HongYing Wang, Kim Y. Lee, Yautzong Hsu, Nobuo Kurataka, Gennady Gauzner, Shuaigang Xiao
  • Patent number: 9934806
    Abstract: Provided herein is a method, including creating a first pattern in a data region of a substrate, and creating a second pattern in a servo region of a substrate. A circumferential line pattern is created overlapping the first pattern to create rectangle-shaped protrusions in the data region of the substrate. A chevron pattern is created overlapping the second pattern to create chevron-derived protrusions in the servo region of the substrate.
    Type: Grant
    Filed: January 10, 2017
    Date of Patent: April 3, 2018
    Assignee: Seagate Technology LLC
    Inventors: Shuaigang Xiao, David S. Kuo, XiaoMin Yang, Kim Y. Lee, Yautzong Hsu, Koichi Wago
  • Patent number: 9928867
    Abstract: Provided herein are apparatuses and methods, including patterning a first set of features in a servo zone to form a patterned servo zone while a first mask protects a data zone from the patterning. The first mask may be removed from the data zone. The apparatuses and methods may further include patterning a second set of features in the data zone to form a patterned data zone while a second mask protects the patterned servo zone from the patterning.
    Type: Grant
    Filed: June 2, 2015
    Date of Patent: March 27, 2018
    Assignee: Seagate Technology LLC
    Inventors: Shuaigang Xiao, XiaoMin Yang, ZhaoNing Yu, Yautzong Hsu
  • Patent number: 9865294
    Abstract: Provided herein is a method including forming a data zone guiding pattern and forming a servo zone guiding pattern. A servo pattern and a data pattern are simultaneously formed. Directed self-assembly of block copolymers is guided by the data zone guiding pattern and the servo zone guiding pattern.
    Type: Grant
    Filed: August 10, 2016
    Date of Patent: January 9, 2018
    Assignee: Seagate Technology LLC
    Inventors: ShuaiGang Xiao, XiaoMin Yang, David S. Kuo, Kim Yang Lee, Yautzong Hsu
  • Patent number: 9837274
    Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.
    Type: Grant
    Filed: February 26, 2016
    Date of Patent: December 5, 2017
    Assignee: Seagate Technology LLC
    Inventors: XiaoMin Yang, Shuaigang Xiao, Yautzong Hsu, Zhaoning Yu, Kim Y. Lee, David S. Kuo
  • Patent number: 9797924
    Abstract: Provided herein in an apparatus, including a substrate; a functional layer, wherein the functional layer has a composition characteristic of a workpiece of an analytical apparatus; and pre-determined features configured to calibrate the analytical apparatus. Also provided herein is an apparatus, including a functional layer overlying a substrate; and pre-determined features for calibration of an analytical apparatus configured to measure the surface of a workpiece, wherein the functional layer has a composition similar to the workpiece.
    Type: Grant
    Filed: April 17, 2013
    Date of Patent: October 24, 2017
    Assignee: Seagate Technology LLC
    Inventors: Gennady Gauzner, Zhaoning Yu, Nobuo Kurataka, David S. Kuo, Kim Y Lee, Yautzong Hsu, Hong Ying Wang
  • Patent number: 9773520
    Abstract: The embodiments disclose a method of using a trimmed imprinted resist and chemical contrast pattern to guide a directed self-assembly (DSA) of a predetermined lamellar block copolymer (BCP), creating chromium (Cr) lamellar guiding lines using the BCP and DSA in a dry Cr lift-off process and etching the Cr lamellar guiding line patterns into a substrate to fabricate the imprint template.
    Type: Grant
    Filed: January 17, 2014
    Date of Patent: September 26, 2017
    Assignee: Seagate Technology LLC
    Inventors: XiaoMin Yang, Shuaigang Xiao, Yautzong Hsu, HongYing Wang, Kim Y. Lee
  • Publication number: 20170125049
    Abstract: Provided herein is a method, including creating a first pattern in a data region of a substrate, and creating a second pattern in a servo region of a substrate. A circumferential line pattern is created overlapping the first pattern to create rectangle-shaped protrusions in the data region of the substrate. A chevron pattern is created overlapping the second pattern to create chevron-derived protrusions in the servo region of the substrate.
    Type: Application
    Filed: January 10, 2017
    Publication date: May 4, 2017
    Inventors: Shuaigang Xiao, David S. Kuo, XiaoMin Yang, Kim Y. Lee, Yautzong Hsu, Koichi Wago
  • Patent number: 9626996
    Abstract: Provided herein is a method, including a) transferring an initial pattern of an initial template to a substrate; b) performing block copolymer self-assembly over the substrate with a density multiplication factor k; c) creating a subsequent pattern in a subsequent template with the density multiplication factor k; and d) repeating steps a)-c) with the subsequent template as the initial template until a design specification for the subsequent pattern with respect to pattern density and pattern resolution is met.
    Type: Grant
    Filed: January 2, 2015
    Date of Patent: April 18, 2017
    Assignee: Seagate Technologies LLC
    Inventors: XiaoMin Yang, Zhaoning Yu, Kim Yang Lee, Michael Feldbaum, Yautzong Hsu, Wei Hu, Shuaigang Xiao, Henry Yang, HongYing Wang, Rene Johannes Marinus van de Veerdonk, David Kuo
  • Patent number: 9620161
    Abstract: Provided herein is an apparatus, including a first region of a substrate corresponding to a data region in a patterned recording medium; a first set of protrusions etched out of the first region of the substrate, wherein the protrusions of the first set of protrusions are rectangle shaped; a second region of the substrate corresponding to a servo region in a patterned recording medium; and a second set of protrusions etched out of the second region of the substrate, wherein the second set of protrusions includes radial lines etched into the substrate across chevrons etched out of the substrate.
    Type: Grant
    Filed: April 16, 2015
    Date of Patent: April 11, 2017
    Assignee: Seagate Technology LLC
    Inventors: Shuaigang Xiao, David S. Kuo, XiaoMin Yang, Kim Y. Lee, Yautzong Hsu, Koichi Wago
  • Publication number: 20170084300
    Abstract: Provided herein is a method including forming a data zone guiding pattern and forming a servo zone guiding pattern. A servo pattern and a data pattern are simultaneously formed. Directed self-assembly of block copolymers is guided by the data zone guiding pattern and the servo zone guiding pattern.
    Type: Application
    Filed: August 10, 2016
    Publication date: March 23, 2017
    Inventors: ShuaiGang Xiao, XiaoMin Yang, David S. Kuo, Kim Yang Lee, Yautzong Hsu
  • Publication number: 20170023866
    Abstract: A method is disclosed that includes forming at least one substrate alignment mark and at least one lithography alignment mark in a substrate; forming a seed layer on the substrate; and forming a guide pattern and at least one guide pattern alignment mark in the seed layer, where the at least one guide pattern alignment mark is formed over the at least one substrate alignment mark. The method further includes determining an alignment error of the at least one guide pattern alignment mark relative to the at least one substrate alignment mark; and patterning features on at least one region of the substrate, where the features are positioned on the substrate based on the at least one lithography alignment mark and the alignment error.
    Type: Application
    Filed: October 10, 2016
    Publication date: January 26, 2017
    Inventors: HongYing Wang, Kim Y. Lee, Yautzong Hsu, Nobuo Kurataka, Gennady Gauzner, Shuaigang Xiao
  • Publication number: 20170025140
    Abstract: Provided herein is an apparatus, including a first region of a substrate corresponding to a data region in a patterned recording medium; a first set of protrusions etched out of the first region of the substrate, wherein the protrusions of the first set of protrusions are rectangle shaped; a second region of the substrate corresponding to a servo region in a patterned recording medium; and a second set of protrusions etched out of the second region of the substrate, wherein the second set of protrusions includes radial lines etched into the substrate across chevrons etched out of the substrate.
    Type: Application
    Filed: April 16, 2015
    Publication date: January 26, 2017
    Applicant: Seagate Technology LLC
    Inventors: Shuaigang Xiao, David S. Kuo, XiaoMin Yang, Kim Y. Lee, Yautzong Hsu, David Koichi
  • Patent number: 9466324
    Abstract: A method is disclosed that includes forming at least one substrate alignment mark and at least one lithography alignment mark in a substrate; forming a seed layer on the substrate; and forming a guide pattern and at least one guide pattern alignment mark in the seed layer, where the at least one guide pattern alignment mark is formed over the at least one substrate alignment mark. The method further includes determining an alignment error of the at least one guide pattern alignment mark relative to the at least one substrate alignment mark; and patterning features on at least one region of the substrate, where the features are positioned on the substrate based on the at least one lithography alignment mark and the alignment error.
    Type: Grant
    Filed: October 31, 2013
    Date of Patent: October 11, 2016
    Assignee: Seagate Technology LLC
    Inventors: HongYing Wang, Kim Y Lee, Yautzong Hsu, Nobuo Kurataka, Gennady Gauzner, Shuaigang Xiao
  • Patent number: 9424872
    Abstract: Provided herein is an apparatus including a rectangular array of rectangular protrusions in a first region corresponding to a data region; and a hexagonal array of circular protrusions in a second region corresponding to a servo region, wherein a first global protrusion density for the first region is greater than a second global protrusion density for the second region. Also provided herein is a method including forming a first template; forming a second template; and cross-imprinting the first template and the second template to form a third template corresponding to the foregoing apparatus.
    Type: Grant
    Filed: July 31, 2015
    Date of Patent: August 23, 2016
    Assignee: Seagate Technologies LLC
    Inventors: Shuaigang Xiao, XiaoMin Yang, Kim Y. Lee, Yautzong Hsu, Hongying Wang
  • Publication number: 20160181102
    Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.
    Type: Application
    Filed: February 26, 2016
    Publication date: June 23, 2016
    Inventors: XiaoMin Yang, Shuaigang Xiao, Yautzong Hsu, Zhaoning Yu, Kim Y. Lee, David S. Kuo
  • Patent number: 9299609
    Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.
    Type: Grant
    Filed: July 23, 2014
    Date of Patent: March 29, 2016
    Assignee: Seagate Technology LLC
    Inventors: XiaoMin Yang, Shuaigang Xiao, Yautzong Hsu, Zhaoning Yu, Kim Y. Lee, David S. Kuo
  • Publication number: 20160069929
    Abstract: Provided herein in an apparatus, including a substrate; a functional layer, wherein the functional layer has a composition characteristic of a workpiece of an analytical apparatus; and pre-determined features configured to calibrate the analytical apparatus. Also provided herein is an apparatus, including a functional layer overlying a substrate; and pre-determined features for calibration of an analytical apparatus configured to measure the surface of a workpiece, wherein the functional layer has a composition similar to the workpiece.
    Type: Application
    Filed: April 17, 2013
    Publication date: March 10, 2016
    Inventors: Gennady Gauzner, Zhaoning Yu, Nobuo Kurataka, David S. Kuo, Kim Y. Lee, Yautzong Hsu, Hong Ying Wang