Abstract: A mixed strain of probiotics having immunoregulatory functions and a composition comprising the same are provided. The composition can regulate immunity by increasing the production amount of NO or inhibiting the excessive production of NO induced by an inflammatory substance. The mixed strain can be applied to food compositions, health functional food compositions, pharmaceutical compositions, and the like.

Abstract: The present disclosure relates to an immune-enhancing composition comprising Lactobacillus rhamnosus LM1019 and starter strains. An immune-enhancing composition comprising Lactobacillus rhamnosus LM1019 and starter strains according to the present disclosure has an excellent immune-enhancing effect by increasing the amount of nitric oxide (NO) produced and improving the TNF-? secretion ability. Also, since the immune-enhancing composition contains the starter strain, it can be used to produce fermented milk. Under the provisions of the Budapest Treaty on the International Recognition of the Deposit of Microorganisms for the Purposes of Patent Procedure, the Lactobacillus rhamnosus LM1019 strain was deposited with the international depositary authority: the Korean Culture Center of Microorganisms (KCCM) on Aug. 11, 2017, under the Accession Number: KCCM12308P.

Abstract: Disclosed is an inductively-coupled plasma-generating device including: a first power supply for supplying high frequency power; a second power supply for supplying low frequency power; a single coil-based plasma source including at least two antennas which comprise a first antenna having one end as a grounded end and the other end, wherein the first power supply is connected to the first antenna at a point thereof adjacent to the grounded end to receive the high frequency power; and a second antenna surrounded by the first antenna, wherein the second antenna has one end connected to the first antenna and the other end as a low frequency power receiving end connected to the second power supply; and a gas supply for supplying a gas, wherein the gas is excited into plasma by the single coil-based plasma source.

Abstract: The present disclosure relates to an apparatus for detecting a defect and a method for detecting a defect using the same, and more particularly, to an apparatus for detecting a defect and a method for detecting a defect using the same for detecting a defect inside an inspection object without destructing the inspection object. An apparatus for detecting a defect according to an embodiment of the present invention includes a first probe unit configured to transmit a signal into an inspection object and receive a signal generated inside the inspection object, a second probe unit separately installed from the first probe unit and configured to receive the signal generated inside the inspection object, and a position determining unit configured to detect a defect position inside the inspection object using the signal received by the first probe unit and the signal received by the second probe unit.

Abstract: The present disclosure relates to an apparatus for detecting a defect and a method for detecting a defect using the same, and more particularly, to an apparatus for detecting a defect and a method for detecting a defect using the same for detecting a defect inside an inspection object without destructing the inspection object. An apparatus for detecting a defect according to an embodiment of the present invention includes a first probe unit configured to transmit a signal into an inspection object and receive a signal generated inside the inspection object, a second probe unit separately installed from the first probe unit and configured to receive the signal generated inside the inspection object, and a position determining unit configured to detect a defect position inside the inspection object using the signal received by the first probe unit and the signal received by the second probe unit.

Abstract: Disclosed is an inductively-coupled plasma-generating device including: a first power supply for supplying high frequency power; a second power supply for supplying low frequency power; a single coil-based plasma source including at least two antennas which comprise a first antenna having one end as a grounded end and the other end, wherein the first power supply is connected to the first antenna at a point thereof adjacent to the grounded end to receive the high frequency power; and a second antenna surrounded by the first antenna, wherein the second antenna has one end connected to the first antenna and the other end as a low frequency power receiving end connected to the second power supply; and a gas supply for supplying a gas, wherein the gas is excited into plasma by the single coil-based plasma source.