Patents by Inventor Ye Kim

Ye Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070112233
    Abstract: Provided are an apparatus for preparing vinyl chloride including: a pyrolysis reactor in which 1,2-dichloroethane and inert solid particles are mixed to generate vinyl chloride and hydrochloric acid; a first separator receiving the vinyl chloride, hydrochloric acid, and inert solid particles from the pyrolysis reactor and separating the vinyl chloride and hydrochloric acid from the inert solid particles; and a regeneration reactor receiving the separated inert solid particles from the first separator and regenerating the inert solid particles by burning the inert solid particles in a high temperature to remove coke deposited on the inert solid particles, wherein the restoration reactor is connected to the pyrolysis reactor to resupply the restored inert solid particles to the pyrolysis reactor, and a method of preparing vinyl chloride using the same.
    Type: Application
    Filed: November 13, 2006
    Publication date: May 17, 2007
    Applicant: LG CHEM, LTD.
    Inventors: Sung Kim, Ye Kim, DongHyun Jo, Jongwook Bae, Sang-Seung Oh, Soonyeel Lee, Gimoon Nam
  • Publication number: 20070075291
    Abstract: A CMP slurry is provided comprising polishing particles, the polishing particle comprising organically modified colloidal silica. Also, a method of preparing a CMP slurry is provided, comprising the steps of: preparing polishing particles comprising organically modified silica; converting the polishing particles into an aqueous state; and adding pure water, a hydrophilic additive and a dispersing agent to the polishing particles. The polishing particles can be synthesized using a sol-gel process. According to the invention, a slurry having excellent polishing properties can be prepared, in which the surface properties of colloidal silica are changed to control the physical properties of the polishing particles and which can ensure a desired CMP removal rate while minimizing the occurrence of scratches.
    Type: Application
    Filed: June 2, 2006
    Publication date: April 5, 2007
    Inventors: Un Paik, Jea Park, Sang Kim, Ye Kim, Myoung Suh, Dae Kim
  • Publication number: 20050103477
    Abstract: A cooling structure for a portable computer includes a cooling fan creating an air stream to release heat generated in a main body of the computer to the outside through at least one vent. First and second heat pipes transfer heat generated in first and second heat sources on a main board of the computer to a path of the air stream. A portion of the air stream is also directed to the interior of the main body.
    Type: Application
    Filed: October 18, 2004
    Publication date: May 19, 2005
    Applicant: LG Electronics Inc.
    Inventors: Ye Kim, Ki Ko