Abstract: An extreme ultraviolet (EUV) light generating device includes a vessel having an internal space, a droplet generator generating droplets to be supplied to the internal space, a droplet emitter emitting the droplets generated by the droplet generator to the internal space, a laser light source generating a laser beam to generate EUV light by reaction with the droplets, a condensing mirror adjacent to the laser light source to at least partially surround the laser light source and concentrating EUV light on an intermediate focus (IF), and gas lock nozzles around the IF to respectively constitute rows and ejecting a flow control gas to the internal space, wherein a tilted direction of a gas lock nozzle in at least one of the rows is tilted in a direction consistent with a tilted direction of a sidewall of the vessel with respect to a central axis direction of the internal space.

Abstract: A top module of an exposing apparatus may include a reticle stage, a nozzle and a pair of guides. The reticle stage may be configured to support a reticle to which a light is incident. The nozzle may be under the reticle stage and configured to inject a shielding gas in a first horizontal direction. The guides may extend from opposite sides of the nozzle and may be configured to induce the shielding gas in the first horizontal direction. Thus, the shielding gas may not diffuse in a second horizontal direction (e.g., perpendicular to the first horizontal direction) to prevent a diffusion of a contaminant in the shielding gas, thereby preventing the reticle from being contaminated. As a result, a pattern of the reticle may be accurately transcribed into a layer on a semiconductor substrate to form a desired pattern.

Abstract: A substrate processing apparatus includes a table in an exposure chamber that is configured to perform an exposure process on a semiconductor substrate, a guiding device including a first horizontal driving body slidably movable in a first horizontal direction and a guide rail on the first horizontal driving body and having a trench extending in a second horizontal direction, a positioning device connected to the guiding device, the positioning device including a slider, a second horizontal driving body and a substrate stage, the slider configured to slidably move in the second horizontal direction along the trench, the second horizontal driving body connected or fixed to the slider, the substrate stage on the second horizontal driving body and configured to support the semiconductor substrate, and a blocking member between the guide rail and the substrate stage to block an inflow of foreign substances onto the substrate stage.

Abstract: An extreme ultraviolet light source device includes a chamber having a lower surface on which a condensing mirror is arranged, an intermediate focus, and a side surface between the lower surface and an upper surface a first exhaust port and a second exhaust port on the upper surface and spaced apart from the intermediate focus; a droplet supply adjacent to the side surface of the chamber, and configured to supply a droplet to generate the extreme ultraviolet light into the chamber; a light source configured to generate the extreme ultraviolet light by oscillating a laser; a catch adjacent to the side surface of the chamber, opposite to the droplet supply, and configured to receive the droplet discharged from the droplet supply unit; a first exhaust connected to the first exhaust port; and a second exhaust adjacent to the upper surface of the chamber, and connected to the second exhaust port.

Abstract: An extreme ultraviolet light source system includes a chamber configured to maintain a pressure of an inner space thereof at a first pressure, a droplet supply unit disposed in the chamber and configured to discharge a droplet on a first path, a light source configured to emit a light for generating plasma by irradiating a laser light to the droplet at a focal point on the first path, and a suction unit disposed on the first path so as to face the droplet supply unit in the chamber and configured to suction debris of the droplet irradiated with the laser light at a second pressure, lower than the first pressure, wherein the suction unit includes a nozzle protruding from a side wall of the chamber toward the focal point, and an end of the nozzle is closer to the focal point than it is to the side wall of the chamber.

Abstract: Extreme ultraviolet light source systems may include a chamber including a condensing mirror and having an intermediate focus, by which extreme ultraviolet light reflected from the condensing mirror is emitted along a first optical path, a blocking plate that may be on the chamber so as to intersect the first optical path and may include an opening through which the extreme ultraviolet light is emitted, a transparent cover on the blocking plate so as to cover the opening, a nozzle that may be between the chamber and the blocking plate so that an end portion faces the intermediate focus and may spray a first gas in a direction intersecting the first optical path, and an exhaust pipe between the chamber and the blocking plate so as to face the end portion of the nozzle.

Abstract: Extreme ultraviolet light source systems may include a chamber including a condensing mirror and having an intermediate focus, by which extreme ultraviolet light reflected from the condensing mirror is emitted along a first optical path, a blocking plate that may be on the chamber so as to intersect the first optical path and may include an opening through which the extreme ultraviolet light is emitted, a transparent cover on the blocking plate so as to cover the opening, a nozzle that may be between the chamber and the blocking plate so that an end portion faces the intermediate focus and may spray a first gas in a direction intersecting the first optical path, and an exhaust pipe between the chamber and the blocking plate so as to face the end portion of the nozzle.

Abstract: An extreme ultraviolet light source system includes a chamber configured to maintain a pressure of an inner space thereof at a first pressure, a droplet supply unit disposed in the chamber and configured to discharge a droplet on a first path, a light source configured to emit a light for generating plasma by irradiating a laser light to the droplet at a focal point on the first path, and a suction unit disposed on the first path so as to face the droplet supply unit in the chamber and configured to suction debris of the droplet irradiated with the laser light at a second pressure, lower than the first pressure, wherein the suction unit includes a nozzle protruding from a side wall of the chamber toward the focal point, and an end of the nozzle is closer to the focal point than it is to the side wall of the chamber.