Abstract: Provided is a method for etching an atomic layer. The method for etching the atomic layer includes providing a substrate to a process chamber, wherein the process chamber comprises a first chamber part and a second chamber part, and the substrate is provided in the second chamber part, generating adsorption gas plasma in the first chamber part, adsorbing radicals of the adsorption gas plasma to the substrate so as to form a treatment layer, generating etching gas plasma in the first chamber part, and allowing electrons and ions of the etching gas plasma to be alternately incident into the treatment layer so as to perform desorption of the treatment layer.

Abstract: The present application can provide an electrode, a method of manufacturing an electrode, and a use of the electrode. The present application can provide an electrode without forming the fat edge portion while an insulating layer formed by overlapping with the electrode active material layer on the current collector layer of the electrode effectively secures the insulation required for the electrode. In addition, even when the electrode design model is changed, the present application can provide a manufacturing method capable of manufacturing the above-described electrode by flexibly responding to the relevant change. In addition, the present application can provide a use of the electrode.

Abstract: An ultrasonic image providing method of the present disclosure includes: receiving ultrasonic images; measuring a plurality of similarities for a plurality of measurement items for at least one of the ultrasonic images; comparing the plurality of similarities with corresponding default thresholds, respectively; when none of the plurality of similarities is greater than the corresponding default threshold, selecting a measurement item maintaining the greatest similarity among the plurality of similarities for a reference time; and providing an ultrasonic image for the selected measurement item as an ultrasonic image.

Abstract: Methods for distributed histogram computation in a framework utilizing data stream sketches and samples are performed by systems and devices. Distributions of large data sets are scanned once and processed by a computing pool, without sorting, to generate local sketches and value samples of each distribution. The local sketches and samples are utilized to construct local histograms on which cardinality estimates are obtained for query plan generation of distributed queries against distributions. Local statistics of distributions are also merged and consolidated to construct a global histogram representative of the entire data set. The global histogram is utilized to determine a cardinality estimation for query plan generation of incoming queries against the entire data set. The addition of new data to a data set or distribution involves a scan of the new data from which new statistics are generated and then merged with existing statistics for a new global histogram.

Abstract: Methods for distributed histogram computation in a framework utilizing data stream sketches and samples are performed by systems and devices. Distributions of large data sets are scanned once and processed by a computing pool, without sorting, to generate local sketches and value samples of each distribution. The local sketches and samples are utilized to construct local histograms on which cardinality estimates are obtained for query plan generation of distributed queries against distributions. Local statistics of distributions are also merged and consolidated to construct a global histogram representative of the entire data set. The global histogram is utilized to determine a cardinality estimation for query plan generation of incoming queries against the entire data set. The addition of new data to a data set or distribution involves a scan of the new data from which new statistics are generated and then merged with existing statistics for a new global histogram.

Abstract: Provided is a hyperspectral imaging (HSI)-based inspection apparatus capable of quickly and stably performing two-dimensional (2D) HSI for an inspection object, and accordingly, capable of quickly and accurately inspecting the inspection object. The HSI-based inspection apparatus includes: a stage on which an inspection object is arranged; an optical system configured to allow light to be incident on the inspection object and emit the light reflected from the inspection object; a scan mirror configured to reflect the emitted light from the optical system while rotating; and a hyperspectral camera configured to obtain an image having a wavelength direction and a line direction as two axes for light reflected from the scan mirror, wherein, by using the rotation of the scan mirror, the hyperspectral camera is configured to perform the 2D HSI for the inspection object.

Abstract: Provided is a hyperspectral imaging (HSI)-based inspection apparatus capable of quickly and stably performing two-dimensional (2D) HSI for an inspection object, and accordingly, capable of quickly and accurately inspecting the inspection object. The HSI-based inspection apparatus includes: a stage on which an inspection object is arranged; an optical system configured to allow light to be incident on the inspection object and emit the light reflected from the inspection object; a scan mirror configured to reflect the emitted light from the optical system while rotating; and a hyperspectral camera configured to obtain an image having a wavelength direction and a line direction as two axes for light reflected from the scan mirror, wherein, by using the rotation of the scan mirror, the hyperspectral camera is configured to perform the 2D HSI for the inspection object.