Patents by Inventor Yeh-Tung Chen

Yeh-Tung Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for evaluating reliance level of a virtual metrology system in product manufacturing
    Patent number: 7593912
    Abstract: A method for evaluating reliance level of a virtual metrology system is disclosed. In this method, a reliance index (RI) and a RI threshold value are calculated by analyzing the process data of production equipment, thereby determining if the virtual metrology result is reliable. Besides, in this method, a global similarity index (GSI) and individual similarity indexes (ISI) are also provided for defining the degree of similarity between the current set of process data and all of the sets of historical process data used for establishing the conjecture model, thereby assisting the RI in gauging the degree of reliance and locating the key parameter(s) that cause major deviation.
    Type: Grant
    Filed: December 29, 2006
    Date of Patent: September 22, 2009
    Assignee: National Cheng Kung University
    Inventors: Fan-Tien Cheng, Yeh-Tung Chen, Yu-Chuan Su
  • Method for Evaluating Reliance Level of a Virtual Metrology System
    Publication number: 20070282767
    Abstract: A method for evaluating reliance level of a virtual metrology system is disclosed. In this method, a reliance index (RI) and a RI threshold value are calculated by analyzing the process data of production equipment, thereby determining if the virtual metrology result is reliable. Besides, in this method, a global similarity index (GSI) and individual similarity indexes (ISI) are also provided for defining the degree of similarity between the current set of process data and all of the sets of historical process data used for establishing the conjecture model, thereby assisting the RI in gauging the degree of reliance and locating the key parameter(s) that cause major deviation.
    Type: Application
    Filed: December 29, 2006
    Publication date: December 6, 2007
    Inventors: Fan-Tien Cheng, Yeh-Tung Chen, Yu-Chuan Su