Patents by Inventor Yehua Su

Yehua Su has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11912919
    Abstract: This present disclosure provides a core-shell quantum dot, a preparation method thereof, and a light-emitting device containing the same. The core of the core-shell quantum dot is CdSeXS(1-X), and the quantum dot shells include a first shell and a second shell, the first shell being selected from one or more of ZnSe, ZnSeYS(1-Y) and Cd(Z)Zn(1-Z)S, the second shell covering the first shell being one of Cd(Z)Zn(1-Z)S and ZnS, the maximum emission peak of the core-shell quantum dot is less than or equal to 480 nm, 0<X<1, 0<Y<1, 0<Z<1. The CdSeXS(1-X) core has a smaller bandgap and a shallower HOMO energy level, making hole injection easier.
    Type: Grant
    Filed: December 29, 2018
    Date of Patent: February 27, 2024
    Assignee: Najing Technology Corporation Limited
    Inventors: Baozhong Hu, Guangxu Li, Yanhong Mao, Yuan Gao, Yehua Su
  • Publication number: 20210047562
    Abstract: This present disclosure provides a core-shell quantum dot, a preparation method thereof, and a light-emitting device containing the same. The core of the core-shell quantum dot is CdSeXS(1-X), and the quantum dot shells include a first shell and a second shell, the first shell being selected from one or more of ZnSe, ZnSeYS(1-Y) and Cd(Z)Zn(1-Z)S, the second shell covering the first shell being one of Cd(Z)Zn(1-Z)S and ZnS, the maximum emission peak of the core-shell quantum dot is less than or equal to 480 nm, 0<X<1, 0<Y<1, 0<Z<1. The CdSeXS(1-X) core has a smaller bandgap and a shallower HOMO energy level, making hole injection easier.
    Type: Application
    Filed: December 29, 2018
    Publication date: February 18, 2021
    Inventors: Baozhong HU, Guangxu LI, Yanhong MAO, Yuan GAO, Yehua SU
  • Patent number: 10167246
    Abstract: A preparative method for carboxylic acids is disclosed in the present invention. The method is characterized in that: compounds (II) are reacted in the presence of hydrogen peroxide and base to produce target products (I), as represented by the following reaction scheme: wherein R1 is aryl, pyridyl, pyrimidyl, pyridazinyl, pyrazinyl, benzothienyl, benzofuranyl, quinolinyl, isoquinolinyl, thiadiazolyl, C1-6 alkyl, C3-6 cycloalkyl, C2-6 alkenyl, C2-6 alkynyl and hydrogen; R2 is alkoxycarbonyl, alkylaminocarbonyl, aminocarbonyl, alkylthiolcarbonyl, cyano, sulfonyl, sulfinyl, carbonyl, aldehyde, carboxyl, nitro, alkyl and hydrogen; R3 is alkoxycarbonyl, alkyl amido carbonyl, aminocarbonyl, cyano, sulfonyl, sulfinyl, carbonyl, carboxyl and nitro. The present invention has the following main benefits: cheap and readily available starting materials, safe processes, high yield, good quality, which facilitates industrial production.
    Type: Grant
    Filed: September 25, 2015
    Date of Patent: January 1, 2019
    Assignee: ZHEJIANG ZHUJI UNITED CHEMICALS CO., LTD
    Inventors: Yehua Su, Jieping Shi, Jianxin Lu, Tianhao Zhang, Xiaohua Yu, Guoping Cai, Bangchi Chen
  • Publication number: 20170369412
    Abstract: A preparative method for carboxylic acids is disclosed in the present invention. The method is characterized in that: compounds (II) are reacted in the presence of hydrogen peroxide and base to produce target products (I), as represented by the following reaction scheme: wherein R1 is aryl, pyridyl, pyrimidyl, pyridazinyl, pyrazinyl, benzothienyl, benzofuranyl, quinolinyl, isoquinolinyl, thiadiazolyl, C1-6 alkyl, C3-6 cycloalkyl, C2-6 alkenyl, C2-6 alkynyl and hydrogen; R2 is alkoxycarbonyl, alkylaminocarbonyl, aminocarbonyl, alkylthiolcarbonyl, cyano, sulfonyl, sulfinyl, carbonyl, aldehyde, carboxyl, nitro, alkyl and hydrogen; R3 is alkoxycarbonyl, alkyl amido carbonyl, aminocarbonyl, cyano, sulfonyl, sulfinyl, carbonyl, carboxyl and nitro. The present invention has the following main benefits: cheap and readily available starting materials, safe processes, high yield, good quality, which facilitates industrial production.
    Type: Application
    Filed: September 25, 2015
    Publication date: December 28, 2017
    Inventors: Yehua Su, Jieping Shi, Jianxin Lu, Tianhao Zhang, Xiaohua Yu, Guoping Cai, Bangchi Chen