Abstract: A display device includes an array of sub-pixels including red, green, and blue sub-pixels, and an input sensing layer including a metal pattern at least partially surrounding each of the sub-pixels in a plan view. The array has a structure in which an ith column (where i is a natural number), in which the red sub-pixels and the green sub-pixels are alternately arranged, and an (i+1)th column, in which the blue sub-pixels are arranged, are alternately arranged. The metal pattern includes a first metal pattern partially surrounding a first sub-pixel, which is one of the sub-pixels, and a second metal pattern completely surrounding a second sub-pixel emitting light of a same color as the first sub-pixel. The first metal pattern includes a first open portion extending from the first sub-pixel in a first direction and a second open portion extending from the first sub-pixel in a second direction.

Abstract: An electronic device includes a base layer, a first sensing pattern disposed on the base layer and including a plurality of first mesh lines, a second sensing pattern disposed on the base layer, spaced apart from the first sensing pattern, and including a plurality of second mesh lines, and a light shielding pattern disposed on the plurality of first mesh lines and the plurality of second mesh lines, and including a plurality of light shielding mesh lines. The minimum thickness of the plurality of light shielding mesh lines is greater than the thickness of the first mesh lines and the thickness of the second mesh lines.

Abstract: Disclosed is a method of fabricating a display device. The method comprises forming a dielectric layer on an encapsulation layer including a first encapsulation region and a second encapsulation region adjacent to the first encapsulation region, forming a conductive layer on the dielectric layer, forming a first photoresist layer on the conductive layer that overlaps each of the first and second encapsulation regions, forming a second photoresist layer on the first photoresist layer that overlaps the second encapsulation region, and etching the conductive layer based on the first and second photoresist layers. When viewed in a thickness direction of a display panel including the encapsulation layer, at least a portion of the encapsulation layer overlapping the second encapsulation region has a thickness greater than that of the encapsulation layer overlapping the first encapsulation region.

Abstract: An electronic device includes a base layer, a first sensing pattern disposed on the base layer and including a plurality of first mesh lines, a second sensing pattern disposed on the base layer, spaced apart from the first sensing pattern, and including a plurality of second mesh lines, and a light shielding pattern disposed on the plurality of first mesh lines and the plurality of second mesh lines, and including a plurality of light shielding mesh lines. The minimum thickness of the plurality of light shielding mesh lines is greater than the thickness of the first mesh lines and the thickness of the second mesh lines.

Abstract: A display device includes: a substrate including a display area and a non-display area; and a touch unit on the substrate, wherein the touch unit includes: a first inorganic insulating layer in the display area; a first conductive layer on the first inorganic insulating layer; a first organic layer on the first conductive layer; a second conductive layer on the first organic layer and electrically connected to the first conductive layer through a first contact hole in the first organic layer; and a second organic layer on the second conductive layer so as to cover a lateral surface and a top surface of the second conductive layer and including a photosensitive material.

Abstract: Disclosed is a method of fabricating a display device. The method comprises forming a dielectric layer on an encapsulation layer including a first encapsulation region and a second encapsulation region adjacent to the first encapsulation region, forming a conductive layer on the dielectric layer, forming a first photoresist layer on the conductive layer that overlaps each of the first and second encapsulation regions, forming a second photoresist layer on the first photoresist layer that overlaps the second encapsulation region, and etching the conductive layer based on the first and second photoresist layers. When viewed in a thickness direction of a display panel including the encapsulation layer, at least a portion of the encapsulation layer overlapping the second encapsulation region has a thickness greater than that of the encapsulation layer overlapping the first encapsulation region.

Abstract: A display device includes: a substrate including a display area and a non-display area; and a touch unit on the substrate, wherein the touch unit includes: a first inorganic insulating layer in the display area; a first conductive layer on the first inorganic insulating layer; a first organic layer on the first conductive layer; a second conductive layer on the first organic layer and electrically connected to the first conductive layer through a first contact hole in the first organic layer; and a second organic layer on the second conductive layer so as to cover a lateral surface and a top surface of the second conductive layer and including a photosensitive material.